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公开(公告)号：US20090047527A1
公开(公告)日：2009-02-19
申请号：US12013843
申请日：2008-01-14
申请人： Hsueh-An Yang , Weileun Fang , Tsung-Lin TANG
发明人： Hsueh-An Yang , Weileun Fang , Tsung-Lin TANG
CPC分类号： B81C1/00142 , B81B3/0021 , B81B2201/042 , B81C1/0019 , H01F7/122 , H01F7/14 , H01F41/041 , H01F2007/068 , H02K33/18
摘要： A magnetic element and its manufacturing method are provided. A magnetic element includes an actuation part having a first surface and a second surface, a torsion bar connected to the actuation part, and a frame connected to the first torsion bar, wherein the first surface of the actuation part is an uneven surface. The manufacturing method of the magnetic element starts with forming an passivation layer on a substrate and defining a special area by the mask method, then continues with forming the adhesion layer and electroplate-initializing layer on the substrate sequentially. The photoresist layer are formed and the magnetic-inductive material is electroformed on the electroplate area. Finally, the substrate is etched and the passivation layer is removed to obtain the magnetic element. The manufacturing method of magnetic element of the present invention can be applied in the microelectromechanical system field and other categories.
摘要翻译： 提供了磁性元件及其制造方法。 磁性元件包括具有第一表面和第二表面的致动部件，连接到致动部件的扭杆和连接到第一扭杆的框架，其中致动部件的第一表面是不平坦的表面。 磁性元件的制造方法首先在基板上形成钝化层，通过掩模法形成特殊区域，然后依次在基板上形成粘合层和电镀初始化层。 形成光致抗蚀剂层，并且将磁感应材料电铸在电镀区域上。 最后，蚀刻衬底并去除钝化层以获得磁性元件。 本发明的磁性元件的制造方法可以应用于微机电系统领域等。
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公开(公告)号：US08277667B2
公开(公告)日：2012-10-02
申请号：US12013843
申请日：2008-01-14
申请人： Hsueh-An Yang , Weileun Fang , Tsung-Lin Tang
发明人： Hsueh-An Yang , Weileun Fang , Tsung-Lin Tang
IPC分类号： H01L21/302 , B81C1/00
CPC分类号： B81C1/00142 , B81B3/0021 , B81B2201/042 , B81C1/0019 , H01F7/122 , H01F7/14 , H01F41/041 , H01F2007/068 , H02K33/18
摘要： A magnetic element and its manufacturing method are provided. A magnetic element includes an actuation part having a first surface and a second surface, a torsion bar connected to the actuation part, and a frame connected to the first torsion bar, wherein the first surface of the actuation part is an uneven surface. The manufacturing method of the magnetic element starts with forming an passivation layer on a substrate and defining a special area by the mask method, then continues with forming the adhesion layer and electroplate-initializing layer on the substrate sequentially. The photoresist layer are formed and the magnetic-inductive material is electroformed on the electroplate area. Finally, the substrate is etched and the passivation layer is removed to obtain the magnetic element. The manufacturing method of magnetic element of the present invention can be applied in the microelectromechanical system field and other categories.
摘要翻译： 提供了磁性元件及其制造方法。 磁性元件包括具有第一表面和第二表面的致动部件，连接到致动部件的扭杆和连接到第一扭杆的框架，其中致动部件的第一表面是不平坦的表面。 磁性元件的制造方法首先在基板上形成钝化层，通过掩模法形成特殊区域，然后依次在基板上形成粘合层和电镀初始化层。 形成光致抗蚀剂层，并且将磁感应材料电铸在电镀区域上。 最后，蚀刻衬底并去除钝化层以获得磁性元件。 本发明的磁性元件的制造方法可以应用于微机电系统领域等。
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公开(公告)号：US20120111096A1
公开(公告)日：2012-05-10
申请号：US13343643
申请日：2012-01-04
申请人： Mingching Wu , Hsueh-An Yang , Hung-Yi Lin , Weileun Fang
发明人： Mingching Wu , Hsueh-An Yang , Hung-Yi Lin , Weileun Fang
IPC分类号： G01M3/34
CPC分类号： B81C1/00301 , B81B2201/042 , B81B2207/097
摘要： A method for manufacturing an MEMS device is provided. The method includes steps of a) providing a first substrate having a concavity located thereon, b) providing a second substrate having a connecting area and an actuating area respectively located thereon, c) forming plural microstructures in the actuating area, d) mounting a conducting element in the connecting area and the actuating area, e) forming an insulating layer on the conducting element and f) connecting the first substrate to the connecting area to form the MEMS device. The concavity contains the plural microstructures.
