公开(公告)号：US08350214B2

公开(公告)日：2013-01-08

申请号：US13143404

申请日：2010-01-04

申请人： Hiroki Otaki ,  Momoyo Enyama ,  Hiroya Ohta

发明人： Hiroki Otaki ,  Momoyo Enyama ,  Hiroya Ohta

IPC分类号： H01L21/66 ,  G01N23/225

CPC分类号： H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  G01R31/305 ,  H01J37/3023 ,  H01J2237/004 ,  H01J2237/0044

摘要： Provided is a multi-beam type charged particle beam applied apparatus in an implementable configuration, capable of achieving both high detection accuracy of secondary charged particles and high speed of processing characteristically different specimens. An aperture array (111) includes plural aperture patterns. A deflector (109) for selecting an aperture pattern through which a primary beam passes is disposed at the position of a charged particle source image created between an electron gun (102), i.e., a charged particle source, and the aperture array (111). At the time of charge-control beam illumination and at the time of signal-detection beam illumination, an aperture pattern of the aperture array (111) is selected, and conditions of a lens array (112), surface electric-field control electrode (118) and the like are switched in synchronization with each beam scanning. Thus, the charges are controlled and the signals are detected at different timings under suitable conditions, respectively.

摘要翻译： 提供了一种可实现的多束式带电粒子束施加装置，能够实现二次带电粒子的高检测精度和加工特性不同的试样的高速度。 孔径阵列（111）包括多个孔径图案。 用于选择主光束通过的孔径图案的偏转器（109）设置在电子枪（102）（即带电粒子源）与孔径阵列（111）之间产生的带电粒子源图像的位置处， 。 在充电控制光束照明时，在信号检测光束照射时，选择孔径阵列（111）的孔径图案，透镜阵列（112），表面电场控制电极（ 118）等与每个波束扫描同步地切换。 因此，控制电荷并且在合适的条件下分别在不同的定时检测信号。

公开(公告)号：US20110272576A1

公开(公告)日：2011-11-10

申请号：US13143404

申请日：2010-01-04

申请人： Hiroki Otaki ,  Momoyo Enyama ,  Hiroya Ohta

发明人： Hiroki Otaki ,  Momoyo Enyama ,  Hiroya Ohta

IPC分类号： G01N23/00

CPC分类号： H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  G01R31/305 ,  H01J37/3023 ,  H01J2237/004 ,  H01J2237/0044

摘要： Provided is a multi-beam type charged particle beam applied apparatus in an implementable configuration, capable of achieving both high detection accuracy of secondary charged particles and high speed of processing characteristically different specimens. An aperture array (111) includes plural aperture patterns. A deflector (109) for selecting an aperture pattern through which a primary beam passes is disposed at the position of a charged particle source image created between an electron gun (102), i.e., a charged particle source, and the aperture array (111). At the time of charge-control beam illumination and at the time of signal-detection beam illumination, an aperture pattern of the aperture array (111) is selected, and conditions of a lens array (112), surface electric-field control electrode (118) and the like are switched in synchronization with each beam scanning. Thus, the charges are controlled and the signals are detected at different timings under suitable conditions, respectively.

摘要翻译： 提供了一种可实现的多束式带电粒子束施加装置，能够实现二次带电粒子的高检测精度和加工特性不同的试样的高速度。 孔径阵列（111）包括多个孔径图案。 用于选择主光束通过的孔径图案的偏转器（109）设置在电子枪（102）（即带电粒子源）与孔径阵列（111）之间产生的带电粒子源图像的位置处， 。 在充电控制光束照明时，在信号检测光束照射时，选择孔径阵列（111）的孔径图案，透镜阵列（112），表面电场控制电极（ 118）等与每个波束扫描同步地切换。 因此，控制电荷并且在合适的条件下分别在不同的定时检测信号。