公开(公告)号：US20210272770A1

公开(公告)日：2021-09-02

申请号：US17255724

申请日：2018-07-02

Applicant: Hitachi High-Tech Corporation

Inventor： Yasunari SOHDA ,  Kaori BIZEN ,  Yusuke ABE ,  Kenji TANIMOTO

IPC: H01J37/28 ,  H01J37/12 ,  H01J37/244 ,  H01J37/153 ,  H01J37/21 ,  H01J37/26 ,  H01J37/147

Abstract: Provided is a scanning electron microscope which can perform high-speed focus correction even when an electron beam having high energy is used. The scanning electron microscope includes an electron optical system including an electron source 100 that emits an electron beam and an objective lens 113, a sample stage 1025 which is disposed on a stage 115 and on which a sample 114 is placed, a backscattered electron detector 1023 which is disposed between the objective lens and the sample stage and is configured to detect backscattered electrons 1017 emitted due to interaction between the electron beam and the sample, a backscattered electron detection system control unit 138 which is provided corresponding to the backscattered electron detector and is configured to apply a voltage to the backscattered electron detector, and a device control calculation device 146. The objective lens has an opening in a stage direction, and the device control calculation device performs focus correction of the electron beam by controlling the voltage applied to the backscattered electron detector from the backscattered electron detection system control unit.