Method for Fabricating a Microfluidic Device

    公开(公告)号:US20210300752A1

    公开(公告)日:2021-09-30

    申请号:US17203026

    申请日:2021-03-16

    Applicant: IMEC VZW

    Abstract: A method for fabricating a microfluidic device includes providing an assembly that includes a first silicon substrate having a hydrophilic silicon oxide top surface that includes a microfluidic channel and a second silicon substrate having a hydrophilic silicon oxide bottom surface directly bonded on the top surface of the first silicon substrate, the second silicon substrate including fluidic access holes giving fluidic access to the microfluidic channel. The method also includes exposing the assembly to oxidative species including one or more oxygen atoms and to heat so as to form silicon oxide at a surface of the access holes and of the microfluidic channel.

Patent Agency Ranking