公开(公告)号：US11276548B2

公开(公告)日：2022-03-15

申请号：US17101118

申请日：2020-11-23

Applicant: Hitachi High-Tech Corporation

Inventor： Hitomi Sakai ,  Daisuke Sato ,  Keiichiro Hitomi ,  Hiroyuki Saito ,  Kazuma Tanii

IPC: H01J37/147 ,  H01J37/10 ,  H01J37/26 ,  H01J37/22 ,  H01J37/28

Abstract: Provided are a charged particle beam device and a charged particle beam adjustment method capable of observing or inspecting a change in observation conditions in a more appropriate beam state while preventing an increase in a time required for each measurement point. The charged particle beam device includes a condenser lens 3 and an objective lens 14 configured to focus an electron beam 4 emitted from an electron source 2, a primary beam scanning deflector 5 or a secondary electron deflector 15, an adjusting element 13 configured to adjust an axis of the electron beam 4, and a control device 9 configured to supply a signal representing a control amount to the adjusting element 13 for control. The control device 9 is configured to determine the control amount by using a change amount of an intensity of the condenser lens 3, the objective lens 14, the primary beam scanning deflector 5, or the secondary electron deflector 15, and a calculation formula or a table showing a relation between the change amount of the intensity and the control amount.