公开(公告)号：US11056310B2

公开(公告)日：2021-07-06

申请号：US16471291

申请日：2017-01-12

Applicant: Hitachi High-Tech Corporation

Inventor： Yuta Kawamoto ,  Akira Ikegami ,  Yasushi Ebizuka ,  Naoma Ban

IPC: H01J37/145 ,  H01J37/147 ,  H01J37/20 ,  H01J37/21 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28

Abstract: The objective of the present invention is to provide a charged-particle beam device capable of moving a field-of-view to an exact position even when moving the field-of-view above an actual sample. In order to attain this objective, a charged-particle beam device is proposed comprising an objective lens whereby a charged-particle beam is focused and irradiated onto a sample; a field-of-view moving deflector for deflecting the charged-particle beam; and a stage onto which the sample is placed. The charged-particle beam device is equipped with a control device which controls the lens conditions for the objective lens in such a manner that the charged-particle been focuses on the sample which is to be measured; moves the field-of-view via the field-of-view moving deflector while maintaining the lens conditions; acquires a plurality of images at each position among a reference pattern extending in a specified direction; and uses the plurality of acquired images to adjust the signal supplied to the field-of-view moving deflector.

公开(公告)号：US11239042B2

公开(公告)日：2022-02-01

申请号：US17060242

申请日：2020-10-01

Applicant: Hitachi High-Tech Corporation

Inventor： Akira Ikegami ,  Yuta Kawamoto ,  Naomasa Suzuki ,  Manabu Yano ,  Yasushi Ebizuka ,  Naoma Ban

IPC: H01J37/141 ,  H01J37/153 ,  H01J37/28 ,  H01J37/147 ,  H01J37/09

Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.

公开(公告)号：US10832886B2

公开(公告)日：2020-11-10

申请号：US16291090

申请日：2019-03-04

Applicant: Hitachi High-Tech Corporation

Inventor： Akira Ikegami ,  Yuta Kawamoto ,  Naomasa Suzuki ,  Manabu Yano ,  Yasushi Ebizuka ,  Naoma Ban

IPC: H01J37/141 ,  H01J37/153 ,  H01J37/28 ,  H01J37/147 ,  H01J37/09

Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.