公开(公告)号：US09754976B2

公开(公告)日：2017-09-05

申请号：US14533052

申请日：2014-11-04

Applicant: INNOLUX CORPORATION

Inventor： Yueh-Ting Chung ,  Shao-Wu Hsu ,  Yung-Hsin Lu ,  Jyun-Yu Chen ,  Kuan-Yu Chiu ,  Chao-Hsiang Wang

IPC: G02F1/1362 ,  G02F1/1343 ,  H01L27/12

CPC classification number: H01L27/124 ,  G02F1/136227 ,  G02F2001/134372

Abstract: An element substrate is provided, including a substrate, a metal layer, a planarization layer and a first conductive layer. The metal layer is disposed on the substrate. The planarization layer is located on the metal layer, wherein the planarization layer includes a contact hole, the contact hole has a continuous wall and a bottom, the bottom exposes the metal layer, and the bottom of the contact hole has a first width. The first conductive layer is located on the planarization layer, wherein the first conductive layer includes an opening, the opening exposes the contact hole, and the opening has a second width above the contact hole, wherein the relationship of the first width and the second width is modified to decrease illumination loss and to prevent problems of shot-circuiting and insufficient capacitance.

公开(公告)号：US09543335B2

公开(公告)日：2017-01-10

申请号：US15003596

申请日：2016-01-21

Applicant: INNOLUX CORPORATION

Inventor： Yueh-Ting Chung ,  Jyun-Yu Chen ,  Wei-Chen Hsu ,  Yung-Hsin Lu ,  Chao-Hsiang Wang ,  Kuan-Yu Chiu

IPC: H01L27/12 ,  G02F1/1362 ,  G02F1/1333

CPC classification number: H01L27/124 ,  G02F1/136227 ,  G02F2001/133357 ,  G02F2201/40 ,  H01L27/1222 ,  H01L27/1225

Abstract: An element substrate is provided, including a substrate, a metal layer and a planarization layer. The metal layer is located on the substrate. The metal layer has a first edge in a first direction. The planarization layer is located on the metal layer. The planarization layer includes a contact hole. The contact hole has a contiguous wall and a bottom side. The metal layer is exposed in the bottom side. A contour line of the contiguous wall on a vertical plane is a curved line. The first edge corresponds vertically with a critical point on the contour line. The slope of a tangent line on the critical point of the contour line is between 0.087 to 0.364.

Abstract translation: 提供元件基板，包括基板，金属层和平坦化层。 金属层位于基板上。 金属层具有沿第一方向的第一边缘。 平坦化层位于金属层上。 平坦化层包括接触孔。 接触孔具有连续的壁和底侧。 金属层暴露在底面。 垂直平面上连续壁的轮廓线是曲线。 第一个边沿垂直对应于轮廓线上的临界点。 轮廓线临界点上切线的斜率在0.087至0.364之间。

公开(公告)号：US10203578B2

公开(公告)日：2019-02-12

申请号：US15496730

申请日：2017-04-25

Applicant: InnoLux Corporation

Inventor： Yueh-Ting Chung ,  Yung-Hsin Lu ,  Jyun-Yu Chen ,  Jian-Min Leu

IPC: H01L29/417 ,  H01L29/49 ,  G02F1/1345 ,  G02F1/1368 ,  G02F1/1343 ,  G02F1/1362 ,  G02F1/1333 ,  H01L27/12

Abstract: A display panel includes a TFT substrate, which includes a substrate, a plurality of scan lines, a plurality of data lines, and a first intermediate layer. The scan lines are disposed on the substrate along a first direction, and the scan lines are intersected with the data lines to define a plurality of sub-pixel units. The sub-pixel units include a first sub-pixel unit and a second sub-pixel unit. The first sub-pixel unit has a first light transmission area and a first component installation area, and the second sub-pixel unit has a second light transmission area and a second component installation area. The first intermediate layer is disposed on the substrate and has an opening. The opening is at least partially overlapped with the first light transmission area, and is at least partially overlapped with the second light transmission area.

公开(公告)号：US09360725B2

公开(公告)日：2016-06-07

申请号：US14493173

申请日：2014-09-22

Applicant: INNOLUX CORPORATION

Inventor： Yueh-Ting Chung ,  Jyun-Yu Chen ,  Wei-Chen Hsu ,  Yung-Hsin Lu ,  Chao Hsiang Wang ,  Kuan Yu Chiu

IPC: G02F1/136 ,  G02F1/1362 ,  G02F1/1343 ,  H01L27/12 ,  G02F1/1333

CPC classification number: G02F1/136227 ,  G02F1/1343 ,  G02F1/1362 ,  G02F1/136286 ,  G02F2001/133357 ,  G02F2201/40 ,  H01L27/1222 ,  H01L27/1225 ,  H01L27/124

Abstract: An element substrate is provided, including a substrate, a metal layer and a planarization layer. The metal layer is located on the substrate. The metal layer has a first edge in a first direction. The planarization layer is located on the metal layer. The planarization layer includes a contact hole. The contact hole has a contiguous wall and a bottom side. The metal layer is exposed in the bottom side. A contour line of the contiguous wall on a vertical plane is a curved line. The first edge corresponds vertically with a critical point on the contour line. The slope of a tangent line on the critical point of the contour line is smaller than 0.176.

Abstract translation: 提供元件基板，包括基板，金属层和平坦化层。 金属层位于基板上。 金属层具有沿第一方向的第一边缘。 平坦化层位于金属层上。 平坦化层包括接触孔。 接触孔具有连续的壁和底侧。 金属层暴露在底面。 垂直平面上连续壁的轮廓线是曲线。 第一个边沿垂直对应于轮廓线上的临界点。 轮廓线临界点上切线的斜率小于0.176。