公开(公告)号：US20040045575A1

公开(公告)日：2004-03-11

申请号：US10658422

申请日：2003-09-10

申请人： Hitachi Electronics Engineering Co., Ltd

发明人： Kazuto Kinoshita ,  Kazuhiko Gommori ,  Kenya Wada

IPC分类号： B08B007/02

CPC分类号： H01L21/67115 ,  B08B7/00 ,  B08B7/0057 ,  C03C23/0075 ,  G02F2001/1316 ,  G11B23/505 ,  H01L21/67028 ,  Y10S134/902

摘要： A lamp house is located face to face with a substrate which is transferred by a conveyer means. A dielectric barrier discharge lamp is provided in the lamp house to irradiate the substrate with ultraviolet light, while a moistened inert gas, consisting of an inert gas and water vapor, is supplied to a space between the substrate and the dielectric barrier discharge lamp from a moistened inert gas generating means. Under irradiation of ultraviolet light from the dielectric barrier discharge lamp, water vapor in the moistened inert gas is split into a reducing active member nullH.null and an oxidative active member null.OHnull.

摘要翻译： 一个灯座与一个由传送装置传送的基片面对面。 介电阻挡放电灯设置在灯室中以紫外线照射基板，同时由惰性气体和水蒸气组成的润湿惰性气体从基板和介质阻挡放电灯之间的空间 润湿惰性气体发生装置。 在来自介电阻挡放电灯的紫外线照射下，湿润的惰性气体中的水蒸气被分解成还原活性成分[H]和氧化活性成分[.OH]。

公开(公告)号：US20020192391A1

公开(公告)日：2002-12-19

申请号：US09988559

申请日：2001-11-20

申请人： Hitachi Electronics Engineering Co., Ltd.

发明人： Kenya Wada ,  Kazuto Kinoshita ,  Kazuhiko Gommori

IPC分类号： B44C001/22 ,  H01L021/306 ,  H01L021/31

CPC分类号： B08B7/0057 ,  B08B7/0035

摘要： Method and apparatus for treating a surface of a substrate plate under irradiation of ultraviolet ray emitted from a dielectric barrier discharge lamp. Upon admission into a treating chamber, oxygen is removed from a treating surface and surrounding atmosphere of a substrate plate in order to suppress energy losses of ultraviolet ray to a minimum.

摘要翻译： 用于在从电介质阻挡放电灯发射的紫外线的照射下处理基板的表面的方法和装置。 进入处理室时，从基板的处理面和周围的气氛除去氧，以将紫外线的能量损失抑制到最小。