公开(公告)号：US20160379795A1

公开(公告)日：2016-12-29

申请号：US15183952

申请日：2016-06-16

Applicant: Hitachi High-Technologies Corporation

Inventor： Ryota WATANABE ,  Yuko SASAKI ,  Akira IKEGAMI

IPC: H01J37/21 ,  H01J37/28

CPC classification number: H01J37/21 ,  H01J37/28 ,  H01J2237/2448 ,  H01J2237/24578 ,  H01J2237/281

Abstract: An object of the invention is to provide a charged particle beam apparatus which can perform optimized adjustment of a focusing condition of a charged particle beam focused on a sample and optimized adjustment of an orbit of a charged particle emitted from the sample. In order to achieve the above-described object, there is provided a charged particle beam apparatus including a passage restriction member that partially restricts passage of a charged particle emitted from a sample, a first lens that is arranged between the passage restriction member and the sample, and that controls an orbit of the charged particle emitted from the sample, and a second lens that is arranged between the passage restriction member and the charged particle source, and that changes a focusing condition of the charged particle beam in accordance with a control condition of the first lens.

Abstract translation: 本发明的目的是提供一种带电粒子束装置，其能够对聚焦在样品上的带电粒子束的聚焦条件进行优化调整，并优化对从样品发射的带电粒子轨道的调整。 为了实现上述目的，提供了一种带电粒子束装置，其包括：通道限制部件，其部分地限制从样品发射的带电粒子的通过;布置在通道限制部件和样品之间的第一透镜 并且控制从样品发射的带电粒子的轨道，以及布置在通道限制构件和带电粒子源之间的第二透镜，并且根据控制条件改变带电粒子束的聚焦条件 的第一个镜头。