摘要翻译： 提供了一种用于制造MEMS器件的方法。 该方法包括以下步骤：a）提供具有位于其上的凹面的第一基底，b）提供具有分别位于其上的连接区域和致动区域的第二基底，c）在致动区域中形成多个微结构，d） 在所述连接区域和所述致动区域中的元件，e）在所述导电元件上形成绝缘层，以及f）将所述第一基板连接到所述连接区域以形成所述MEMS器件。 凹面包含多个微结构。
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公开(公告)号：US08114699B2
公开(公告)日：2012-02-14
申请号：US13072879
申请日：2011-03-28
申请人： Migching Wu , Hsueh-An Yang , Hung-Yi Lin , Weileun Fang
发明人： Migching Wu , Hsueh-An Yang , Hung-Yi Lin , Weileun Fang
IPC分类号： H01L21/00
CPC分类号： B81C1/00301 , B81B2201/042 , B81B2207/097
摘要： A method for manufacturing an MEMS device is provided. The method includes steps of a) providing a first substrate having a concavity located thereon, b) providing a second substrate having a connecting area and an actuating area respectively located thereon, c) forming plural microstructures in the actuating area, d) mounting a conducting element in the connecting area and the actuating area, e) forming an insulating layer on the conducting element and f) connecting the first substrate to the connecting area to form the MEMS device. The concavity contains the plural microstructures.
摘要翻译： 提供了一种用于制造MEMS器件的方法。 该方法包括以下步骤：a）提供具有位于其上的凹面的第一基底，b）提供具有分别位于其上的连接区域和致动区域的第二基底，c）在致动区域中形成多个微结构，d） 在所述连接区域和所述致动区域中的元件，e）在所述导电元件上形成绝缘层，以及f）将所述第一基板连接到所述连接区域以形成所述MEMS器件。 凹面包含多个微结构。
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公开(公告)号：US20090075406A1
公开(公告)日：2009-03-19
申请号：US12326355
申请日：2008-12-02
申请人： Mingching Wu , Hsueh-An Yang , Hung-Yi Lin , Weileun Fang
发明人： Mingching Wu , Hsueh-An Yang , Hung-Yi Lin , Weileun Fang
IPC分类号： H01L21/66
CPC分类号： B81C1/00301 , B81B2201/042 , B81B2207/097
摘要： A method for manufacturing an MEMS device is provided. The method includes steps of a) providing a first substrate having a concavity located thereon, b) providing a second substrate having a connecting area and an actuating area respectively located thereon, c) forming plural microstructures in the actuating area, d) mounting a conducting element in the connecting area and the actuating area, e) forming an insulating layer on the conducting element and f) connecting the first substrate to the connecting area to form the MEMS device. The concavity contains the plural microstructures.
摘要翻译： 提供了一种用于制造MEMS器件的方法。 该方法包括以下步骤：a）提供具有位于其上的凹面的第一基底，b）提供具有分别位于其上的连接区域和致动区域的第二基底，c）在致动区域中形成多个微结构，d） 在所述连接区域和所述致动区域中的元件，e）在所述导电元件上形成绝缘层，以及f）将所述第一基板连接到所述连接区域以形成所述MEMS器件。 凹面包含多个微结构。
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公开(公告)号：US07196449B2
公开(公告)日：2007-03-27
申请号：US10951529
申请日：2004-09-28
申请人： Mingching Wu , Hsueh-An Yang , Hung-Yi Lin , Weileun Fang
发明人： Mingching Wu , Hsueh-An Yang , Hung-Yi Lin , Weileun Fang
CPC分类号： G02B26/0841 , C23F4/00 , H02N1/006
摘要： A two-axis device is provided. The two-axis device includes a first substrate having a plurality of electrodes, a first connecting layer located on the first substrate, an actuating layer, a second connecting layer and a cover. The actuating layer is connected to the first substrate via the first connecting layer and includes a circular portion, an actuating portion, a first shaft and a second shaft. The second connecting layer is connected to the actuating layer and the cover is connected to the actuating layer via the second connecting layer. In addition, a vacuum concavity is formed by the first substrate, the first connecting layer, the actuating layer, the second connecting layer and the cover. The actuating portion and the first shaft are located in the vacuum concavity, and the second shaft extends outside of the vacuum concavity.
摘要翻译： 提供了两轴设备。 双轴装置包括具有多个电极的第一基板，位于第一基板上的第一连接层，致动层，第二连接层和盖。 所述致动层经由所述第一连接层连接到所述第一基板，并且包括圆形部分，致动部分，第一轴和第二轴。 第二连接层连接到致动层，并且盖通过第二连接层连接到致动层。 此外，由第一基板，第一连接层，致动层，第二连接层和盖形成真空凹部。 致动部和第一轴位于真空凹部中，第二轴延伸到真空凹部的外侧。
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公开(公告)号：US08318511B2
公开(公告)日：2012-11-27
申请号：US13343643
申请日：2012-01-04
申请人： Mingching Wu , Hsueh-An Yang , Hung-Yi Lin , Weileun Fang
发明人： Mingching Wu , Hsueh-An Yang , Hung-Yi Lin , Weileun Fang
IPC分类号： H01L31/26
CPC分类号： B81C1/00301 , B81B2201/042 , B81B2207/097
摘要： A method for manufacturing an MEMS device is provided. The method includes steps of a) providing a first substrate having a concavity located thereon, b) providing a second substrate having a connecting area and an actuating area respectively located thereon, c) forming plural microstructures in the actuating area, d) mounting a conducting element in the connecting area and the actuating area, e) forming an insulating layer on the conducting element and f) connecting the first substrate to the connecting area to form the MEMS device. The concavity contains the plural microstructures.
