公开(公告)号：US11965902B2

公开(公告)日：2024-04-23

申请号：US16644627

申请日：2019-01-23

Applicant: Hitachi High-Technologies Corporation

Inventor： Kei Shioya ,  Hiroki Akase ,  Rei Konishi ,  Masaaki Sakaguchi

IPC: G01N35/02 ,  G01N35/00

CPC classification number: G01N35/02 ,  G01N2035/00396

Abstract: When washing the inside of a reactor vessel which is used repeatedly, a rough suction is performed before suctioning with a washing tip; however, unwanted washing liquid may remain that may affect analysis results. The present invention provides an automatic analysis device for analyzing a sample using light, in which the automatic analysis device is characterized in that: a washing mechanism comprises a washing liquid supply nozzle that supplies washing liquid to a reactor vessel after analysis, a washing liquid suction nozzle that suctions the supplied washing liquid, a washing tip provided to the bottom end of the washing liquid suction nozzle, and a rough suction nozzle that suctions, in advance, a liquid within the reactor vessel before suctioning with the washing tip; and after the rough suction, liquid is caused to remain so that the bottom surface of the reactor vessel is not exposed.