公开(公告)号：US20250067771A1

公开(公告)日：2025-02-27

申请号：US18802294

申请日：2024-08-13

Applicant: IMEC VZW

Inventor： Thomas Hantschel ,  Hyeon-Su Kim

IPC: G01Q70/16 ,  G01Q30/20

Abstract: A method is provided for fabricating a substrate comprising on its surface one or more scanning probe microscopy tips, the method including: a) underetching beneath one or more hardmasks, each having rotational symmetry, present on a substrate, thereby forming a corresponding number of pre-tip structures having an upper part, a lower part, and a neck region linking the upper part to the lower part; b) then, etching the substrate underneath each pre-tip structure in a vertical manner using the respective hardmask as an etching mask, thereby forming a pedestal beneath the lower part of each pre-tip structure; c) then, selectively removing the hardmask from each structure; d) then, thinning down the neck until the upper part is physically detached from the lower part, thereby forming the substrate comprising on its surface the one or more scanning probe microscopy tips.