公开(公告)号：US20080299301A1

公开(公告)日：2008-12-04

申请号：US12154539

申请日：2008-05-23

申请人： Hirotaka Sone ,  Wataru Omuro ,  Mitsuharu Muta ,  Katsuya Yamamoto

发明人： Hirotaka Sone ,  Wataru Omuro ,  Mitsuharu Muta ,  Katsuya Yamamoto

IPC分类号： B05D5/12

CPC分类号： H01L51/5206 ,  H01L51/5237

摘要： The present invention discloses a method for processing a substrate on which transparent electrode made of metal oxide is formed before forming an organic EL element on the transparent electrode. According to the method, the substrate is accommodated in a bake chamber provided with a heater. The substrate is heated while mixed gas of oxygen and nitrogen is introduced into the bake chamber so as to replace the gas in the bake chamber. The mixed gas is introduced into the bake chamber in an amount that is 1/60 or more and 1/15 or less of a whole volume of the bake chamber per minute. According to this method, moisture is removed and an appropriate surface treatment is performed for the transparent electrode of metal oxide at the same time.

摘要翻译： 本发明公开了在透明电极上形成有机EL元件之前，在其上形成由金属氧化物构成的透明电极的基板的处理方法。 根据该方法，将基板容纳在设置有加热器的烘焙室中。 加热基板，同时将氧和氮的混合气体引入烘焙室中，以便更换烘烤室中的气体。 混合气体以每分钟烘烤室总体积的1/60以上且1/15以下的量引入烘烤室。 根据该方法，除去水分，同时对金属氧化物的透明电极进行适当的表面处理。

公开(公告)号：US20080302391A1

公开(公告)日：2008-12-11

申请号：US12154175

申请日：2008-05-21

申请人： Hirotaka Sone

发明人： Hirotaka Sone

IPC分类号： B08B3/08

CPC分类号： B08B3/08 ,  B08B3/102 ,  C11D7/5004 ,  C11D11/0047

摘要： A method for cleaning a metal mask is disclosed. The method includes washing the metal mask with an organic solvent that dissolves an organic substance adhered to the metal mask, washing, with pure water, the metal mask from which the adhering substance has been removed, and vacuum drying the metal mask that has been washed with the pure water.

摘要翻译： 公开了一种清洁金属掩模的方法。 该方法包括用溶解附着在金属掩模上的有机物质的有机溶剂洗涤金属掩模，用纯水洗涤除去粘附物质的金属掩模，并将已洗涤的金属掩模真空干燥 用纯净水。

公开(公告)号：US20080289754A1

公开(公告)日：2008-11-27

申请号：US12154183

申请日：2008-05-21

申请人： Hirotaka Sone ,  Toshio Okuni ,  Kimihiko Yoshino

发明人： Hirotaka Sone ,  Toshio Okuni ,  Kimihiko Yoshino

IPC分类号： B32B37/06

CPC分类号： H01L51/56 ,  C23C14/042 ,  H01L51/0011

摘要： A substrate mark is formed on a transparent substrate as an alignment mark. The substrate mark is formed at the same time as transparent electrodes are formed on the transparent substrate. The substrate mark is formed of the same material as the transparent electrodes. A center wavelength of a transmission wavelength of a plurality of optical filters is different from each other. An optical filter corresponding to a thickness of the substrate mark is selected from a plurality of optical filters. Light is irradiated from a white light source to the substrate mark via the selected optical filter. Accordingly, the substrate mark is recognized and a shadow mask is aligned with the transparent substrate.

摘要翻译： 在透明基板上形成基板标记作为对准标记。 在透明基板上形成透明电极的同时形成基板标记。 基板标记由与透明电极相同的材料形成。 多个滤光器的透射波长的中心波长彼此不同。 从多个滤光器中选择与衬底标记的厚度相对应的滤光器。 光通过所选择的滤光器从白光源照射到衬底标记。 因此，识别基板标记并且将荫罩与透明基板对准。