Surface inspecting method and device
    1.
    发明授权
    Surface inspecting method and device 失效
    表面检查方法及装置

    公开(公告)号:US08009286B2

    公开(公告)日:2011-08-30

    申请号:US12442879

    申请日:2007-12-04

    IPC分类号: G01N21/00

    摘要: A light source section outputs optical flux having two types of wavelength, which are a short wavelength and a long wavelength, while the intensity is made variable. The output from the first light intensity detecting section in irradiating the optical flux having a short wavelength is compared with the output from the first light intensity detecting section in irradiating the optical flux having a long wavelength. A disappearance level near a point where the detected signal from the internal subject disappears is calculated. The first intensity of optical flux having a long wavelength is set to level higher than the disappearance level. Based on the output from the first light intensity detecting section obtained by the optical flux having a long wavelength of the first intensity, a subject inside the body to be detected is measured.

    摘要翻译: 光源部分输出具有短波长和长波长的两种波长的光通量,同时强度可变。 在照射长波长的光通量时,将照射具有短波长的光束的来自第一光强度检测部的输出与来自第一光强检测部的输出进行比较。 计算来自内部对象的检测信号消失的点附近的消失水平。 具有长波长的光通量的第一强度被设置为高于消失水平的水平。 基于通过具有第一强度的长波长的光通量获得的来自第一光强检测部的输出,测量被检体内的被检体。

    SURFACE INSPECTING METHOD AND DEVICE
    2.
    发明申请
    SURFACE INSPECTING METHOD AND DEVICE 失效
    表面检测方法和装置

    公开(公告)号:US20100007872A1

    公开(公告)日:2010-01-14

    申请号:US12442879

    申请日:2007-12-04

    摘要: A light source section outputs optical flux having two types of wavelength, which are a short wavelength and a long wavelength, while the intensity is made variable. The optical flux is made incident to a detected surface of a body to be detected at a predetermined incident angle simultaneously or alternatively. Based on a type of optical flux outputted from the light source section and an output from a first light intensity detecting section, at least the intensity of the optical flux having a long wavelength outputted from the light source section is adjusted. The output from the first light intensity detecting section in irradiating the optical flux having a short wavelength is compared with the output from the first light intensity detecting section in irradiating the optical flux having a long wavelength. A signal that appears only in the output from the first light intensity detecting section in irradiating the optical flux having a long wavelength is identified as a detected signal from an internal subject. The intensity of optical flux having a long wavelength is adjusted. A disappearance level near a point where the detected signal from the internal subject disappears is calculated. The first intensity of optical flux having a long wavelength is set to level higher than the disappearance level. Based on the output from the first light intensity detecting section obtained by the optical flux having a long wavelength of the first intensity, a subject inside the body to be detected is measured.

    摘要翻译: 光源部分输出具有短波长和长波长的两种波长的光通量,同时强度可变。 光通量以预定的入射角同时或交替地入射到要检测的身体的检测表面。 基于从光源部输出的光通量和第一光强检测部的输出,至少从光源部输出的具有长波长的光通量的强度被调整。 在照射长波长的光通量时,将照射具有短波长的光束的来自第一光强度检测部的输出与来自第一光强检测部的输出进行比较。 作为来自内部被检体的检测信号,识别仅在来自第一光强检测部的输出中出现的长波长的光束的信号。 调整长波长的光通量的强度。 计算来自内部对象的检测信号消失的点附近的消失水平。 具有长波长的光通量的第一强度被设置为高于消失水平的水平。 基于通过具有第一强度的长波长的光通量获得的来自第一光强检测部的输出,测量被检体内的被检体。

    Surface inspection method and apparatus
    3.
    发明授权
    Surface inspection method and apparatus 失效
    表面检查方法和装置

    公开(公告)号:US07394532B2

    公开(公告)日:2008-07-01

    申请号:US10680432

    申请日:2003-10-08

    IPC分类号: G01N21/00 G01B11/28

    CPC分类号: G01N21/9501

    摘要: A method and an apparatus of inspecting the surface of a wafer, where two or more kinds of laser are switched or mixed to make the laser incident on the film-coated wafer by a same incident angle, in which inspection data regarding an inspection apparatus and film parameters regarding a film are stored in storage means of the inspection apparatus in an associated state with each other so as to obtain predetermined inspection conditions. When performing each measurement, an operator sets the film parameters of the wafer to be measured by setting means of the inspection apparatus. Thus, desired inspection conditions are automatically set in the inspection apparatus. The film parameters that the operator sets at each measurement are a film thickness and a film refraction index.

    摘要翻译: 一种检查晶片表面的方法和装置,其中两个或多个激光器被切换或混合以使激光以相同的入射角入射到膜涂覆的晶片上,其中检查设备和 关于胶片的胶片参数以彼此相关联的状态存储在检查装置的存储装置中,以便获得预定的检查条件。 当进行每次测量时,操作者通过检查装置的设定装置设定要测量的晶片的胶片参数。 因此,在检查装置中自动设定期望的检查条件。 操作者在每次测量时设定的膜参数是膜厚度和膜折射率。