公开(公告)号：US6158075A

公开(公告)日：2000-12-12

申请号：US970617

申请日：1997-11-14

申请人： Hideya Tanaka ,  Kenichi Miyamoto ,  Minoru Kubota ,  Walter Swanson

发明人： Hideya Tanaka ,  Kenichi Miyamoto ,  Minoru Kubota ,  Walter Swanson

IPC分类号： B08B1/04 ,  H01L21/00 ,  A47L25/00

CPC分类号： H01L21/67051 ,  B08B1/007 ,  B08B1/04 ,  H01L21/67046 ,  Y10S134/902

摘要： A substrate washing apparatus, comprising a spin chuck for holding and rotating a substrate W, a brushing section including a scrubbing member which is brought into contact with a washing surface of the substrate held on the spin chuck and revolved on its own axis together with rotation of the spin chuck, a washing liquid supply mechanism for supplying a washing liquid through the brushing section onto the washing surface of the substrate, a pressure control mechanism for controlling a pressing force of the scrubbing member against the washing surface of the substrate, and a moving means for moving the scrubbing member relative to the substrate in a radial direction of the substrate, wherein the scrubbing member includes an abutting portion which is brought into contact with the washing surface of the substrate, and a non-contact peripheral portion positioned about the abutting portion and formed not to contact the washing surface of the substrate when the abutting portion is in contact with the washing surface of the substrate.

公开(公告)号：US06379469B1

公开(公告)日：2002-04-30

申请号：US09677894

申请日：2000-10-03

申请人： Hideya Tanaka ,  Kenichi Miyamoto ,  Minoru Kubota ,  Walter Swanson

发明人： Hideya Tanaka ,  Kenichi Miyamoto ,  Minoru Kubota ,  Walter Swanson

IPC分类号： B08B700

CPC分类号： H01L21/67051 ,  B08B1/007 ,  B08B1/04 ,  H01L21/67046 ,  Y10S134/902

摘要： A substrate washing apparatus, comprising a spin chuck for holding and rotating a substrate W, a brushing section including a scrubbing member which is brought into contact with a washing surface of the substrate held on the spin chuck and revolved on its own axis together with rotation of the spin chuck, a washing liquid supply mechanism for supplying a washing liquid through the brushing section onto the washing surface of the substrate, a pressure control mechanism for controlling a pressing force of the scrubbing member against the washing surface of the substrate, and a moving means for moving the scrubbing member relative to the substrate in a radial direction of the substrate, wherein the scrubbing member includes an abutting portion which is brought into contact with the washing surface of the substrate, and a non-contact peripheral portion positioned about the abutting portion and formed not to contact the washing surface of the substrate when the abutting portion is in contact with the washing surface of the substrate.

摘要翻译： 一种基板清洗装置，包括用于保持和旋转基板W的旋转卡盘，包括洗涤部件的刷洗部分，该擦洗部件与保持在旋转卡盘上的基板的清洗表面接触并与其自身的轴线一起旋转 旋转卡盘的洗涤液供给机构，用于将洗涤液通过刷洗部供给到基材的洗涤面上的洗涤液供给机构，用于控制洗涤部件抵靠基材的洗涤面的按压力的压力控制机构， 移动装置，用于沿着衬底的径向移动洗涤构件相对于衬底，其中擦洗构件包括与衬底的洗涤表面接触的邻接部分和围绕衬底的非接触周边部分 邻接部分形成为不邻接基板的清洗表面 与基材的洗涤表面。

公开(公告)号：US5806319A

公开(公告)日：1998-09-15

申请号：US816295

申请日：1997-03-13

申请人： John Wary ,  Roger A. Olson ,  William F. Beach ,  Walter Swanson

发明人： John Wary ,  Roger A. Olson ,  William F. Beach ,  Walter Swanson

IPC分类号： B05D7/24 ,  C23C14/54 ,  B01D8/00

CPC分类号： B05D1/60 ,  C23C14/541 ,  Y10S417/901

摘要： A method and apparatus for depositing parylene monomer within the interior of a deposition chamber of a parylene deposition system. In certain embodiments, the method comprises the steps of: (a) introducing a cryogenic fluid into the interior of the deposition chamber to cool the surface of the substrate; and (b) introducing the parylene monomer into the interior of the chamber to deposit the parylene monomer onto the surface of the substrate. In some embodiments, the apparatus comprises: a deposition chamber; a pumping system, a source of cryogenic fluid, a gas source and at least one support mount disposed within the interior of the deposition chamber. The pumping system reduces the pressure of the interior of the deposition chamber, and the pumping system is in fluid communication with the interior of the deposition chamber. The source of cryogenic fluid is in fluid communication with the interior of the deposition chamber. The gas source is in fluid communication with the interior of the deposition chamber. Optionally, the method or apparatus may include the use of a load lock chamber.

摘要翻译： 一种在聚对二甲苯沉积系统的沉积室的内部沉积聚对二甲苯单体的方法和设备。 在某些实施方案中，该方法包括以下步骤：（a）将低温流体引入沉积室的内部以冷却基底的表面; 和（b）将聚对二甲苯单体引入室的内部以将聚对二甲苯单体沉积在基材的表面上。 在一些实施例中，该装置包括：沉积室; 泵送系统，低温流体源，气体源和设置在沉积室内部的至少一个支撑安装座。 泵送系统降低沉积室内部的压力，并且泵送系统与沉积室的内部流体连通。 低温流体的源与沉积室的内部流体连通。 气源与沉积室的内部流体连通。 可选地，该方法或装置可以包括使用负载锁定室。