Defect inspection device and defect inspection method
    1.
    发明授权
    Defect inspection device and defect inspection method 有权
    缺陷检查装置和缺陷检查方法

    公开(公告)号:US08634069B2

    公开(公告)日:2014-01-21

    申请号:US12992903

    申请日:2009-05-13

    IPC分类号: G01N21/88

    摘要: A defect inspection device, which inspects defects such as foreign materials existing on a specimen on which a circuit pattern of wiring or the like is formed, is provided with an illumination optical system which illuminates a plurality of different areas the specimen with a plurality of linear shaped beams and an image forming optical system that forms images of the plurality of the illuminated areas on a plurality of detectors, and the detectors are configured to receive a plurality of polarization components substantially at the same time and individually, wherein the polarization components are different from each other and are contained in each of the plurality of the optical images formed by the image forming optical system, thereby detecting a plurality of signals corresponding to the polarization components and carrying out the inspection at high speed under a plurality of optical conditions.

    摘要翻译: 检查存在于其上形成有布线等的电路图案的样本上存在的异物的缺陷检查装置设置有照明光学系统,该照明光学系统用多个线性照射多个不同的区域 以及形成在多个检测器上的多个照明区域的图像的图像形成光学系统,并且检测器被配置为基本上同时和单独地接收多个偏振分量,其中偏振分量是不同的 并且被包含在由图像形成光学系统形成的多个光学图像的每一个中,从而检测对应于偏振分量的多个信号,并且在多个光学条件下高速执行检查。

    Method and apparatus for detecting defects
    2.
    发明授权
    Method and apparatus for detecting defects 失效
    检测缺陷的方法和装置

    公开(公告)号:US07528942B2

    公开(公告)日:2009-05-05

    申请号:US11472426

    申请日:2006-06-22

    IPC分类号: G01N21/88

    摘要: A method and apparatus for detecting defects are provided for detecting harmful defects or foreign matter with high sensitivity on an object to be inspected with a transparent film, such as an oxide film, by reducing noise due to a circuit pattern. The apparatus for detecting defects includes a stage part on which a substrate specimen is put and which is arbitrarily movable in each of the X-Y-Z-θ directions, an illumination system for irradiating the circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. Furthermore, a spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector from the specimen is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip. If these signals are not identical to each other, the foreign matter is determined to exist on the specimen in detection.

    摘要翻译: 提供一种用于检测缺陷的方法和装置,用于通过减少由于电路图案引起的噪声来检测对诸如氧化物膜的透明膜在内的待检查物体的高灵敏度的有害缺陷或异物。 用于检测缺陷的装置包括:载置基板试样的载台部分,其可以在XYZ-θ方向中任意移动;照射系统,用于利用来自倾斜方向的光照射电路图案;以及图像形成 光学系统,用于从上下方向在检测器上形成照射的检测区域的图像。 利用这种布置,收集通过照明系统的照明在电路图案上产生的衍射光和散射光。 此外,在傅立叶变换表面上提供空间滤波器,用于阻挡来自电路图形的线性部分的衍射光。 由检测器从样本接收的散射和反射光被转换成电信号。 将一个芯片的转换电信号与另一个芯片的转换电信号进行比较。 如果这些信号彼此不相同,则检测到异物被确定为存在于样品上。

    Method and apparatus for detecting defects
    3.
    发明授权
    Method and apparatus for detecting defects 失效
    检测缺陷的方法和装置

    公开(公告)号:US08462330B2

    公开(公告)日:2013-06-11

    申请号:US13362808

    申请日:2012-01-31

    IPC分类号: G01N21/88

    摘要: A method and apparatus for detecting defects are provided for detecting defects or foreign matter on an object to be inspected. The apparatus includes a movable stage for mounting a specimen, an illumination system for irradiating a circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. A spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip.

    摘要翻译: 提供一种用于检测缺陷的方法和装置,用于检测被检测物体上的缺陷或异物。 该装置包括用于安装样本的可移动台,用于从倾斜方向的光照射电路图案的照明系统和用于从上方和倾斜形成检测器上的照射检测区域的图像的图像形成光学系统 方向。 利用这种布置,收集通过照明系统的照明在电路图案上产生的衍射光和散射光。 在傅立叶变换表面上提供空间滤波器,用于阻挡来自电路图形的线性部分的衍射光。 由检测器接收的散射和反射光被转换成电信号。 将一个芯片的转换电信号与另一个芯片的转换电信号进行比较。

    Method and apparatus for detecting defects
    4.
    发明授权
    Method and apparatus for detecting defects 失效
    检测缺陷的方法和装置

    公开(公告)号:US07751037B2

    公开(公告)日:2010-07-06

    申请号:US12435523

    申请日:2009-05-05

    IPC分类号: G01N21/958 G01N21/88

    摘要: A method and apparatus for detecting defects are provided for detecting harmful defects or foreign matter with high sensitivity on an object to be inspected with a transparent film, such as an oxide film, by reducing noise due to a circuit pattern. The apparatus for detecting defects includes a stage part on which a substrate specimen is put and which is arbitrarily movable in each of the X-Y-Z-θ directions, an illumination system for irradiating the circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. Furthermore, a spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector from the specimen is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip. If these signals are not identical to each other, the foreign matter is determined to exist on the specimen in detection.

