公开(公告)号：US3617739A

公开(公告)日：1971-11-02

申请号：US3617739D

申请日：1970-04-09

Applicant: INST PLASMAPHYSIK GMBH

Inventor： LIEBL HELMUT

IPC: G01Q30/02 ,  H01J37/252 ,  H01J49/30 ,  H01J37/14 ,  H01J37/12

CPC classification number: H01J37/252 ,  H01J49/30

Abstract: An ion lens (12) is located between an ion source (10) and the magnetic sector field of an ion microprobe apparatus, the ion lens having its input focal plane in the region in which the ion beam emitted by the ion source has its smallest cross section, the magnetic sector field being a uniform homogeneous 180* magnetic field in which the ions emitted from the ion lens (12) as parallel bundles are first deflected by 90*, then passed through an aperture for selection of ions of predetermined mass, and again deflected by 90*, to be emitted as parallel bundles of ions of preselected mass. The microprobe may be combined with an electron beam generator which emits a parallel beam of electrons to a second uniform 180* magnetic field, which places the electron beam coaxially with the ion beam. The ion beam passes through a portion of this second magnetic field in a region which is of insufficient field strength to deflect the ion beam, to provide for simultaneous, or selective irradiation of the same spot on a test sample by ions or electrons. Lenses for simultaneous focusing of ions and electrons (FIG. 2) includes a pair of pole shoes with a magnetic field therebetween and a nonmagnetic electrode located between the pole shoes and energized with respect to the pole shoes to provide for combined magnetic and electrical action on the ion, and/or electron beam.

公开(公告)号：US3622781A

公开(公告)日：1971-11-23

申请号：US3622781D

申请日：1970-04-29

Applicant: INST PLASMAPHYSIK GMBH

Inventor： LIEBL HELMUT

IPC: H01J49/32 ,  H01J39/36

CPC classification number: H01J49/322

Abstract: To provide for improved energy output and image resolution of Mattauch-Herzog type mass spectrographs, a beam-imaging means, which may be a separate electronic lens, or part of the electric field sector deflection arrangement suitably energized, is located in advance of the beam energy aperture, by a distance such that the exit slit of the ion source is imaged in the plane of the beam energy aperture. A second electronic lens is arranged between the beam energy aperture and the magnetic field sector deflection arrangement, of similar focal length, and arranged to image the target plane of the mass spectrograph at the same plane of the beam energy limiting means, so that the image focused thereon by the first imaging arrangement is received and focused on the target plane by the second electronic lens; the magnetic field sector deflection arrangement is rotated with respect to the electric field sector deflection arrangement by 180* to compensate for the effects of the lenses. The presence of the lenses permits independent adjustment of dispersion angles and energy band width of the ion beams.