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1.发明授权
公开(公告)号：US5087482A
公开(公告)日：1992-02-11
申请号：US684573
申请日：1991-04-12
申请人： Hisao Kawai , Akinori Kurikawa , Hisanori Suzuki
发明人： Hisao Kawai , Akinori Kurikawa , Hisanori Suzuki
摘要： In a magnetic recording medium comprising a substrate of either a glass material or a ceramic material, a magnetic layer, a protection layer, and a lubricant layer, the protection layer comprises a first protection layer of a nonmagnetic material on the magnetic film and a second protection film of an inorganic compound on the first protection layer. The first protection film may be composed of at least one material selected from nonmagnetic metals, semiconductors, and their compounds and may have a thickness between 20 and 150 angstroms while the second protection film is formed by an inorganic oxide film and hard minute particles which have an average particle size between 50 and 300 angstroms and which are dispersed into the inorganic oxide film. The substrate provides a principal surface having a surface roughness which is not greater than 100 angstroms when the surface roughness is represented by a maximum height (Rmax), which provides a medium principal surface having a surface roughness between 50 and 300 angstroms.
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2.发明授权Magnetic recording medium capable of recording information at a high recording density 失效能够以高记录密度记录信息的磁记录介质
公开(公告)号：US5029317A
公开(公告)日：1991-07-02
申请号：US531024
申请日：1990-05-31
申请人： Hisao Kawai , Akinori Kurikawa , Hisanori Suzuki
发明人： Hisao Kawai , Akinori Kurikawa , Hisanori Suzuki
摘要： In a magnetic recording medium comprising a substrate of either a glass material or a ceramic material, a magnetic layer, a protection layer, and a lubricant layer, the protection layer comprises a first protection layer of a nonmagnetic material on the magnetic film and a second protection film of an inorganic compound on the first protection layer. The first protection film may be composed of at least one material selected from nonmagnetic metals, semiconductors, and their compounds and may have a thickness between 20 and 150 angstroms while the second protection film is formed by an inorganic oxide film and hard minute particles which have an average particle size between 50 and 300 angstroms and which are dispersed into the inorganic oxide film. The substrate provides a principal surface having a surface roughness which is not greater than 100 angstroms when the surface roughness is represented by a maximum height (Rmax), which provides a medium principal surface having a surface roughness between 50 and 300 angstroms.
摘要翻译： 在包括玻璃材料或陶瓷材料的衬底，磁性层，保护层和润滑剂层的磁记录介质中，保护层包括在磁性膜上的非磁性材料的第一保护层和第二保护层 第一保护层上的无机化合物的保护膜。 第一保护膜可以由选自非磁性金属，半导体及其化合物中的至少一种材料组成，并且可以具有20至150埃的厚度，而第二保护膜由无机氧化物膜和具有 平均粒径为50-300埃，分散在无机氧化物膜中。 当表面粗糙度由最大高度（Rmax）表示时，衬底提供具有不大于100埃的表面粗糙度的主表面，其提供表面粗糙度在50和300埃之间的介质主表面。
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3.发明授权Mask blank glass substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, mask blank glass substrate, mask blank, and mask 有权掩模坯料玻璃基板的制造方法，掩模坯料的制造方法，掩模制造方法，掩模坯料玻璃基板，掩模坯料和掩模公开(公告)号：US07955763B2
公开(公告)日：2011-06-07
申请号：US12946360
申请日：2010-11-15
CPC分类号： G03F1/38 , Y10T428/31616
摘要： A method of manufacturing a mask blank glass substrate or mask blank that includes a mark forming step, and a mask blank glass substrate or mask blank that includes a mark. The mark is a pit formed by irradiating laser light onto a mirror-like surface in an area, having no influence on transfer, on a surface of the mask blank glass substrate. The pit is used as a marker for individually identifying or managing the mask blank glass substrate. The marker may be correlated with information including at least one of substrate information about the mask blank glass substrate, thin film information about the mask pattern thin film, and resist film information about the resist film. A mask blank glass substrate with marker correlated to at least one of the resist film information and thin film information may be used to manufacture a new mask blank.
摘要翻译： 包括标记形成步骤的掩模坯料玻璃基板或掩模坯料的制造方法以及包括标记的掩模坯料玻璃基板或掩模坯料。 标记是通过在掩模坯料玻璃基板的表面上将激光照射到不影响转印的区域中的镜状表面上形成的凹坑。 凹坑用作单独识别或管理掩模坯料玻璃基板的标记。 标记可以与包括关于掩模坯料玻璃基板的基板信息，关于掩模图案薄膜的薄膜信息和关于抗蚀剂膜的抗蚀剂膜信息中的至少一个的信息相关联。 可以使用具有与抗蚀剂膜信息和薄膜信息中的至少一个相关的标记的掩模坯料玻璃基板来制造新的掩模坯料。
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4.发明授权Mask blank glass substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, mask blank glass substrate, mask blank, and mask 有权掩模坯料玻璃基板的制造方法，掩模坯料的制造方法，掩模制造方法，掩模坯料玻璃基板，掩模坯料和掩模公开(公告)号：US07851108B2
公开(公告)日：2010-12-14
申请号：US11391332
申请日：2006-03-29
CPC分类号： G03F1/38 , Y10T428/31616
摘要： A method of manufacturing a mask blank glass substrate or mask blank that includes a mark forming step, and a mask blank glass substrate or mask blank that includes a mark. The mark is a pit formed by irradiating laser light onto a mirror-like surface in an area, having no influence on transfer, on a surface of the mask blank glass substrate. The pit is used as a marker for individually identifying or managing the mask blank glass substrate. The marker may be correlated with information including at least one of substrate information about the mask blank glass substrate, thin film information about the mask pattern thin film, and resist film information about the resist film. A mask blank glass substrate with marker correlated to at least one of the resist film information and thin film information may be used to manufacture a new mask blank.
