公开(公告)号：US3700498A

公开(公告)日：1972-10-24

申请号：US3700498D

申请日：1970-12-10

Applicant: IBM

Inventor： KANAZAWA KAY KEIJI ,  SEKI HAJIME ,  STREET GEORGE BRYAN

IPC: B44F1/12 ,  C23C14/06 ,  G03G5/082 ,  B44D1/34 ,  B44D1/42 ,  C23C11/00

CPC classification number: G03G5/082 ,  C23C14/0623

Abstract: ELECTROPHOTOGRAPHIC PLATES ARE FORMED BY DEPOSITING A LAYER OF BETA PHASE POLYCRYSTALLINE AS4S4 BY EVAPORATION UNDER VACUUM ONTO AN ELECTRICALLY CONDUCTIVE SUBSTRATE HELD AT A TEMPERATURE BETWEEN 100*C. AND 200*C.

公开(公告)号：US3666554A

公开(公告)日：1972-05-30

申请号：US3666554D

申请日：1970-12-10

Applicant: IBM

Inventor： KANAZAWA KAY KEIJI ,  STREET GEORGE BRYAN

IPC: G03G5/082 ,  G03G5/04 ,  G03G13/22

CPC classification number: G03G5/08207

Abstract: A PROCESS FOR PREPARING AN ELECTROPHOTOGRAPHIC PLATE BY EVAPORATING UNDER VACUUM ONTO A CONDUCTIVE SUBSTRATE HELD AT A TEMPERATURE OF FROM 50*C. TO 80*C. A LAYER CONSISTING ESSENTIALLY OF EQUAL ATOMIC PROPORTIONS OF SELENIUM AND SULFUR.