Semiconductor intra-field dose correction
    1.
    发明授权
    Semiconductor intra-field dose correction 有权
    半导体场内剂量校正

    公开(公告)号:US08350235B2

    公开(公告)日:2013-01-08

    申请号:US12509821

    申请日:2009-07-27

    IPC分类号: G21K5/10

    摘要: A system and method are provided for automatic dose-correction recipe generation, the system including a dose-correction recipe generator, a reticle data unit in signal communication with the recipe generator, a slit data unit in signal communication with the recipe generator, a process data unit in signal communication with the recipe generator, a wafer data unit in signal communication with the recipe generator, a control unit in signal communication with the recipe generator, and an output unit or a storage unit in signal communication with the control unit; and the method including receiving a current reticle data set and a previous reticle data set, receiving a current slit data set and a previous slit data set, receiving a process condition, receiving a wafer condition, automatically generating a dose-correction recipe in accordance with the received reticle, slit, process and wafer information, and controlling a dose in accordance with the generated recipe.

    摘要翻译: 提供了一种用于自动剂量校正配方生成的系统和方法,该系统包括剂量校正配方生成器,与配方生成器进行信号通信的掩模版数据单元,与配方生成器进行信号通信的缝隙数据单元, 与配方生成器进行信号通信的数据单元,与配方生成器进行信号通信的晶片数据单元,与配方生成器进行信号通信的控制单元,以及与控制单元进行信号通信的输出单元或存储单元; 并且所述方法包括接收目前的掩模版数据集和先​​前的掩模版数据集,接收当前狭缝数据集和先​​前的狭缝数据组,接收处理条件,接收晶片条件,根据以下步骤自动生成剂量校正配方 接收到的掩模版,狭缝,处理和晶片信息,以及根据生成的食谱控制剂量。

    SEMICONDUCTOR INTRA-FIELD DOSE CORRECTION
    2.
    发明申请
    SEMICONDUCTOR INTRA-FIELD DOSE CORRECTION 有权
    半导体场内剂量校正

    公开(公告)号:US20110017926A1

    公开(公告)日:2011-01-27

    申请号:US12509821

    申请日:2009-07-27

    IPC分类号: G21K5/10

    摘要: A system and method are provided for automatic dose-correction recipe generation, the system including a dose-correction recipe generator, a reticle data unit in signal communication with the recipe generator, a slit data unit in signal communication with the recipe generator, a process data unit in signal communication with the recipe generator, a wafer data unit in signal communication with the recipe generator, a control unit in signal communication with the recipe generator, and an output unit or a storage unit in signal communication with the control unit; and the method including receiving a current reticle data set and a previous reticle data set, receiving a current slit data set and a previous slit data set, receiving a process condition, receiving a wafer condition, automatically generating a dose-correction recipe in accordance with the received reticle, slit, process and wafer information, and controlling a dose in accordance with the generated recipe.

    摘要翻译: 提供了一种用于自动剂量校正配方生成的系统和方法,该系统包括剂量校正配方生成器,与配方生成器进行信号通信的掩模版数据单元,与配方生成器进行信号通信的缝隙数据单元, 与配方生成器进行信号通信的数据单元,与配方生成器进行信号通信的晶片数据单元,与配方生成器进行信号通信的控制单元,以及与控制单元进行信号通信的输出单元或存储单元; 并且所述方法包括接收目前的掩模版数据集和先​​前的掩模版数据集,接收当前狭缝数据集和先​​前的狭缝数据组,接收处理条件,接收晶片条件,根据以下步骤自动生成剂量校正配方 接收到的掩模版,狭缝,处理和晶片信息,以及根据生成的食谱控制剂量。