摘要翻译： 包括标记形成步骤的掩模坯料玻璃基板或掩模坯料的制造方法以及包括标记的掩模坯料玻璃基板或掩模坯料。 标记是通过在掩模坯料玻璃基板的表面上将激光照射到不影响转印的区域中的镜状表面上形成的凹坑。 凹坑用作单独识别或管理掩模坯料玻璃基板的标记。 标记可以与包括关于掩模坯料玻璃基板的基板信息，关于掩模图案薄膜的薄膜信息和关于抗蚀剂膜的抗蚀剂膜信息中的至少一个的信息相关联。 具有与抗蚀剂膜信息和薄膜信息中的至少一个相关的标记的掩模坯料玻璃基板可以用于制造新的掩模坯料。
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5.发明申请Container for housing a mask blank, method of housing a mask blank, and mask blank package 有权用于容纳面罩坯料的容器，容纳掩模坯料的方法和掩模坯料包装公开(公告)号：US20050006266A1
公开(公告)日：2005-01-13
申请号：US10886039
申请日：2004-07-08
申请人： Akinori Kurikawa
发明人： Akinori Kurikawa
IPC分类号： B65D85/48 , B65D85/86 , H01L21/02 , H01L21/673 , B65D5/00
CPC分类号： H01L21/67353 , G03F1/66 , H01L21/67359 , H01L21/67376 , Y10T428/13 , Y10T428/1352
摘要： A container is adapted to receive a mask blank having a resist film and includes a container body having an upper opening and a cap put on the container body. The container body has an opening edge provided with an annular elastic member made of polyolefin elastomer or the like and extending throughout entire circumference. When the cap is put on the container body, the elastic member is interposed at a joint portion between the cap and the container body to hermetically seal the container.
摘要翻译： 容器适于接收具有抗蚀剂膜的掩模坯料，并且包括具有上开口和盖在容器主体上的盖的容器本体。 容器主体具有设置有由聚烯烃弹性体等制成的环状弹性构件并且在整个圆周上延伸的开口边缘。 当将盖子放在容器主体上时，弹性件插入到盖和容器主体之间的接合部分处以密封容器。
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6.发明授权Container for housing a mask blank, method of housing a mask blank, and mask blank package 有权用于容纳面罩坯料的容器，容纳掩模坯料的方法和掩模坯料包装公开(公告)号：US07838182B2
公开(公告)日：2010-11-23
申请号：US12242116
申请日：2008-09-30
申请人： Akinori Kurikawa
发明人： Akinori Kurikawa
CPC分类号： H01L21/67353 , G03F1/66 , H01L21/67359 , H01L21/67376 , Y10T428/13 , Y10T428/1352
摘要： A container is adapted to receive a mask blank having a resist film and includes a container body having an upper opening and a cap put on the container body. The container body has an opening edge provided with an annular elastic member made of polyolefin elastomer or the like and extending throughout entire circumference. When the cap is put on the container body, the elastic member is interposed at a joint portion between the cap and the container body to hermetically seal the container.
摘要翻译： 容器适于接收具有抗蚀剂膜的掩模坯料，并且包括具有上开口和盖在容器主体上的盖的容器本体。 容器主体具有设置有由聚烯烃弹性体等制成的环状弹性构件并且在整个圆周上延伸的开口边缘。 当将盖子放在容器主体上时，弹性件插入到盖和容器主体之间的接合部分处以密封容器。
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7.发明授权Container for housing a mask blank, method of housing a mask blank, and mask blank package 有权用于容纳面罩坯料的容器，容纳掩模坯料的方法和掩模坯料包装公开(公告)号：US07463338B2
公开(公告)日：2008-12-09
申请号：US10886039
申请日：2004-07-08
申请人： Akinori Kurikawa
发明人： Akinori Kurikawa
IPC分类号： G03B27/62
CPC分类号： H01L21/67353 , G03F1/66 , H01L21/67359 , H01L21/67376 , Y10T428/13 , Y10T428/1352
摘要： A container is adapted to receive a mask blank having a resist film and includes a container body having an upper opening and a cap put on the container body. The container body has an opening edge provided with an annular elastic member made of polyolefin elastomer or the like and extending throughout entire circumference. When the cap is put on the container body, the elastic member is interposed at a joint portion between the cap and the container body to hermetically seal the container.
