公开(公告)号：US06358324B1

公开(公告)日：2002-03-19

申请号：US09559750

申请日：2000-04-27

申请人： Toshiaki Hongoh ,  Tetsu Oosawa ,  Satoru Kawakami ,  Mitsuhiro Yuasa

发明人： Toshiaki Hongoh ,  Tetsu Oosawa ,  Satoru Kawakami ,  Mitsuhiro Yuasa

IPC分类号： C23C1600

CPC分类号： H01J37/32834 ,  C23C16/0209 ,  C23C16/4583 ,  C23C16/511 ,  H01J37/32192 ,  H01J37/3222

摘要： A microwave plasma processing apparatus has a process chamber in which an object to be processed is subjected to plasma processing under a predetermined negative pressure environment. A susceptor holding the object thereon is provided in the process chamber. The susceptor is moved by a susceptor moving member which is moved by a susceptor moving mechanism located outside the process chamber. The susceptor moving member extends from the process chamber via a bellows provided to a bottom of the process chamber. The bellows allows a vertical movement of the susceptor moving member while providing a hermetic seal to the process chamber to maintain the predetermined negative pressure environment in the process chamber. A vacuum pump is provided to the bottom of the process chamber so that an inlet opening of the vacuum pump aligns with the susceptor in the vertical direction.

摘要翻译： 微波等离子体处理装置具有处理室，在该处理室中，在预定的负压环境下对被处理物进行等离子体处理。 在处理室中设置有保持物体的基座。 基座由基座移动构件移动，基座移动构件由位于处理室外的基座移动机构移动。 基座移动构件通过设置在处理室底部的波纹管从处理室延伸。 波纹管允许基座移动构件的垂直移动，同时向处理室提供气密密封，以保持处理室中的预定负压环境。 真空泵设置在处理室的底部，使得真空泵的入口在垂直方向上与基座对准。

公开(公告)号：US5435683A

公开(公告)日：1995-07-25

申请号：US294761

申请日：1994-08-23

申请人： Tetsu Oosawa ,  Teruo Asakawa ,  Kenji Nebuka ,  Hiroo Ono

发明人： Tetsu Oosawa ,  Teruo Asakawa ,  Kenji Nebuka ,  Hiroo Ono

IPC分类号： B65G47/80 ,  H01L21/00 ,  H01L21/677 ,  H01L21/68 ,  B65G1/06

CPC分类号： H01L21/67126 ,  H01L21/67745 ,  H01L21/681 ,  Y10S414/136 ,  Y10S414/137 ,  Y10S414/139

摘要： A load-lock unit is disposed between first and second atmospheres, for storing a wafer transferred from the first atmosphere, and which is blocked off from the first atmosphere, thereafter being set in an atmosphere at least substantially similar to the second atmosphere, and opened so as to communicate with the second atmosphere in order to transfer the wafer to the second atmosphere. The load-lock unit includes a load-lock chamber, a holding mechanism, disposed in the load-lock chamber for holding the wafer, a rotating mechanism for rotating the wafer held by the holding mechanism, and an error detecting mechanism for detecting a positional error of the center of the wafer and an orientation error of the wafer on the basis of data obtained by radiating light on the wafer which is rotating.

摘要翻译： 负载锁定单元设置在第一和第二气氛之间，用于存储从第一气氛转移的晶片，并从第一气氛中被阻挡，然后设置在至少基本上类似于第二气氛的气氛中，并打开 以便与第二气氛通信，以将晶片转移到第二气氛。 负载锁定单元包括：装载锁定室，保持机构，设置在用于保持晶片的装载锁定室中;旋转机构，用于使由保持机构保持的晶片旋转;以及错误检测机构，用于检测位置 基于通过在正在旋转的晶片上照射光而获得的数据，晶片的中心的误差和晶片的取向误差。

公开(公告)号：US5984607A

公开(公告)日：1999-11-16

申请号：US849744

申请日：1997-07-03

申请人： Tetsu Oosawa ,  Harunori Ushikawa

发明人： Tetsu Oosawa ,  Harunori Ushikawa

IPC分类号： B65G49/07 ,  H01L21/00 ,  H01L21/677 ,  B65H3/00

CPC分类号： H01L21/67161 ,  H01L21/67772 ,  H01L21/67778 ,  Y10S414/137

摘要： The present invention provides a transfer apparatus and a transfer method capable of reducing the time required for transferring a plurality of to-be-transferred objects, and a treatment apparatus and a treatment method capable of increasing the throughput. The transfer apparatus, wherein the objects are transferred from a first support unit supporting the objects to a second support unit capable of supporting the objects, comprising load/unload means for unloading the objects one by one from the first support unit in a first position in which the objects can be carried out of the first support unit, and loading the objects into the second support unit one by one in a second position in which the objects can be carried into the second support unit, a third support unit for permitting loading and unloading of the objects by the load/unload means, the third support unit being capable of supporting the objects, and transfer means for moving the load/unload means from the first position to the second position.

