Abstract:
A medication concentration detecting device includes a medicine container, a three-way pipe, a light emitting member, a first light receiver and a processor. The medicine container has a chamber configured for accommodating nebulized medicine. The three-way pipe has a passageway connected to the chamber for the nebulized medicine to flow along the passageway. The light emitting member is disposed on the three-way pipe and configured for emitting a light beam toward the passageway. The first light receiver is disposed on the three-way pipe and configured for receiving the light beam and outputting a luminous flux signal. The processor is connected to the first light receiver and configured for calculating a luminous flux reference value according to the luminous flux signal. The luminous flux reference value is used for determining whether outputs a low nebulized medicine concentration warning.
Abstract:
An optically-induced dielectrophoresis device includes a first substrate, a first conductive layer, a first patterned photoconductor layer, a first patterned layer, a second substrate, a second conductive layer, and a spacer. The first conductive layer is disposed on the first substrate. The first patterned photoconductor layer is disposed on the first conductive layer. The first patterned layer is disposed on the first conductive layer. The first patterned photoconductor layer and the first patterned layer are distributed alternately over the first conductive layer. Resistivity of the first patterned photoconductor layer is not equal to resistivity of the first patterned layer. At least one of the first substrate and the second substrate is pervious to a light. The second conductive layer is disposed on the second substrate and between the first substrate and the second substrate. The spacer connects the first substrate and the second substrate.
Abstract:
A particle manipulation system and a projection device are provided. The projection device includes an image source and a projection lens. The image source provides an image beam. The projection lens is disposed on a light path of the image beam and includes a zoom lens set and a focusing lens set. The zoom lens set is disposed on the light path of the image beam from the image source and includes at least two lens groups disposed in sequence on the light path of the image beam. The focusing lens set is disposed on the light path of the image beam. The zoom lens set is disposed between the image source and the focusing lens set. A photoconductor chip is disposed on the light path of the image beam from the projection lens.
Abstract:
A particle manipulation system and a projection device are provided. The projection device includes an image source and a projection lens. The image source provides an image beam. The projection lens is disposed on a light path of the image beam and includes a zoom lens set and a focusing lens set. The zoom lens set is disposed on the light path of the image beam from the image source and includes at least two lens groups disposed in sequence on the light path of the image beam. The focusing lens set is disposed on the light path of the image beam. The zoom lens set is disposed between the image source and the focusing lens set. A photoconductor chip is disposed on the light path of the image beam from the projection lens.
Abstract:
A projection lens, a projection device and an optically-induced microparticle device are provided. The projection lens includes an aperture, a first and a second lens groups. The aperture, the first and the second lens groups are disposed on a projection path of an image. The aperture is between the first and the second lens groups. The first and the second lens groups are suitable for interchanging with each other to switch the magnification ratio. When in a first state, the first lens group is between the object and the aperture and the second lens group is between the aperture and a projection surface, herein the projection lens has a first magnification ratio. When in a second state, the first lens group is between the aperture and the projection surface, and the second lens group is between the object and the aperture, herein the projection lens has a second magnification ratio.
Abstract:
An optically-induced dielectrophoresis device includes a first substrate, a first conductive layer, a first patterned photoconductor layer, a first patterned layer, a second substrate, a second conductive layer, and a spacer. The first conductive layer is disposed on the first substrate. The first patterned photoconductor layer is disposed on the first conductive layer. The first patterned layer is disposed on the first conductive layer. The first patterned photoconductor layer and the first patterned layer are distributed alternately over the first conductive layer. Resistivity of the first patterned photoconductor layer is not equal to resistivity of the first patterned layer. At least one of the first substrate and the second substrate is pervious to a light. The second conductive layer is disposed on the second substrate and between the first substrate and the second substrate. The spacer connects the first substrate and the second substrate.