Injection Flame Burner and Furnace Equipped With Same Burner and Method for Generating Flame
    3.
    发明申请
    Injection Flame Burner and Furnace Equipped With Same Burner and Method for Generating Flame 有权
    注射火焰燃烧器和配备相同燃烧器的炉子和产生火焰的方法

    公开(公告)号:US20100154789A1

    公开(公告)日:2010-06-24

    申请号:US12086498

    申请日:2006-12-13

    IPC分类号: F24C3/02

    摘要: An injection flame burner in which temperature of the generated flame itself can be sustained around the flame. A plurality of double structure injection nozzles each consisting of an outer tube and an inner tube provided coaxially with the outer tube, are arranged such that hydrogen gas is ejected from one of the outer tubes and the inner tubes and oxygen gas is ejected from the other tubes, and the injection port of each injection nozzle is located on the injection surface. Each injection nozzle includes at least one main injection nozzle having an inner tube formed to spread toward the injection surface side, another sub-injection nozzle arranged around the main injection nozzle, wherein gas is injected from the inner tube of the main injection nozzle under a higher pressure state as compared with gas injected from the sub-injection nozzle.

    摘要翻译: 一种喷射火焰燃烧器,其中所产生的火焰本身的温度可以在火焰周围维持。 由外管和与外管同轴设置的内管组成的多个双结构注射喷嘴被布置成使得氢气从外管和内管中的一个排出,氧气从另一个排出 管,并且每个注射喷嘴的注射口位于注射表面上。 每个喷射喷嘴包括至少一个主喷射喷嘴,其具有形成为朝向喷射表面侧扩散的内管,另一个分喷嘴,布置在主喷嘴周围,其中气体从主喷嘴的内管喷射到一个 与从副喷嘴喷射的气体相比具有更高的压力状态。

    Injection flame burner and furnace equipped with same burner and method for generating flame
    4.
    发明授权
    Injection flame burner and furnace equipped with same burner and method for generating flame 有权
    注射火焰燃烧器和炉子配备相同的燃烧器和产生火焰的方法

    公开(公告)号:US08419421B2

    公开(公告)日:2013-04-16

    申请号:US12086498

    申请日:2006-12-13

    IPC分类号: F23C7/00

    摘要: An injection flame burner in which temperature of the generated flame itself can be sustained around the flame. A plurality of double structure injection nozzles each consisting of an outer tube and an inner tube provided coaxially with the outer tube, are arranged such that hydrogen gas is ejected from one of the outer tubes and the inner tubes and oxygen gas is ejected from the other tubes, and the injection port of each injection nozzle is located on the injection surface. Each injection nozzle includes at least one main injection nozzle having an inner tube formed to spread toward the injection surface side, and another sub-injection nozzle arranged around the main injection nozzle, wherein gas is injected from the inner tube of the main injection nozzle under a higher pressure state as compared with gas injected from the sub-injection nozzle.

    摘要翻译: 一种喷射火焰燃烧器,其中所产生的火焰本身的温度可以在火焰周围维持。 由外管和与外管同轴设置的内管组成的多个双结构注射喷嘴被布置成使得氢气从外管和内管中的一个排出,氧气从另一个排出 管,并且每个注射喷嘴的注射口位于注射表面上。 每个注射喷嘴包括至少一个主喷射喷嘴,其具有形成为朝向喷射表面侧扩散的内管,以及设置在主喷射喷嘴周围的另一个副喷嘴,其中从主喷射喷嘴的内管喷射气体 与从副喷嘴喷射的气体相比具有较高的压力状态。

    Alkali-free glass substrate and process for producing the same
    5.
    发明授权
    Alkali-free glass substrate and process for producing the same 有权
    无碱玻璃基板及其制造方法

    公开(公告)号:US08281618B2

    公开(公告)日:2012-10-09

    申请号:US12097410

    申请日:2006-12-15

    IPC分类号: C03B17/00 C03B17/06

    摘要: The invention provides an alkali-free glass substrate small in the variation of the thermal shrinkage and a process for producing the same. An alkali-free glass substrate of the invention has an absolute value of a thermal shrinkage of 50 ppm or more when the alkali-free glass substrate is heated at a rate of 10° C./min from a room temperature, kept at a holding temperature of 450° C. for 10 hr and then cooled at a rate of 10° C./min.

