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公开(公告)号：US10131992B2
公开(公告)日：2018-11-20
申请号：US14388648
申请日：2013-03-22
发明人： Susumu Nishiura , Kaori Inoshima , Hiroyuki Mitsui , Hiroshi Ekko
摘要： A substrate processing apparatus includes: an operation unit, which is provided with a storage unit that stores a plurality of recipes including a recipe for processing a member that constitutes the inside of a reactor in which substrate processing is performed, and a recipe for processing an exhaust pipe through which a gas released from the inside of the reactor flows, the operation unit further being provided with a display unit that displays a setting condition for executing the recipes on an operation screen; and a control unit that executes the recipe that meets the setting condition. The operation unit includes a recipe control unit, which controls, based on the setting condition, execution of the recipe for processing the member constituting the inside of the reactor in which the substrate processing is performed, and the recipe for processing the exhaust pipe, among the recipes stored in the storage unit.
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公开(公告)号：US09690879B2
公开(公告)日：2017-06-27
申请号：US14022860
申请日：2013-09-10
发明人： Hiroyuki Mitsui , Susumu Nishiura , Hiroshi Ekko , Kaori Inoshima , Kazuo Nakaya , Osamu Morita
摘要： Provided is a method of automatically setting, in a recipe, a process parameter (PP) according to the number of substrates to be processed. The method includes (a) displaying a process parameter of a process recipe on a display unit; (b) displaying a parameter name in a process parameter file on the display unit; (c) generating a first recipe by substituting the process parameter with the parameter name; (d) downloading the first recipe and one of a plurality of condition tables corresponding to the selected number of substrates when the number of substrates to be processed in a processing chamber is selected; and (e) generating a second recipe by substituting the process parameter of the downloaded one of the condition tables for the parameter name in the downloaded first recipe.
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3.发明申请SUBSTRATE PROCESSING APPARATUS, METHOD OF CONTROLLING SUBSTRATE PROCESSING APPARATUS, METHOD OF MAINTAINING SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM 审中-公开基板处理装置，控制基板处理装置的方法，维护基板处理装置的方法和记录介质公开(公告)号：US20150096494A1
公开(公告)日：2015-04-09
申请号：US14388648
申请日：2013-03-22
发明人： Susumu Nishiura , Kaori Inoshima , Hiroyuki Mitsui , Hiroshi Ekko
CPC分类号： C23C16/52 , C23C16/4405
摘要： A substrate processing apparatus includes: an operation unit, which is provided with a storage unit that stores a plurality of recipes including a recipe for processing a member that constitutes the inside of a reactor in which substrate processing is performed, and a recipe for processing an exhaust pipe through which a gas released from the inside of the reactor flows, the operation unit further being provided with a display unit that displays a setting condition for executing the recipes on an operation screen; and a control unit that executes the recipe that meets the setting condition. The operation unit includes a recipe control unit, which controls, based on the setting condition, execution of the recipe for processing the member constituting the inside of the reactor in which the substrate processing is performed, and the recipe for processing the exhaust pipe, among the recipes stored in the storage unit.
摘要翻译： 一种基板处理装置，包括：操作单元，其具有存储单元，所述存储单元存储多个配方，所述配方包括处理构成其中进行基板处理的反应器内部的构件的配方，以及用于处理 从反应器内部释放的气体流过的排气管流动，操作单元还设置有显示单元，其在操作屏幕上显示用于执行配方的设置条件; 以及执行满足设定条件的配方的控制单元。 操作单元包括配方控制单元，其根据设置条件控制执行用于处理构成进行基板处理的反应器内部的构件的配方和用于处理排气管的配方，其中 存储在存储单元中的配方。
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公开(公告)号：US10096501B2
公开(公告)日：2018-10-09
申请号：US14914142
申请日：2014-08-27
发明人： Kaori Inoshima
IPC分类号： G06F19/00 , H01L21/67 , H01L21/677 , H01L21/687 , H01L21/66
摘要： A maintenance method of a substrate processing apparatus includes a first processing step of carrying a first substrate holder holding a substrate into a process chamber and processing the substrate held by the first substrate holder within the process chamber, a second processing step of carrying a second substrate holder holding a substrate into the process chamber and processing the substrate held by the second substrate holder within the process chamber, a determination step of determining a replacement timing of the first substrate holder and the second substrate holder, and a maintenance step of, at the replacement timing determined at the determination step, replacing the first substrate holder and the second substrate holder respectively with a third substrate holder and a fourth substrate holder, if at least one of the first substrate holder and the second substrate holder reaches the replacement timing.
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