公开(公告)号：US20200294758A1

公开(公告)日：2020-09-17

申请号：US16786482

申请日：2020-02-10

Applicant: Hitachi High-Technologies Corporation

Inventor： Takumi HATAKEYAMA ,  Naoya ISHIGAKI

IPC: H01J37/18 ,  H01J37/28 ,  H01J37/244 ,  H01J37/08

Abstract: The present disclosure relates to a charged particle beam device intended to appropriately measure the amount of foreign substances in a vacuum chamber. As one aspect for achieving the above object, proposed is a charged particle beam device including a charged particle beam column (9) configured to irradiate a sample with a charged particle beam, vacuum chambers (1, 2) configured to create a vacuum around the sample, a plurality of electrodes (12) arranged in the vacuum chambers, and a capacitance measuring device (13) for measuring the capacitance between the plurality of electrodes.