    摘要翻译: 本发明提供了热收缩率变化较小的无碱玻璃基板及其制造方法。 当将无碱玻璃基板以10℃/分钟的速度从室温加热保持在保持状态时,本发明的无碱玻璃基板的热收缩绝对值为50ppm以上 温度为450℃10小时,然后以10℃/ min的速率冷却。

    Antibacterial rockwool growth medium for hydroponics
    6.
    发明授权
    Antibacterial rockwool growth medium for hydroponics 失效
    用于水培的抗菌石棉生长培养基

    公开(公告)号:US07060656B2

    公开(公告)日:2006-06-13

    申请号:US10738227

    申请日:2003-12-17

    摘要: An antibacterial rockwool growth medium for hydroponics is used for hydroponic growth of rice, flowers and ornamental plants, fruitage, etc. The medium includes a rockwool base used as a culture medium for hydroponics, and an inorganic antibacterial agent is dispersed substantially uniformly onto an overall surface of the rockwool base or a part of the surface of the rockwool base.

    摘要翻译: 用于水培的抗菌石棉生长培养基用于水稻,花卉和观赏植物,果实等的水培生长。该培养基包括用作水培培养基的岩棉基料,并且将无机抗菌剂基本均匀地分散在整体上 岩棉基部的表面或岩棉基部表面的一部分。

    Method for producing glass substrate and glass substrate
    7.
    发明授权
    Method for producing glass substrate and glass substrate 有权
    玻璃基板和玻璃基板的制造方法

    公开(公告)号:US09199869B2

    公开(公告)日:2015-12-01

    申请号:US13636474

    申请日:2011-03-22

    IPC分类号: C03B17/06 C03C3/091 C03B25/00

    摘要: The present invention is aimed to provide a method for producing a glass substrate with a thickness of not more than 200 μm, which is satisfied with the quality required for a substrate on which a thin-film electric circuit is formed, and a sheet glass substrate obtained according to this method. The present invention is concerned with a method for producing a glass substrate having a sheet thickness of from 10 to 200 μm, including a forming step of forming a molten glass into a ribbon shape in accordance with a down draw method, an annealing step of annealing the glass ribbon, and a cutting step of cutting the glass ribbon to give a glass substrate, wherein an average cooling rate in a temperature range of from the (annealing point+200° C.) to the (annealing point+50° C.) is controlled to the range of from 300 to 2,500° C./min.

    摘要翻译: 本发明的目的在于提供一种厚度不大于200μm的玻璃基板的制造方法,其满足形成有薄膜电路的基板所需的质量,玻璃基板 根据这种方法获得。 本发明涉及一种片材厚度为10〜200μm的玻璃基板的制造方法,其特征在于,包括使用下拉法将熔融玻璃形成为带状的成形工序,退火退火工序 玻璃带和切割玻璃带以得到玻璃基板的切割步骤,其中在(退火点+ 200℃)至(退火点+ 50℃)的温度范围内的平均冷却速度 )控制在300至2,500℃/分钟的范围内。

    METHOD FOR PRODUCING GLASS SUBSTRATE AND GLASS SUBSTRATE
    8.
    发明申请
    METHOD FOR PRODUCING GLASS SUBSTRATE AND GLASS SUBSTRATE 有权
    生产玻璃基板和玻璃基板的方法

    公开(公告)号:US20130017366A1

    公开(公告)日:2013-01-17

    申请号:US13636474

    申请日:2011-03-22

    IPC分类号: C03B17/06 C03C3/091 C03B25/00

    摘要: The present invention is aimed to provide a method for producing a glass substrate with a thickness of not more than 200 μm, which is satisfied with the quality required for a substrate on which a thin-film electric circuit is formed, and a sheet glass substrate obtained according to this method. The present invention is concerned with a method for producing a glass substrate having a sheet thickness of from 10 to 200 μm, including a forming step of forming a molten glass into a ribbon shape in accordance with a down draw method, an annealing step of annealing the glass ribbon, and a cutting step of cutting the glass ribbon to give a glass substrate, wherein an average cooling rate in a temperature range of from the (annealing point+200° C.) to the (annealing point+50° C.) is controlled to the range of from 300 to 2,500° C./min.

