公开(公告)号：US20150357156A1

公开(公告)日：2015-12-10

申请号：US14759241

申请日：2014-01-10

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yasushi EBIZUKA ,  Seiichiro KANNO ,  Naoya ISHIGAKI ,  Masashi FUJITA

IPC: H01J37/20 ,  H01J37/02 ,  H01J37/28

CPC classification number: H01J37/20 ,  H01J37/026 ,  H01J37/09 ,  H01J37/28 ,  H01J2237/2007

Abstract: The present invention explains a charged-particle beam device for the purpose of highly accurately measuring electrostatic charge of a sample in a held state by an electrostatic chuck (105). In order to attain the object, according to the present invention, there is proposed a charged-particle beam device including an electrostatic chuck (105) for holding a sample on which a charged particle beam is irradiated and a sample chamber (102) in which the electrostatic chuck (105) is set. The charged-particle beam device includes a potential measuring device that measures potential on a side of an attraction surface for the sample of the electrostatic chuck (105) and a control device that performs potential measurement by the potential measuring device in a state in which the sample is attracted by the electrostatic chuck (105).

Abstract translation: 本发明解释了一种带电粒子束装置，用于通过静电卡盘（105）高度准确地测量处于保持状态的样品的静电荷。 为了达到上述目的，本发明提出一种带电粒子束装置，其特征在于，包括：静电卡盘（105），用于保持照射有带电粒子束的样品和样品室（102），所述样品室 静电吸盘（105）被设定。 带电粒子束装置包括：电位测量装置，其测量用于静电卡盘（105）的样本的吸引表面的电位;以及控制装置，其通过电位测量装置进行电位测量，其中， 样品被静电吸盘（105）吸引。

公开(公告)号：US20200221566A1

公开(公告)日：2020-07-09

申请号：US16631256

申请日：2017-07-18

Applicant: Hitachi High-Technologies Corporation

Inventor： Ryo KADOI ,  Wen LI ,  Naoya ISHIGAKI

IPC: H05H5/03 ,  H01J37/24 ,  H01J37/244 ,  H01J37/06

Abstract: The present invention prevents breakage of a chip by using a simple configuration even when an extraction-electrode power source cannot apply voltage to an extraction electrode due to a malfunction, etc. This charged particle beam device is provided with: a charged particle source; an extraction electrode that extracts charged particles from the charged particle source; an extraction-electrode power source that applies voltage to the extraction electrode; an accelerating electrode for accelerating the charged particles; an accelerating power source that applies voltage to the accelerating electrode; and a diode and a resistor which are connected in series between a middle stage of the accelerating power source and the output side of the extraction-electrode power source.

公开(公告)号：US20200090900A1

公开(公告)日：2020-03-19

申请号：US16572943

申请日：2019-09-17

Applicant: Hitachi High-Technologies Corporation

Inventor： Ryo KADOI ,  Wen LI ,  Naoya ISHIGAKI

IPC: H01J37/244 ,  H01J37/20

Abstract: A charged particle beam system includes a charged particle beam device 101 and the detection circuit 114. The charged particle beam device 101 includes a first antenna 102 having a first resonant frequency and a second antenna 103 having a second resonant frequency. The detection circuit 114 includes a first amplitude detection unit 110 which detects a first amplitude of a signal after passing a first filter 107, a second amplitude detection unit 111 which detects a second amplitude of a signal after passing a second filter 108, and an amplitude comparison unit 113 which compares the first amplitude with the second amplitude.

