公开(公告)号：US5435683A

公开(公告)日：1995-07-25

申请号：US294761

申请日：1994-08-23

申请人： Tetsu Oosawa ,  Teruo Asakawa ,  Kenji Nebuka ,  Hiroo Ono

发明人： Tetsu Oosawa ,  Teruo Asakawa ,  Kenji Nebuka ,  Hiroo Ono

IPC分类号： B65G47/80 ,  H01L21/00 ,  H01L21/677 ,  H01L21/68 ,  B65G1/06

CPC分类号： H01L21/67126 ,  H01L21/67745 ,  H01L21/681 ,  Y10S414/136 ,  Y10S414/137 ,  Y10S414/139

摘要： A load-lock unit is disposed between first and second atmospheres, for storing a wafer transferred from the first atmosphere, and which is blocked off from the first atmosphere, thereafter being set in an atmosphere at least substantially similar to the second atmosphere, and opened so as to communicate with the second atmosphere in order to transfer the wafer to the second atmosphere. The load-lock unit includes a load-lock chamber, a holding mechanism, disposed in the load-lock chamber for holding the wafer, a rotating mechanism for rotating the wafer held by the holding mechanism, and an error detecting mechanism for detecting a positional error of the center of the wafer and an orientation error of the wafer on the basis of data obtained by radiating light on the wafer which is rotating.

摘要翻译： 负载锁定单元设置在第一和第二气氛之间，用于存储从第一气氛转移的晶片，并从第一气氛中被阻挡，然后设置在至少基本上类似于第二气氛的气氛中，并打开 以便与第二气氛通信，以将晶片转移到第二气氛。 负载锁定单元包括：装载锁定室，保持机构，设置在用于保持晶片的装载锁定室中;旋转机构，用于使由保持机构保持的晶片旋转;以及错误检测机构，用于检测位置 基于通过在正在旋转的晶片上照射光而获得的数据，晶片的中心的误差和晶片的取向误差。

公开(公告)号：US5405230A

公开(公告)日：1995-04-11

申请号：US857831

申请日：1992-03-26

申请人： Hiroo Ono ,  Tetsu Oosawa ,  Teruo Asakawa ,  Kenji Nebuka

发明人： Hiroo Ono ,  Tetsu Oosawa ,  Teruo Asakawa ,  Kenji Nebuka

IPC分类号： B65G47/80 ,  H01L21/00 ,  H01L21/677 ,  H01L21/68

CPC分类号： H01L21/67126 ,  H01L21/67265 ,  H01L21/67745 ,  Y10S414/136 ,  Y10S414/137 ,  Y10S414/139

摘要： A load-lock unit is disposed between first and second atmospheres, stores a wafer transferred from the first atmosphere, is blocked off from the first atmosphere, is thereafter set in the same atmosphere as or a similar atmosphere to the second atmosphere, and is opened to communicate with the second atmosphere in order to transfer the wafer to the second atmosphere. The load-lock unit includes a load-lock chamber, a storing device, disposed in the load-lock chamber, for storing a plurality of wafers vertically at a gap, a holding mechanism for holding one of the plurality of wafers stored in the storing device, a rotating mechanism for rotating the wafer held by the holding mechanism, and an error detecting device for detecting the positional error of the center of the wafer and an orientation error of the wafer on the basis of data obtained by radiating light on the wafer which is rotating.

摘要翻译： 装载锁定单元设置在第一和第二气氛之间，将从第一大气转移的晶片与第一大气隔绝，然后与第二大气相同或相似的气氛放置，打开 以与第二气氛通信，以将晶片转移到第二气氛。 所述装载锁定单元包括装载锁定室，存储装置，设置在所述装载锁定室中，用于在间隙上垂直地存储多个晶片;保持机构，用于保持存储在所述存储器中的所述多个晶片中的一个; 装置，用于旋转由保持机构保持的晶片的旋转机构，以及用于基于通过在晶片上照射光获得的数据来检测晶片的中心的位置误差和晶片的取向误差的误差检测装置 这是旋转。

公开(公告)号：US5340261A

公开(公告)日：1994-08-23

申请号：US857832

申请日：1992-03-26

申请人： Tetsu Oosawa ,  Teruo Asakawa ,  Kenji Nebuka ,  Hiroo Ono

发明人： Tetsu Oosawa ,  Teruo Asakawa ,  Kenji Nebuka ,  Hiroo Ono

IPC分类号： B65G47/80 ,  H01L21/00 ,  H01L21/677 ,  H01L21/68 ,  B65G1/06

CPC分类号： H01L21/67126 ,  H01L21/67745 ,  H01L21/681 ,  Y10S414/136 ,  Y10S414/137 ,  Y10S414/139

摘要： A load-lock unit is disposed between first and second atmospheres, for storing a wafer transferred from the first atmosphere, and which is blocked off from the first atmosphere, thereafter being set in an atmosphere at least substantially similar to the second atmosphere, and opened so as to communicate with the second atmosphere in order to transfer the wafer to the second atmosphere. The load-lock unit includes a load-lock chamber, a holding mechanism, disposed in the load-lock chamber for holding the wafer, a rotating mechanism for rotating the wafer held by the holding mechanism, and an error detecting mechanism for detecting a positional error of the center of the wafer and an orientation error of the wafer on the basis of data obtained by radiating light on the wafer which is rotating.

摘要翻译： 负载锁定单元设置在第一和第二气氛之间，用于存储从第一气氛转移的晶片，并从第一气氛中被阻挡，然后设置在至少基本上类似于第二气氛的气氛中，并打开 以便与第二气氛通信，以将晶片转移到第二气氛。 负载锁定单元包括：装载锁定室，保持机构，设置在用于保持晶片的装载锁定室中;旋转机构，用于使由保持机构保持的晶片旋转;以及错误检测机构，用于检测位置 基于通过在正在旋转的晶片上照射光而获得的数据，晶片的中心的误差和晶片的取向误差。

公开(公告)号：US5753891A

公开(公告)日：1998-05-19

申请号：US522148

申请日：1995-08-31

申请人： Teruo Iwata ,  Kenji Nebuka ,  Mitsuaki Komino

发明人： Teruo Iwata ,  Kenji Nebuka ,  Mitsuaki Komino

IPC分类号： H01L21/00 ,  H01L35/32 ,  H05B3/04

CPC分类号： H01L21/67109

摘要： A treatment apparatus comprises a heater including an insulator carrying a to-be-treated object thereon and a resistance heating element therein for heating the to-be-treated object, an electrical supply mechanism including feeders extending into a treatment chamber from outside and terminals connecting the feeders and the resistance heating element, and a metallic pipe surrounding the terminals and those portions of the feeders which extend in the treatment chamber. A treatment apparatus for discharging an exhaust gas from the treatment chamber through an exhaust pipe by means of a suction unit comprises a first heater in the inner wall of the treatment chamber for heating the gas in the treatment chamber, and a second heater for independently heating the exhaust gas in the exhaust pipe at various portions of the exhaust pipe.

摘要翻译： 处理装置包括：加热器，其包括承载待处理物体的绝缘体和用于加热待处理物体的电阻加热元件;供电机构，包括从外部延伸到处理室中的进料器，以及连接到所述待处理物体的端子 馈电器和电阻加热元件以及围绕端子的金属管和在处理室中延伸的馈送器的那些部分。 一种用于通过抽吸单元从排出管排出废气的处理装置包括：处理室内壁中的用于加热处理室中的气体的第一加热器和用于独立加热的第二加热器 在排气管的排气管的各部分排气。