摘要翻译： PCT No.PCT / JP96 / 03241 Sec。 371日期1997年7月3日 102（e）1997年7月3日PCT PCT 1996年11月6日PCT公布。 第WO97 / 17728号公报 日期：1997年5月15日本发明提供能够减少转印多个待转移物体所需的时间的转印装置和转印方法，以及能够提高生产量的处理装置和处理方法。 所述传送装置，其中所述物体从支撑所述物体的第一支撑单元传送到能够支撑所述物体的第二支撑单元，所述第二支撑单元包括装载/卸载装置，所述装载/卸载装置在所述第一位置中从所述第一支撑单元逐个卸载所述物体， 所述物体可以从所述第一支撑单元执行，并且将所述物体逐个加载到所述物体可以被携带到所述第二支撑单元的第二位置，第三支撑单元，用于允许加载;以及 通过装载/卸载装置卸载物体，第三支撑单元能够支撑物体，以及用于将装载/卸载装置从第一位置移动到第二位置的传送装置。

公开(公告)号：US5445486A

公开(公告)日：1995-08-29

申请号：US263216

申请日：1994-06-17

申请人： Hirofumi Kitayama ,  Hiroyuki Iwai ,  Shinichi Wada ,  Tetsu Oosawa

发明人： Hirofumi Kitayama ,  Hiroyuki Iwai ,  Shinichi Wada ,  Tetsu Oosawa

IPC分类号： B65G49/07 ,  H01L21/677 ,  H01L21/687 ,  B65G65/00

CPC分类号： H01L21/68707 ,  H01L21/67781 ,  Y10S414/137

摘要： According to the invention, there is provided a substrate transferring apparatus for transferring substrates from a substrate transport container containing a plurality of substrates to be treated to a substrate holder for holding a plurality of substrates to be treated or vice versa, the apparatus including arms for supporting substrate, a supporting member for supporting the arms, and a drive arrangement for driving the supporting member to operate. Each of the arms include a plate shaped arm main body having a connecting section for connecting the arm to the drive arrangement, supporting sections having a thickness greater than that of the arm main body for supporting corresponding peripheral areas of the substrate, and stoppers having a thickness greater than that of the supporting sections for abutting lateral sides of the substrate to rigidly hold the substrate.

摘要翻译： 根据本发明，提供了一种用于将衬底从含有待处理的多个衬底的衬底输送容器转移到用于保持多个待处理衬底或反之亦然的衬底保持器的衬底转移装置，该装置包括用于 支撑基板，用于支撑臂的支撑构件，以及用于驱动支撑构件进行操作的驱动装置。 每个臂包括板形臂主体，其具有用于将臂连接到驱动装置的连接部分，其具有大于臂主体的厚度的支撑部分，用于支撑基板的相应周边区域，并且具有 厚度大于用于邻接基板的侧面的支撑部分的厚度以刚性地保持基板。

公开(公告)号：US5405230A

公开(公告)日：1995-04-11

申请号：US857831

申请日：1992-03-26

申请人： Hiroo Ono ,  Tetsu Oosawa ,  Teruo Asakawa ,  Kenji Nebuka

发明人： Hiroo Ono ,  Tetsu Oosawa ,  Teruo Asakawa ,  Kenji Nebuka

IPC分类号： B65G47/80 ,  H01L21/00 ,  H01L21/677 ,  H01L21/68

CPC分类号： H01L21/67126 ,  H01L21/67265 ,  H01L21/67745 ,  Y10S414/136 ,  Y10S414/137 ,  Y10S414/139

摘要： A load-lock unit is disposed between first and second atmospheres, stores a wafer transferred from the first atmosphere, is blocked off from the first atmosphere, is thereafter set in the same atmosphere as or a similar atmosphere to the second atmosphere, and is opened to communicate with the second atmosphere in order to transfer the wafer to the second atmosphere. The load-lock unit includes a load-lock chamber, a storing device, disposed in the load-lock chamber, for storing a plurality of wafers vertically at a gap, a holding mechanism for holding one of the plurality of wafers stored in the storing device, a rotating mechanism for rotating the wafer held by the holding mechanism, and an error detecting device for detecting the positional error of the center of the wafer and an orientation error of the wafer on the basis of data obtained by radiating light on the wafer which is rotating.