公开(公告)号：US20150371814A1

公开(公告)日：2015-12-24

申请号：US14764641

申请日：2014-02-05

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Seiichiro KANNO ,  Masashi FUJITA ,  Naoya ISHIGAKI ,  Makoto NISHIHARA ,  Kumiko SHIMIZU

IPC: H01J37/20 ,  H01J37/28

CPC classification number: H01J37/20 ,  H01J37/28 ,  H01J2237/2001 ,  H01J2237/24585 ,  H01J2237/24592 ,  H01J2237/2817 ,  H01L21/67248 ,  H01L21/6831

Abstract: The present invention provides a high-throughput scanning electron microscope in which a wafer (9) is held by an electrostatic chuck (10), an image is obtained using an electron beam, and the wafer surface is measured, wherein even in a case where the temperature of the wafer (9) is changed due to the environmental temperature the electron scanning microscope is capable of preventing any loss in resolution or the deterioration of the measurement reproducibility caused by thermal shrinkage accompanied by temperature change of the wafer (9). A drill hole is provided on the rear surface of the electrostatic chuck (10), and a thermometer (34) is secured in place so that the front end is brought into elastic contact with the bottom surface of the drill hole. The output of the thermometer (34) is sent to a computing unit, the computing unit computes a measurement limit time for beginning measurement, based on a predetermined algorithm, from an output value of the thermometer (34), and measuring begins at individual measurement sites after the measurement limit time has elapsed.

Abstract translation: 本发明提供一种高通量扫描电子显微镜，其中通过静电卡盘（10）保持晶片（9），使用电子束获得图像，并且测量晶片表面，其中即使在 晶片（9）的温度由于环境温度而改变，电子扫描显微镜能够防止由于伴随晶片（9）的温度变化的热收缩而导致的分辨率的损失或测量再现性的劣化。 在静电卡盘（10）的后表面上设置有钻孔，并且将温度计（34）固定就位，使得前端与钻孔的底面弹性接触。 温度计（34）的输出被发送到计算单元，计算单元基于预定的算法，从温度计（34）的输出值计算开始测量的测量极限时间，并且测量从各个测量开始 测量限制时间过后的站点。

公开(公告)号：US20200294758A1

公开(公告)日：2020-09-17

申请号：US16786482

申请日：2020-02-10

Applicant: Hitachi High-Technologies Corporation

Inventor： Takumi HATAKEYAMA ,  Naoya ISHIGAKI

IPC: H01J37/18 ,  H01J37/28 ,  H01J37/244 ,  H01J37/08

Abstract: The present disclosure relates to a charged particle beam device intended to appropriately measure the amount of foreign substances in a vacuum chamber. As one aspect for achieving the above object, proposed is a charged particle beam device including a charged particle beam column (9) configured to irradiate a sample with a charged particle beam, vacuum chambers (1, 2) configured to create a vacuum around the sample, a plurality of electrodes (12) arranged in the vacuum chambers, and a capacitance measuring device (13) for measuring the capacitance between the plurality of electrodes.

公开(公告)号：US20150262857A1

公开(公告)日：2015-09-17

申请号：US14626116

申请日：2015-02-19

Applicant: Hitachi High-Technologies Corporation

Inventor： Yasushi EBIZUKA ,  Seiichiro KANNO ,  Masaya YASUKOCHI ,  Masakazu TAKAHASHI ,  Naoya ISHIGAKI ,  Go MIYA

IPC: H01L21/683 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01L21/6833 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/004 ,  H01J2237/2007 ,  H01J2237/28

Abstract: Proposed are an electrostatic chuck mechanism and a charged particle beam apparatus including a first plane that is a plane of a side in which a sample is adsorbed, a first electrode to which a voltage for generating an adsorptive power between the first plane and the sample is applied, and a second electrode that is arranged in a position relatively separated from the sample toward the first plane and through which a virtual line that is perpendicular to the first plane and contacts an edge of the sample passes, wherein the first plane is formed so that a size in a plane direction of the first plane is smaller than that of the sample.

Abstract translation: 提出了一种静电卡盘机构和带电粒子束装置，其包括作为吸附样品的一侧的平面的第一平面，在第一平面和样品之间产生吸附力的电压为第一电极 以及第二电极，其布置在与所述样品相对分离的位置朝向所述第一平面，并且通过所述第二电极垂直于所述第一平面并接触所述样品的边缘的虚拟线通过，其中所述第一平面形成为 第一平面的平面方向的尺寸小于样品的尺寸。