公开(公告)号：US3700498A

公开(公告)日：1972-10-24

申请号：US3700498D

申请日：1970-12-10

Applicant: IBM

Inventor： KANAZAWA KAY KEIJI ,  SEKI HAJIME ,  STREET GEORGE BRYAN

IPC: B44F1/12 ,  C23C14/06 ,  G03G5/082 ,  B44D1/34 ,  B44D1/42 ,  C23C11/00

CPC classification number: G03G5/082 ,  C23C14/0623

Abstract: ELECTROPHOTOGRAPHIC PLATES ARE FORMED BY DEPOSITING A LAYER OF BETA PHASE POLYCRYSTALLINE AS4S4 BY EVAPORATION UNDER VACUUM ONTO AN ELECTRICALLY CONDUCTIVE SUBSTRATE HELD AT A TEMPERATURE BETWEEN 100*C. AND 200*C.

公开(公告)号：US3451912A

公开(公告)日：1969-06-24

申请号：US3451912D

申请日：1966-07-15

Applicant: IBM

Inventor： HEURLE FRANCOIS M D ,  ESAKI LEO ,  SEKI HAJIME

IPC: C23C14/16 ,  H01L21/00 ,  H01L29/00 ,  C23C15/00 ,  H01L5/00

CPC classification number: H01L21/00 ,  C23C14/165 ,  H01L29/00