摘要翻译： 容器适于接收具有抗蚀剂膜的掩模坯料，并且包括具有上开口和盖在容器主体上的盖的容器本体。 容器主体具有设置有由聚烯烃弹性体等制成的环状弹性构件并且在整个圆周上延伸的开口边缘。 当将盖子放在容器主体上时，弹性件插入到盖和容器主体之间的接合部分处以密封容器。
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8.发明申请Supporting Member For Thin-Film-Coated Boards, Storage Container For Thin-Film-Coated Boards, Mask-Blank-Storing Body, Transfer-Mask-Storing Body, and Method For Transporting Thin-Film-Coated Boards 审中-公开薄膜涂布板的支撑部件，薄膜涂布板的储存容器，掩模坯料存储体，转印掩模存储体以及薄膜涂布板的输送方法公开(公告)号：US20080257779A1
公开(公告)日：2008-10-23
申请号：US11883386
申请日：2005-09-29
申请人： Akinori Kurikawa
发明人： Akinori Kurikawa
IPC分类号： H01L21/673 , B65D85/86 , A47G19/08
CPC分类号： H01L21/67359 , B65D2585/86 , G03F1/66 , G03F7/70741 , G03F7/70916 , H01L21/67366 , H01L21/67383
摘要： The present invention provides a supporting member for thin-film-coated boards that is capable of sufficiently suppressing dust generated because of particles and the like. The present invention also provides a storage container suitable for storing thin-film-coated boards that has such a supporting member so as to store the thin-film-coated boards at a high level of cleanliness.The supporting members (2) and (5) have supporting means for supporting the thin-film-coated boards (1) such as mask blanks. The surface of at least a portion of the supporting means that comes into contact with the thin-film-coated boards (1) is permitted to be a smooth plane having an arithmetic average surface roughness (Ra) of 0.1 μm or lower. The surface of at least the portion of the supporting means that comes into contact with the thin-film-coated boards (1) is composed of, for instance, a resin material. The supporting members (2) and (5) are used to support the thin-film-coated boards (1) in the storage container having the supporting members to support the thin-film-coated boards (1) in a fixed state.
摘要翻译： 本发明提供一种能够充分抑制由于颗粒等而产生的粉尘的薄膜涂布板的支撑构件。 本发明还提供了一种适合于存储薄膜涂布板的储存容器，该薄板涂布板具有这样的支撑构件，以便以高清洁度存储薄膜涂布板。 支撑构件（2）和（5）具有用于支撑诸如掩模坯料的薄膜涂覆板（1）的支撑装置。 允许与薄膜涂布板（1）接触的支撑装置的至少一部分的表面是算术平均表面粗糙度（Ra）为0.1μm或更低的光滑平面。 与薄膜涂布板（1）接触的至少部分支撑装置的表面由例如树脂材料构成。 支撑构件（2）和（5）用于支撑具有支撑构件的存储容器中的薄膜涂覆板（1），以将薄膜覆盖板（1）支撑在固定状态。
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9.发明申请Mask blank glass substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, mask blank glass substrate, mask blank, and mask 有权掩模坯料玻璃基板的制造方法，掩模坯料的制造方法，掩模制造方法，掩模坯料玻璃基板，掩模坯料和掩模公开(公告)号：US20060246361A1
公开(公告)日：2006-11-02
申请号：US11391332
申请日：2006-03-29
CPC分类号： G03F1/38 , Y10T428/31616
摘要： A method of manufacturing a mask blank glass substrate includes a marking step of irradiating laser light onto a mirror-like surface in an area, having no influence on transfer, on a surface of the mask blank glass substrate to thereby form a pit that is used as a marker for identifying or managing the mask blank glass substrate.
摘要翻译： 掩模坯料玻璃基板的制造方法具备：在掩模坯料玻璃基板的表面上将激光照射到不影响转印的区域的镜面上的激光标记工序，形成使用的凹坑 作为用于识别或管理掩模坯料玻璃基板的标记。
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10.发明授权Method of manufacturing X-ray mask and X-ray mask blank, and X-ray mask and X-ray mask blank manufactured thereby 失效制造X射线掩模和X射线掩模坯料的方法，以及由此制造的X射线掩模和X射线掩模坯料公开(公告)号：US06317480B1
公开(公告)日：2001-11-13
申请号：US09296805
申请日：1999-04-23
IPC分类号： G03F900
CPC分类号： G03F1/22
摘要： An X-ray mask including a mask support formed into the shape of a frame, an X-ray-transparent film which is supported so as to extend over the surface of the frame-shaped mask support and which permits transmission of X-rays, and a desired X-ray-absorbing film pattern laid on the X-ray-transparent film, wherein the mask support has a thickness which by itself affords sufficient mechanical strength; and a step is formed along the periphery of the mask support.
摘要翻译： 一种X射线掩模，其包括形成为框架形状的掩模支撑体，X射线透明膜被支撑以在框状掩模支撑体的表面上延伸并且允许X射线的透射， 以及放置在X射线透明膜上的期望的X射线吸收膜图案，其中掩模支撑体具有本身提供足够的机械强度的厚度; 并且沿着掩模支撑件的周边形成台阶。
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