公开(公告)号：US20250137773A1

公开(公告)日：2025-05-01

申请号：US18539069

申请日：2023-12-13

Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

Inventor： Shih-Hsiang LAI ,  Fu-Cheng YANG ,  Fu-Ching TUNG ,  Hsuan-Fu WANG ,  Po-Chun YEH

IPC: G01B11/06 ,  G01N21/21 ,  G01N21/84

Abstract: A film thickness measurement device includes a spectroscopic ellipsometer, and the spectroscopic ellipsometer includes a projection module and a light receiving module. The projection module is configured to project a multi-wavelength polarized light onto a thin film. The projection module includes a light source and a polarization state generator. The light receiving module includes a polarization analyzer and an optical detector. The polarization analyzer is configured to screen out a multi-wavelength polarized reflection light according to reflection of the multi-wavelength polarized light by the thin film. The optical detector is configured to receive the multi-wavelength polarized reflection light. The optical detector includes at least one optical splitting unit, at least two optical filtering units and at least two optical detection units.