公开(公告)号：US20210179972A1

公开(公告)日：2021-06-17

申请号：US17270881

申请日：2019-07-29

申请人： Huntsman Petrochemical LLC

发明人： Donald H. Champion ,  David C. Lewis ,  Juventino Uriarte ,  Hui Zhou ,  Ke Zhang ,  Chai Zheng

IPC分类号： C11D3/30 ,  C11D11/00 ,  G03F7/42

摘要： The present disclosure provides a quaternary ammonium hydroxide solution comprising a reaction product of a polyamine and an organic oxirane. The quaternary ammonium hydroxide solution may be used in various applications, such as in removing chemical residue from a metal or dielectric surface.

公开(公告)号：US12077730B2

公开(公告)日：2024-09-03

申请号：US17270881

申请日：2019-07-29

申请人： Huntsman Petrochemical LLC

发明人： Donald H. Champion ,  David C. Lewis ,  Juventino Uriarte ,  Hui Zhou ,  Ke Zhang ,  Chai Zheng

IPC分类号： C11D3/28 ,  C11D3/20 ,  C11D3/30 ,  C11D7/26 ,  C11D7/32 ,  G03F7/42

CPC分类号： C11D3/30 ,  C11D3/20 ,  C11D7/26 ,  C11D7/3209 ,  G03F7/425 ,  C11D2111/16 ,  C11D2111/22

摘要： The present disclosure provides a quaternary ammonium hydroxide solution comprising a reaction product of a polyamine and an organic oxirane. The quaternary ammonium hydroxide solution may be used in various applications, such as in removing chemical residue from a metal or dielectric surface.

公开(公告)号：US20230266671A1

公开(公告)日：2023-08-24

申请号：US18020313

申请日：2021-08-16

申请人： Huntsman Petrochemical LLC

发明人： Hui Zhou ,  Michael McCormick ,  Juventino Uriarte ,  Ke Zhang

IPC分类号： G03F7/42

CPC分类号： G03F7/425

摘要： The present disclosure is directed to a method of cleaning a microelectronic substrate, such as a semiconductor device, by contacting the microelectronic substrate with an amine oxide selected from the group consisting of N,N-dimethylethanolamine N-oxide, triethanolamine N-oxide, ethanamine, 2,2′-oxybis[N,N-dimethyl-,N,N′-dioxide], 1-methylpyrrolidine N-oxide, N,N-dimethylcyclohexylamine N-oxide, and a mixture thereof for a time and at a temperature sufficient to clean the substrate.