公开(公告)号：US3661636A

公开(公告)日：1972-05-09

申请号：US3661636D

申请日：1970-04-22

Applicant: IBM

Inventor： GREEN JAMES M ,  SEDGWICK THOMAS O ,  SILVESTRI VICTOR J

IPC: C30B25/02 ,  C23C13/00

CPC classification number: C30B25/02 ,  Y10S148/026 ,  Y10S148/049 ,  Y10S148/05 ,  Y10S148/051 ,  Y10S148/115 ,  Y10S148/145

Abstract: A method for forming uniform and smooth surfaces which can be used in any chemical vapor transport system and in general in any deposition system in which chemicals in a gas phase are reacted to cause deposition onto a substrate. A zone of operating conditions exists in which smooth uniform surfaces are obtained, while at the same time ridge growth and defect growth is minimized. By changing substrate temperature and the concentrations of input reactants, ridge growth and defect growth in deposited films are substantially reduced.

Abstract translation: 用于形成均匀且光滑的表面的方法，其可用于任何化学气相输送系统中，并且通常在任何沉积系统中，其中气相中的化学物质反应以引起沉积在基底上。 存在操作条件的区域，其中获得光滑的均匀表面，同时脊生长和缺陷生长最小化。 通过改变衬底温度和输入反应物的浓度，沉积膜中的脊生长和缺陷生长显着减少。