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1.发明申请公开(公告)号：US20090168036A1
公开(公告)日：2009-07-02
申请号：US12341412
申请日：2008-12-22
申请人： Hiromichi Hara , Yasuyo Kawabata
发明人： Hiromichi Hara , Yasuyo Kawabata
IPC分类号： G03B27/42
CPC分类号： G03F7/70833 , G03F7/709 , G03F7/7095
摘要： An exposure apparatus of the present invention is configured to expose a pattern on an original onto a wafer via a projection lens system 110. The exposure apparatus includes a setting leg 105, platens 103, 107, and 109 on which at least one of a reticle stage apparatus 108 configured to hold the original, the projection optical system 110, a wafer stage apparatus 102 configured to hold the wafer, and an interferometer configured to measure a position of the original stage or the wafer stage is mounted, a vibration isolation support mechanism 105 which is provided between the platens 103, 107, and 109 and the setting leg 105 and configured to reduce a vibration, and a filling member 122 formed by hardening a hardening type liquid 113 which is filled between the setting leg 105 and a setting floor 101.
摘要翻译： 本发明的曝光装置被配置为经由投影透镜系统110将原稿上的图案曝光到晶片上。曝光装置包括设置支脚105，压板103,107和109，其上至少一个光罩 被配置为保持原稿的投影光学系统110，被配置为保持晶片的晶片台装置102和配置成测量原始台或晶片台的位置的干涉仪被安装，隔振支撑机构 105，其设置在压板103,107,109与设置支柱105之间，并且被构造成减少振动;以及填充构件122，其通过硬化硬化型液体113而形成，硬化型液体113填充在设置腿105和设定板 101。
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2.发明授权Exposure apparatus, structure, method for setting up apparatus, and device manufacturing method having filling member formed by hardening liquid to support setting leg 有权用于设置装置的曝光装置，结构，方法以及具有通过硬化液体形成的填充构件以支撑设置腿的装置制造方法公开(公告)号：US08780329B2
公开(公告)日：2014-07-15
申请号：US12341412
申请日：2008-12-22
申请人： Hiromichi Hara , Yasuyo Kawabata
发明人： Hiromichi Hara , Yasuyo Kawabata
CPC分类号： G03F7/70833 , G03F7/709 , G03F7/7095
摘要： An exposure apparatus of the present invention is configured to expose a pattern on an original onto a wafer via a projection lens system 110. The exposure apparatus includes a setting leg 105, platens 103, 107, and 109 on which at least one of a reticle stage apparatus 108 configured to hold the original, the projection optical system 110, a wafer stage apparatus 102 configured to hold the wafer, and an interferometer configured to measure a position of the original stage or the wafer stage is mounted, a vibration isolation support mechanism 105 which is provided between the platens 103, 107, and 109 and the setting leg 105 and configured to reduce a vibration, and a filling member 122 formed by hardening a hardening type liquid 113 which is filled between the setting leg 105 and a setting floor 101.
摘要翻译： 本发明的曝光装置被配置为经由投影透镜系统110将原稿上的图案曝光到晶片上。曝光装置包括设置支脚105，压板103,107和109，其上至少一个光罩 被配置为保持原稿的投影光学系统110，被配置为保持晶片的晶片台装置102和配置成测量原始台或晶片台的位置的干涉仪被安装，隔振支撑机构 105，其设置在压板103,107,109与设置支柱105之间，并且被构造成减少振动;以及填充构件122，其通过硬化硬化型液体113而形成，硬化型液体113填充在设置腿105和设定板 101。
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