公开(公告)号：US20240379385A1

公开(公告)日：2024-11-14

申请号：US18645006

申请日：2024-04-24

Applicant: Hitachi High-Tech Corporation

Inventor： Katsutoshi KOBAYASHI ,  Akira NISHIOKA ,  Tomokazu KOBAYASHI ,  Masashi FUJITA ,  Toshihiko SHIMIZU ,  Itsuro SAWADA

IPC: H01L21/67 ,  F25B21/02 ,  F28D1/02 ,  F28D21/00

Abstract: Provided is a wafer conveyance device that suppresses a temperature rise of gas in a wafer conveyance chamber. A wafer conveyance device for conveying a wafer between a FOUP (Front-Opening Unified Pod) in which the wafer is stored and a processing device for processing the wafer, the wafer conveyance device including a wafer conveyance chamber in which a conveyance robot is installed, an FFU chamber communicating with the wafer conveyance chamber, a return duct provided in a wall or a door of the wafer conveyance chamber and communicating with both the wafer conveyance chamber and the FFU room, a blowing fan that blows gas from the FFU chamber into the wafer conveyance chamber, and a heat exchanger that cools the gas circulating in an internal space including the FFU chamber, the return duct, and the wafer conveyance chamber.

公开(公告)号：US20230139507A1

公开(公告)日：2023-05-04

申请号：US17918144

申请日：2020-05-19

Applicant: Hitachi High-Tech Corporation

Inventor： Shiano ONO ,  Yuuji KASAI ,  Shuichi NAKAGAWA ,  Toshihiko SHIMIZU

IPC: H01J37/20 ,  H01J37/16

Abstract: The present invention provides a charged particle beam device (1) capable of attenuating intrinsic vibrations of an ion pump (104) which is connected to a lens barrel (101), regardless of the length of the lens barrel (101). A charged particle beam device (1) according to the present invention comprises: a lens barrel (101) for irradiating a sample (108) with a charged particle beam (106); an ion pump (104) which is connected to the lens barrel (101) and which evacuates the air inside the lens barrel (101); and a support member (117), one end of which is connected to the ion pump (104), and the other end of which is connected the lens barrel (101). The support member (117) includes a viscoelastic body (118) which is provided substantially parallel to the central axis (114) of the lens barrel (101).

公开(公告)号：US20230035686A1

公开(公告)日：2023-02-02

申请号：US17791585

申请日：2020-01-30

Applicant: Hitachi High-Tech Corporation

Inventor： Hiroki TAKAHASHI ,  Shuichi NAKAGAWA ,  Toshihiko SHIMIZU ,  Kiyoshi YABATA ,  Hironori OGAWA ,  Jun ETOH

IPC: H01J37/26 ,  H01J37/28 ,  H02N2/00

Abstract: Provided are a vibration-suppressing mechanism that has excellent maintainability and can effectively control vibration of a column, and a charged particle beam device using the same. This charged particle beam device comprises: a sample chamber for accommodating a sample that will serve as an object to be observed therein; a column that is disposed on an upper portion of the sample chamber and irradiates and scans the sample with a charged particle beam generated by a charged particle source; and a vibration-suppressing mechanism that is removably provided to the column, said particle beam device being characterized in that the vibration-suppressing mechanism includes a stator affixed to the column, an annular mover that is supported so as to be movable in a direction orthogonal to the axial direction of the column, a plurality of actuators that cause the mover to vibrate in the direction orthogonal to the axial direction of the column, a plurality of vibration sensors affixed to the stator, and a controller that controls the actuators according to output signals from the vibration sensors.