    摘要翻译: 提供一种用于检测缺陷的方法和装置,用于通过减少由于电路图案引起的噪声来检测对诸如氧化物膜的透明膜在内的待检查物体的高灵敏度的有害缺陷或异物。 用于检测缺陷的装置包括放置基板样本并可在X-Y-Z-中的每个中任意移动的台部; 方向,用于利用来自倾斜方向的光照射电路图案的照明系统,以及用于从上下方向在检测器上形成照射的检测区域的图像的图像形成光学系统。 利用这种布置,收集通过照明系统的照明在电路图案上产生的衍射光和散射光。 此外,在傅立叶变换表面上提供空间滤波器,用于阻挡来自电路图形的线性部分的衍射光。 由检测器从样本接收的散射和反射光被转换成电信号。 将一个芯片的转换电信号与另一个芯片的转换电信号进行比较。 如果这些信号彼此不相同,则检测到异物被确定为存在于样品上。

    Method and apparatus for detecting defects
    5.
    发明授权
    Method and apparatus for detecting defects 有权
    检测缺陷的方法和装置

    公开(公告)号:US08107065B2

    公开(公告)日:2012-01-31

    申请号:US12831102

    申请日:2010-07-06

    IPC分类号: G01N21/88

    摘要: A method and apparatus for detecting defects are provided for detecting harmful defects or foreign matter with high sensitivity on an object to be inspected with a transparent film, such as an oxide film, by reducing noise due to a circuit pattern. The apparatus for detecting defects includes a stage part on which a substrate specimen is put and which is arbitrarily movable in each of the X-Y-Z-θ directions, an illumination system for irradiating the circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. Furthermore, a spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector from the specimen is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip. If these signals are not identical to each other, the foreign matter is determined to exist on the specimen in detection.

    摘要翻译: 提供一种用于检测缺陷的方法和装置,用于通过减少由于电路图案引起的噪声来检测对诸如氧化物膜的透明膜在内的待检查物体的高灵敏度的有害缺陷或异物。 用于检测缺陷的装置包括放置基板样本并可在X-Y-Z-中的每个中任意移动的台部; 方向,用于利用来自倾斜方向的光照射电路图案的照明系统,以及用于从上下方向在检测器上形成照射的检测区域的图像的图像形成光学系统。 利用这种布置,收集通过照明系统的照明在电路图案上产生的衍射光和散射光。 此外,在傅立叶变换表面上提供空间滤波器,用于阻挡来自电路图形的线性部分的衍射光。 由检测器从样本接收的散射和反射光被转换成电信号。 将一个芯片的转换电信号与另一个芯片的转换电信号进行比较。 如果这些信号彼此不相同,则检测到异物被确定为存在于样品上。

    METHOD AND APPARATUS FOR DETECTING DEFECTS
    6.
    发明申请
    METHOD AND APPARATUS FOR DETECTING DEFECTS 失效
    检测缺陷的方法和装置

    公开(公告)号:US20120194809A1

    公开(公告)日:2012-08-02

    申请号:US13362808

    申请日:2012-01-31

    IPC分类号: G01N21/956

    摘要: A method and apparatus for detecting defects are provided for detecting defects or foreign matter on an object to be inspected. The apparatus includes a movable stage for mounting a specimen, an illumination system for irradiating a circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. A spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip.

    摘要翻译: 提供一种用于检测缺陷的方法和装置,用于检测被检测物体上的缺陷或异物。 该装置包括用于安装样本的可移动台,用于从倾斜方向的光照射电路图案的照明系统和用于从上方和倾斜形成检测器上的照射检测区域的图像的图像形成光学系统 方向。 利用这种布置,收集通过照明系统的照明在电路图案上产生的衍射光和散射光。 在傅立叶变换表面上提供空间滤波器,用于阻挡来自电路图形的线性部分的衍射光。 由检测器接收的散射和反射光被转换成电信号。 将一个芯片的转换电信号与另一个芯片的转换电信号进行比较。

    DEFECT INSPECTION DEVICE AND DEFECT INSPECTION METHOD
    7.
    发明申请
    DEFECT INSPECTION DEVICE AND DEFECT INSPECTION METHOD 有权
    缺陷检查装置和缺陷检查方法

    公开(公告)号:US20110149275A1

    公开(公告)日:2011-06-23

    申请号:US12992903

    申请日:2009-05-13

    IPC分类号: G01N21/956

    摘要: A defect inspection device, which inspects defects such as foreign materials existing on a specimen on which a circuit pattern of wiring or the like is formed, is provided with an illumination optical system which illuminates a plurality of different areas the specimen with a plurality of linear shaped beams and an image forming optical system that forms images of the plurality of the illuminated areas on a plurality of detectors, and the detectors are configured to receive a plurality of polarization components substantially at the same time and individually, wherein the polarization components are different from each other and are contained in each of the plurality of the optical images formed by the image forming optical system, thereby detecting a plurality of signals corresponding to the polarization components and carrying out the inspection at high speed under a plurality of optical conditions.