    摘要翻译: 本发明的目的在于提供一种厚度不大于200μm的玻璃基板的制造方法,其满足形成有薄膜电路的基板所需的质量,玻璃基板 根据这种方法获得。 本发明涉及一种片材厚度为10〜200μm的玻璃基板的制造方法,其特征在于,包括:按照拉伸法将熔融玻璃形成为带状的成形工序,退火退火工序 玻璃带和切割玻璃带以得到玻璃基板的切割步骤,其中在(退火点+ 200℃)至(退火点+ 50℃)的温度范围内的平均冷却速度 )控制在300至2,500℃/分钟的范围内。

    Brake lining material for heavy-load braking device
    9.
    发明授权
    Brake lining material for heavy-load braking device 失效
    用于重载制动装置的制动衬片材料

    公开(公告)号:US5841042A

    公开(公告)日:1998-11-24

    申请号:US639688

    申请日:1996-04-29

    申请人: Yoshinari Kato

    发明人: Yoshinari Kato

    CPC分类号: F16D69/027 C22C32/0089

    摘要: The present invention is related to a brake lining material for a heavy-load braking device. The present invention is to provide a novel brake lining material which can have extended useful life under heavy-load conditions, can retain stable coefficients of friction under such heavy load conditions, can have appropriate wear resistance and can reduce the wear of its opponent material significantly. In accordance with the present invention,the novel brake lining material is provided which comprises copper-base metal powder, refractory material powder and graphite powder, the metal powder containing iron powder and titanium powder and being used as a matrix, the refractory material powder and the graphite powder being sintered together with this matrix in a uniformly distributed state in the powder. For example, a brake lining material for a heavy-load braking device is provided, which comprises, on a base of its total weight, 10 to 20 % refractory material powder, 15 to 25 % graphite powder and, as the remainder, copper-base metal powder, in which the refractory material powder are sintered together with the copper-base metal powder in a uniformly distributed state in the powder.

    摘要翻译: 本发明涉及一种用于重载制动装置的制动衬片材料。 本发明提供一种新颖的制动衬片材料,其在重负载条件下具有延长的使用寿命,能够在这种重载条件下保持稳定的摩擦系数,具有适当的耐磨性,并能显着降低其对手材料的磨损 。 根据本发明,提供了新型制动衬片材料,其包括铜基金属粉末,耐火材料粉末和石墨粉末,含有铁粉和钛粉末的金属粉末,用作基质,耐火材料粉末和 石墨粉末与粉末中均匀分布的状态与该基体一起烧结。 例如,提供了用于重负载制动装置的制动衬片材料,其总重量为10至20%的耐火材料粉末,15至25%的石墨粉末,其余为铜 - 贱金属粉末,其中将耐火材料粉末与铜基金属粉末以均匀分布的状态一起烧结在粉末中。

    Process for producing glass substrate and glass substrate
    10.
    发明授权
    Process for producing glass substrate and glass substrate 有权
    玻璃基板和玻璃基板的制造方法

    公开(公告)号:US08136371B2

    公开(公告)日:2012-03-20

    申请号:US12361941

    申请日:2009-01-29

    IPC分类号: C03B17/06 C03B25/10 C03B25/12

    摘要: Provided are a process for producing a glass substrate usable for low-temperature p-SiTFT substrates directly in accordance with a down draw method, and the glass substrate obtained by the process. The process for producing a glass substrate includes a forming step of forming a molten glass into a ribbon shape in accordance with a down draw method, an annealing step of annealing the glass ribbon, and a cutting step of cutting the glass ribbon to give a glass substrate, in which, in the annealing step, an average cooling rate from the annealing point to the (annealing point −50° C.) is lower than an average cooling rate from the (annealing point +100° C.) to the annealing point.

    摘要翻译: 本发明提供一种直接使用下拉法制造可用于低温p-SiTFT基板的玻璃基板的方法以及通过该方法得到的玻璃基板。 制造玻璃基板的方法包括:根据下拉法形成熔融玻璃成形状的成形步骤,退火玻璃带的退火步骤以及切割玻璃带以得到玻璃的切割步骤 在退火步骤中,从退火点到(退火点-50℃)的平均冷却速度低于从(退火点+ 100℃)到退火的平均冷却速度的基板 点。