摘要翻译： 装载锁定单元设置在第一和第二气氛之间，将从第一大气转移的晶片与第一大气隔绝，然后与第二大气相同或相似的气氛放置，打开 以与第二气氛通信，以将晶片转移到第二气氛。 所述装载锁定单元包括装载锁定室，存储装置，设置在所述装载锁定室中，用于在间隙上垂直地存储多个晶片;保持机构，用于保持存储在所述存储器中的所述多个晶片中的一个; 装置，用于旋转由保持机构保持的晶片的旋转机构，以及用于基于通过在晶片上照射光获得的数据来检测晶片的中心的位置误差和晶片的取向误差的误差检测装置 这是旋转。

公开(公告)号：US5340261A

公开(公告)日：1994-08-23

申请号：US857832

申请日：1992-03-26

申请人： Tetsu Oosawa ,  Teruo Asakawa ,  Kenji Nebuka ,  Hiroo Ono

发明人： Tetsu Oosawa ,  Teruo Asakawa ,  Kenji Nebuka ,  Hiroo Ono

IPC分类号： B65G47/80 ,  H01L21/00 ,  H01L21/677 ,  H01L21/68 ,  B65G1/06

CPC分类号： H01L21/67126 ,  H01L21/67745 ,  H01L21/681 ,  Y10S414/136 ,  Y10S414/137 ,  Y10S414/139

摘要： A load-lock unit is disposed between first and second atmospheres, for storing a wafer transferred from the first atmosphere, and which is blocked off from the first atmosphere, thereafter being set in an atmosphere at least substantially similar to the second atmosphere, and opened so as to communicate with the second atmosphere in order to transfer the wafer to the second atmosphere. The load-lock unit includes a load-lock chamber, a holding mechanism, disposed in the load-lock chamber for holding the wafer, a rotating mechanism for rotating the wafer held by the holding mechanism, and an error detecting mechanism for detecting a positional error of the center of the wafer and an orientation error of the wafer on the basis of data obtained by radiating light on the wafer which is rotating.

摘要翻译： 负载锁定单元设置在第一和第二气氛之间，用于存储从第一气氛转移的晶片，并从第一气氛中被阻挡，然后设置在至少基本上类似于第二气氛的气氛中，并打开 以便与第二气氛通信，以将晶片转移到第二气氛。 负载锁定单元包括：装载锁定室，保持机构，设置在用于保持晶片的装载锁定室中;旋转机构，用于使由保持机构保持的晶片旋转;以及错误检测机构，用于检测位置 基于通过在正在旋转的晶片上照射光而获得的数据，晶片的中心的误差和晶片的取向误差。

公开(公告)号：US6032083A

公开(公告)日：2000-02-29

申请号：US952977

申请日：1997-12-08

申请人： Tetsu Oosawa

发明人： Tetsu Oosawa

IPC分类号： B65G49/07 ,  H01L21/677 ,  H01L21/68 ,  H01L21/687 ,  G06F17/00

CPC分类号： H01L21/67778 ,  H01L21/68707

摘要： A substrate transfer apparatus (20) transfers a substrate between a first substrate support member (21) for supporting a plurality of substrates and a second substrate support member (15). This apparatus (20) includes a transfer apparatus main body (60) movable between a first transfer operation position where it can perform a substrate transfer operation with respect to the first substrate support member, and a second transfer operation position where it can perform a substrate transfer operation with respect to second substrate support member, a substrate receiving member (59b) arranged to be movable back and forth with respect to the transfer apparatus main body to support the substrate and to transfer the substrate to/from the first or second substrate support member, and non-contact sensors (70a, 70b) mounted on two side portions of the substrate receiving member (59b) and movable back and forth integrally with the substrate receiving member to detect a distance to the substrate and a position of the substrate in a horizontal plane.

摘要翻译： PCT No.PCT / JP96 / 01442 Sec。 371 1997年12月8日第 102（e）日期1997年12月8日PCT提交1996年5月29日PCT公布。 出版物WO96 / 41371 日本1996年12月19日一种基板转印装置（20）在用于支撑多个基板的第一基板支撑构件（21）和第二基板支撑构件（15）之间转移基板。 该装置（20）具有能够在能够进行与第一基板支撑部件的基板转印动作的第一转印操作位置和能够进行基板的第二转印操作位置之间移动的转印装置主体（60） 相对于第二基板支撑构件的转印操作;布置成可相对于转印设备主体来回移动的基板接收构件（59b），以支撑基板并将基板与第一或第二基板支撑件 构件和非接触式传感器（70a，70b），其安装在所述基板接收构件（59b）的两个侧部上并与所述基板接收构件一体地前后移动以检测到所述基板的距离和所述基板的位置 一个水平面。