    摘要翻译: 检查存在于其上形成有布线等的电路图案的样本上存在的异物的缺陷检查装置设置有照明光学系统,该照明光学系统用多个线性照射多个不同的区域 以及形成在多个检测器上的多个照明区域的图像的图像形成光学系统,并且检测器被配置为基本上同时和单独地接收多个偏振分量,其中偏振分量是不同的 并且被包含在由图像形成光学系统形成的多个光学图像的每一个中,从而检测对应于偏振分量的多个信号,并且在多个光学条件下高速执行检查。

    METHOD AND APPARATUS FOR DETECTING DEFECTS
    8.
    发明申请
    METHOD AND APPARATUS FOR DETECTING DEFECTS 有权
    检测缺陷的方法和装置

    公开(公告)号:US20100271628A1

    公开(公告)日:2010-10-28

    申请号:US12831102

    申请日:2010-07-06

    IPC分类号: G01N21/88

    摘要: A method and apparatus for detecting defects are provided for detecting harmful defects or foreign matter with high sensitivity on an object to be inspected with a transparent film, such as an oxide film, by reducing noise due to a circuit pattern. The apparatus for detecting defects includes a stage part on which a substrate specimen is put and which is arbitrarily movable in each of the X-Y-Z-θ directions, an illumination system for irradiating the circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. Furthermore, a spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector from the specimen is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip. If these signals are not identical to each other, the foreign matter is determined to exist on the specimen in detection.

    摘要翻译: 提供一种用于检测缺陷的方法和装置,用于通过减少由于电路图案引起的噪声来检测对诸如氧化物膜的透明膜在内的待检查物体的高灵敏度的有害缺陷或异物。 用于检测缺陷的装置包括放置基板样本并可在X-Y-Z-中的每个中任意移动的台部; 方向,用于利用来自倾斜方向的光照射电路图案的照明系统,以及用于从上下方向在检测器上形成照射的检测区域的图像的图像形成光学系统。 利用这种布置,收集通过照明系统的照明在电路图案上产生的衍射光和散射光。 此外,在傅立叶变换表面上提供空间滤波器,用于阻挡来自电路图形的线性部分的衍射光。 由检测器从样本接收的散射和反射光被转换成电信号。 将一个芯片的转换电信号与另一个芯片的转换电信号进行比较。 如果这些信号彼此不相同,则检测到异物被确定为存在于样品上。

    METHOD AND APPARATUS FOR DETECTING DEFECTS
    9.
    发明申请
    METHOD AND APPARATUS FOR DETECTING DEFECTS 失效
    检测缺陷的方法和装置

    公开(公告)号:US20090213366A1

    公开(公告)日:2009-08-27

    申请号:US12435523

    申请日:2009-05-05

    IPC分类号: G01N21/958

    摘要: A method and apparatus for detecting defects are provided for detecting harmful defects or foreign matter with high sensitivity on an object to be inspected with a transparent film, such as an oxide film, by reducing noise due to a circuit pattern. The apparatus for detecting defects includes a stage part on which a substrate specimen is put and which is arbitrarily movable in each of the X-Y-Z-θ directions, an illumination system for irradiating the circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. Furthermore, a spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector from the specimen is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip. If these signals are not identical to each other, the foreign matter is determined to exist on the specimen in detection.

    摘要翻译: 提供一种用于检测缺陷的方法和装置,用于通过减少由于电路图案引起的噪声来检测对诸如氧化物膜的透明膜在内的待检查物体的高灵敏度的有害缺陷或异物。 用于检测缺陷的装置包括:载置基板试样的载台部分,其可以在XYZ-θ方向中任意移动;照射系统,用于利用来自倾斜方向的光照射电路图案;以及图像形成 光学系统,用于从上下方向在检测器上形成照射的检测区域的图像。 利用这种布置,收集通过照明系统的照明在电路图案上产生的衍射光和散射光。 此外,在傅立叶变换表面上提供空间滤波器,用于阻挡来自电路图形的线性部分的衍射光。 由检测器从样本接收的散射和反射光被转换成电信号。 将一个芯片的转换电信号与另一个芯片的转换电信号进行比较。 如果这些信号彼此不相同,则检测到异物被确定为存在于样品上。

    Method and apparatus for detecting defects

    公开(公告)号:US20060290923A1

    公开(公告)日:2006-12-28

    申请号:US11472426

    申请日:2006-06-22

    IPC分类号: G01N21/88

    摘要: A method and apparatus for detecting defects are provided for detecting harmful defects or foreign matter with high sensitivity on an object to be inspected with a transparent film, such as an oxide film, by reducing noise due to a circuit pattern. The apparatus for detecting defects includes a stage part on which a substrate specimen is put and which is arbitrarily movable in each of the X-Y-Z-θ directions, an illumination system for irradiating the circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. Furthermore, a spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector from the specimen is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip. If these signals are not identical to each other, the foreign matter is determined to exist on the specimen in detection.