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公开(公告)号：US08030111B2
公开(公告)日：2011-10-04
申请号：US12326355
申请日：2008-12-02
申请人： Mingching Wu , Hsueh-An Yang , Hung-Yi Lin , Weileun Fang
发明人： Mingching Wu , Hsueh-An Yang , Hung-Yi Lin , Weileun Fang
IPC分类号： H01L21/00
CPC分类号： B81C1/00301 , B81B2201/042 , B81B2207/097
摘要： A method for manufacturing an MEMS device is provided. The method includes steps of a) providing a first substrate having a concavity located thereon, b) providing a second substrate having a connecting area and an actuating area respectively located thereon, c) forming plural microstructures in the actuating area, d) mounting a conducting element in the connecting area and the actuating area, e) forming an insulating layer on the conducting element and f) connecting the first substrate to the connecting area to form the MEMS device. The concavity contains the plural microstructures.
摘要翻译： 提供了一种用于制造MEMS器件的方法。 该方法包括以下步骤：a）提供具有位于其上的凹面的第一基底，b）提供具有分别位于其上的连接区域和致动区域的第二基底，c）在致动区域中形成多个微结构，d） 在所述连接区域和所述致动区域中的元件，e）在所述导电元件上形成绝缘层，以及f）将所述第一基板连接到所述连接区域以形成所述MEMS器件。 凹面包含多个微结构。
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公开(公告)号：US20110174058A1
公开(公告)日：2011-07-21
申请号：US13072879
申请日：2011-03-28
申请人： Mingching Wu , Hsueh-An Yang , Hung-Yi Lin , Weileun Fang
发明人： Mingching Wu , Hsueh-An Yang , Hung-Yi Lin , Weileun Fang
CPC分类号： B81C1/00301 , B81B2201/042 , B81B2207/097
摘要： A method for manufacturing an MEMS device is provided. The method includes steps of a) providing a first substrate having a concavity located thereon, b) providing a second substrate having a connecting area and an actuating area respectively located thereon, c) forming plural microstructures in the actuating area, d) mounting a conducting element in the connecting area and the actuating area, e) forming an insulating layer on the conducting element and f) connecting the first substrate to the connecting area to form the MEMS device. The concavity contains the plural microstructures.
摘要翻译： 提供了一种用于制造MEMS器件的方法。 该方法包括以下步骤：a）提供具有位于其上的凹面的第一基底，b）提供具有分别位于其上的连接区域和致动区域的第二基底，c）在致动区域中形成多个微结构，d） 在所述连接区域和所述致动区域中的元件，e）在所述导电元件上形成绝缘层，以及f）将所述第一基板连接到所述连接区域以形成所述MEMS器件。 凹面包含多个微结构。
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公开(公告)号：US20050280331A1
公开(公告)日：2005-12-22
申请号：US10951529
申请日：2004-09-28
申请人： Mingching Wu , Hsueh-An Yang , Hung-Yi Lin , Weileun Fang
发明人： Mingching Wu , Hsueh-An Yang , Hung-Yi Lin , Weileun Fang
CPC分类号： G02B26/0841 , C23F4/00 , H02N1/006
摘要： A two-axis device is provided. The two-axis device includes a first substrate having a plurality of electrodes, a first connecting layer located on the first substrate, an actuating layer, a second connecting layer and a cover. The actuating layer is connected to the first substrate via the first connecting layer and includes a circular portion, an actuating portion, a first shaft and a second shaft. The second connecting layer is connected to the actuating layer and the cover is connected to the actuating layer via the second connecting layer. In addition, a vacuum concavity is formed by the first substrate, the first connecting layer, the actuating layer, the second connecting layer and the cover. The actuating portion and the first shaft are located in the vacuum concavity, and the second shaft extends outside of the vacuum concavity.
摘要翻译： 提供了两轴设备。 双轴装置包括具有多个电极的第一基板，位于第一基板上的第一连接层，致动层，第二连接层和盖。 所述致动层经由所述第一连接层连接到所述第一基板，并且包括圆形部分，致动部分，第一轴和第二轴。 第二连接层连接到致动层，并且盖通过第二连接层连接到致动层。 此外，由第一基板，第一连接层，致动层，第二连接层和盖形成真空凹部。 致动部和第一轴位于真空凹部中，第二轴延伸到真空凹部的外侧。
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