公开(公告)号：US20210020422A1

公开(公告)日：2021-01-21

申请号：US16306911

申请日：2016-06-23

申请人： Hitachi High-Technologies Corporation

发明人： Mitsuhiro NAKAMURA ,  Hironori ITABASHI ,  Hirofumi SATOU ,  Tsutomu SAITO ,  Masahiro SASAJIMA ,  Natsuki TSUNO ,  Yohei NAKAMURA

IPC分类号： H01J49/08 ,  H01J37/147 ,  H01J49/10 ,  H01J3/36 ,  H01J3/26

摘要： In order to provide a charged particle beam apparatus capable of stably detecting secondary particles and electromagnetic waves even for a non-conductive sample under high vacuum environment and enabling excellent observation and analysis, the charged particle beam apparatus includes a charged particle gun (12), scanning deflectors (17 and 18) configured to scan a charged particle beam (20) emitted from the charged particle gun (12) onto a sample (21), detectors (40 and 41) configured to detect a scanning control voltage input from an outside into the scanning deflectors, an arithmetic unit (42) configured to calculate, based on the detected scanning control voltage, irradiation pixel coordinates for the charged particle beam; and an irradiation controller (45) configured to control irradiation of the sample with the charged particle beam according to the irradiation pixel coordinates.