公开(公告)号：US20240213003A1

公开(公告)日：2024-06-27

申请号：US17908306

申请日：2021-07-13

Applicant: Hitachi High-Tech Corporation

Inventor： Shota UMEDA ,  Kenji TAMAKI ,  Masahiro SUMIYA ,  Yoshito KAMAJI

IPC: H01J37/32 ,  G01M99/00

CPC classification number: H01J37/32963 ,  G01M99/005

Abstract: A diagnosis device that uses information from state sensors provided in a plasma processing apparatus for plasma processing a specimen to diagnose deterioration states of components configuring the plasma processing apparatus includes an execution unit that computes and calculates deterioration degree of each of the components configuring the plasma processing apparatus on the basis of the information from the state sensors, and an analysis unit that sets a computation condition for computing and calculating the deterioration degree by the execution unit on the basis of the information from the state sensors and calculates a maintenance period of the plasma processing apparatus on the basis of the information of the deterioration degree of each of the components configuring the plasma processing apparatus computed and calculated by the execution unit, and makes it possible to decide deterioration degree computation condition having high robustness for each of the components.

公开(公告)号：US20240395518A1

公开(公告)日：2024-11-28

申请号：US18025774

申请日：2022-02-07

Applicant: Hitachi High-Tech Corporation

Inventor： Shota UMEDA ,  Masahiro SUMIYA ,  Ryoji ASAKURA

IPC: H01J37/32

Abstract: A diagnostic device separates sensor waveform data obtained in each plasma process into components of individuals of a plurality of predefined sensor waveform change types, calculates a deterioration degree indicating a deterioration state of the part for each separated sensor waveform component based on sensor waveform components at a normal time and a diagnosis time or sensor waveform components at a deterioration time and the diagnosis time, diagnoses necessity for the maintenance of a part using the deterioration degree, executes a filtering process on time-series data of the deterioration degree calculated for each plasma process, and sets a threshold used for deterioration diagnosis for each plasma processing apparatus based on a distribution calculated using a plurality of deterioration degrees after the filter processing is performed during a learning interval from time of component maintenance to time after the process is executed a predetermined number of times.