公开(公告)号：US11842881B2

公开(公告)日：2023-12-12

申请号：US17413011

申请日：2018-12-18

Applicant: Hitachi High-Tech Corporation

Inventor： Akio Yamamoto ,  Kazuki Ikeda ,  Wen Li ,  Shunsuke Mizutani ,  Hiroyuki Takahashi

IPC: H01J37/28 ,  H01J37/244

CPC classification number: H01J37/28 ,  H01J37/244 ,  H01J2237/24495 ,  H01J2237/281

Abstract: A measurement device that comprises a photoelectric conversion element and a signal processing part that receives, from the photoelectric conversion element, detected pulses that include dark pulses and signal pulses that are outputted in accordance with inputted photons. The signal processing part performs amplitude discrimination on the detected pulses on the basis of a pre-acquired dark pulse amplitude distribution for the photoelectric conversion element.

公开(公告)号：US20220068597A1

公开(公告)日：2022-03-03

申请号：US17413011

申请日：2018-12-18

Applicant: Hitachi High-Tech Corporation

Inventor： Akio Yamamoto ,  Kazuki Ikeda ,  Wen Li ,  Shunsuke Mizutani ,  Hiroyuki Takahashi

IPC: H01J37/28 ,  H01J37/244

Abstract: A measurement device that comprises a photoelectric conversion element and a signal processing part that receives, from the photoelectric conversion element, detected pulses that include dark pulses and signal pulses that are outputted in accordance with inputted photons. The signal processing part performs amplitude discrimination on the detected pulses on the basis of a pre-acquired dark pulse amplitude distribution for the photoelectric conversion element.

公开(公告)号：US11961701B2

公开(公告)日：2024-04-16

申请号：US17603225

申请日：2019-04-24

Applicant: Hitachi High-Tech Corporation

Inventor： Tomoharu Nagashima ,  Kazuki Ikeda ,  Wen Li ,  Masashi Wada ,  Hajime Kawano

IPC: H01J37/22 ,  G06F3/04847 ,  H01J37/28

CPC classification number: H01J37/222 ,  G06F3/04847 ,  H01J37/28 ,  H01J2237/2448

Abstract: When adjusting optical axes of a multi-beam charged particle beam device, because parameters of optical systems are inter-dependent, the time required to adjust the parameters increases. Thus, the present invention provides a charged particle beam device provided with an optical parameter setting unit for setting parameters of optical systems for emitting a plurality of primary charged particle beams to a sample, detectors for individually detecting a plurality of secondary charged particle beams discharged from the sample, a plurality of memories for storing signals detected by the detectors and converted into digital pixels in the form of images, evaluation value derivation units for deriving evaluation values of the primary charged particle beams from the images, and a GUI capable of displaying the images and receiving an input from a user, wherein the GUI displays the images and evaluation results based on the evaluation values and changes various optical parameters in real-time.

公开(公告)号：US12198894B2

公开(公告)日：2025-01-14

申请号：US17795367

申请日：2020-02-05

Applicant: Hitachi High-Tech Corporation

Inventor： Hiroshi Oinuma ,  Kazuki Ikeda ,  Wen Li ,  Masashi Wada

IPC: H01J37/24 ,  H01J37/26 ,  H01J37/28

Abstract: A method of setting a parameter of a charged particle beam device, for shortening the time required to adjust an ABCC parameter. An inverse conversion processing unit generates a simulator input signal corresponding to an electron emitted from a sample. A simulation detector uses an arithmetic model that simulates a detector and executes arithmetic processing on the simulator input signal in a state in which characteristic information is reflected in an arithmetic parameter. A simulated image conversion unit executes arithmetic processing corresponding to an image conversion unit and converts a signal from the simulation detector into a simulated image. An ABCC search unit searches for an ABCC parameter with respect to the simulation detector so that an evaluation value obtained from the simulated image becomes a specified reference value, and outputs the ABCC parameter as a search result to an ABCC control unit of the actual machine.

公开(公告)号：US20220270847A1

公开(公告)日：2022-08-25

申请号：US17632837

申请日：2019-08-07

Applicant: Hitachi High-Tech Corporation

Inventor： Kazuki Ikeda ,  Wen Li ,  Hajime Kawano

IPC: H01J37/244 ,  H01J37/22 ,  H01J37/147

Abstract: A multi-beam scanning electron microscope (charged particle beam device) 100 includes an electron gun (charged particle irradiation source) 101 configured to irradiate a sample 104 with an electron beam (charged particle beam) 103, a detector 106 having a detection region corresponding to the charged particle beam 103 and configured to output an electrical signal 107 corresponding to a reaching position when secondary particles 105 generated from the sample 104 by irradiating the sample 104 with the charged particle beam 103 reach the detection region, and a signal processing block 115 configured to perform measurement of a charge amount of the sample 104 by the charged particle beam 103 and generation of an inspection image of the sample 104 in parallel based on the electrical signal 107 output from the detector 106.