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    Electrical conductor
    1.
    发明授权
    Electrical conductor 失效
    电导体

    公开(公告)号：US3639672A

    公开(公告)日：1972-02-01

    申请号：US3639672D

    申请日：1970-02-20

    Applicant: INST PLASMAPHYSIK GMBH

    Inventor： KAFKA WILHELM

    IPC: H01B12/16 ,  H01L39/14 ,  H01L39/18 ,  H01B7/34 ,  H01B5/00

    CPC classification number: H01L39/18 ,  H01B12/16 ,  H01L39/14 ,  Y02E40/647 ,  Y10S505/887

    Abstract: A cryogenic electric conductor formed from a plurality of superconducting wires arranged in a twisted configuration. The conductor is enclosed in a vacuumtight sheath and the gaps between conductor and the sheath and between the individual wires are filled with a low-temperature cooling medium, preferably helium. Each of the wires has one or more superconducting cores surrounded by a metal e.g. copper, in efficient heat-conducting contact therewith. The sheaths may be formed of a low-conducting metal or from a plastic.

    Abstract translation: 由以扭曲构造布置的多根超导线形成的低温电导体。 导体被封闭在真空密封护套中，并且导体和护套之间以及各个电线之间的间隙被填充有低温冷却介质，优选地为氦。 每个导线具有一个或多个被金属包围的超导芯，例如 铜，与其进行高效的导热接触。 护套可以由低导电金属或塑料形成。

    Ion lens to provide a focused ion, or ion and electron beam at a target, particularly for ion microprobe apparatus
    2.
    发明授权
    Ion lens to provide a focused ion, or ion and electron beam at a target, particularly for ion microprobe apparatus 失效
    离子镜头提供聚焦离子，或离子和电子束在目标，特别是离子微阵列设备

    公开(公告)号：US3617739A

    公开(公告)日：1971-11-02

    申请号：US3617739D

    申请日：1970-04-09

    Applicant: INST PLASMAPHYSIK GMBH

    Inventor： LIEBL HELMUT

    IPC: G01Q30/02 ,  H01J37/252 ,  H01J49/30 ,  H01J37/14 ,  H01J37/12

    CPC classification number: H01J37/252 ,  H01J49/30

    Abstract: An ion lens (12) is located between an ion source (10) and the magnetic sector field of an ion microprobe apparatus, the ion lens having its input focal plane in the region in which the ion beam emitted by the ion source has its smallest cross section, the magnetic sector field being a uniform homogeneous 180* magnetic field in which the ions emitted from the ion lens (12) as parallel bundles are first deflected by 90*, then passed through an aperture for selection of ions of predetermined mass, and again deflected by 90*, to be emitted as parallel bundles of ions of preselected mass. The microprobe may be combined with an electron beam generator which emits a parallel beam of electrons to a second uniform 180* magnetic field, which places the electron beam coaxially with the ion beam. The ion beam passes through a portion of this second magnetic field in a region which is of insufficient field strength to deflect the ion beam, to provide for simultaneous, or selective irradiation of the same spot on a test sample by ions or electrons. Lenses for simultaneous focusing of ions and electrons (FIG. 2) includes a pair of pole shoes with a magnetic field therebetween and a nonmagnetic electrode located between the pole shoes and energized with respect to the pole shoes to provide for combined magnetic and electrical action on the ion, and/or electron beam.

    Mass spectrograph with double focusing
    4.
    发明授权
    Mass spectrograph with double focusing 失效
    具有双重聚焦的质谱

    公开(公告)号：US3622781A

    公开(公告)日：1971-11-23

    申请号：US3622781D

    申请日：1970-04-29

    Applicant: INST PLASMAPHYSIK GMBH

    Inventor： LIEBL HELMUT

    IPC: H01J49/32 ,  H01J39/36

    CPC classification number: H01J49/322

    Abstract: To provide for improved energy output and image resolution of Mattauch-Herzog type mass spectrographs, a beam-imaging means, which may be a separate electronic lens, or part of the electric field sector deflection arrangement suitably energized, is located in advance of the beam energy aperture, by a distance such that the exit slit of the ion source is imaged in the plane of the beam energy aperture. A second electronic lens is arranged between the beam energy aperture and the magnetic field sector deflection arrangement, of similar focal length, and arranged to image the target plane of the mass spectrograph at the same plane of the beam energy limiting means, so that the image focused thereon by the first imaging arrangement is received and focused on the target plane by the second electronic lens; the magnetic field sector deflection arrangement is rotated with respect to the electric field sector deflection arrangement by 180* to compensate for the effects of the lenses. The presence of the lenses permits independent adjustment of dispersion angles and energy band width of the ion beams.

    Color temperature measuring process and apparatus
    7.
    发明授权
    Color temperature measuring process and apparatus 失效
    颜色温度测量过程和设备

    公开(公告)号：US3619059A

    公开(公告)日：1971-11-09

    申请号：US3619059D

    申请日：1969-08-06

    Applicant: INST PLASMAPHYSIK GMBH

    Inventor： MULLER PETER ,  GUILINO ERNST

    IPC: G01J5/60 ,  G01J3/42

    CPC classification number: G01J5/60

    Abstract: The color temperature of the radiating body is measured by separately measuring photoelectrically two different wavelength ranges of a beam emanating from the body, while the intensity of the beam is adjusted by an attenuating device so that the two different wavelength ranges are affected substantially the same and one of the wavelength ranges is maintained at a predetermined intensity.

    Method of effecting correction in an optical system
    8.
    发明授权
    Method of effecting correction in an optical system 失效

    公开(公告)号：US3362285A

    公开(公告)日：1968-01-09

    申请号：US35352764

    申请日：1964-03-20

    Applicant: INST PLASMAPHYSIK GMBH

    Inventor： HEINRICH HORA

    IPC: B23K26/02 ,  G02B27/00 ,  G02B27/58

    CPC classification number: G02B27/58 ,  B23K26/02 ,  G02B27/0025 ,  Y10S359/90

    Abstract: 1,021,839. Etching. INSTITUT FUR PLASMAPHYSIK G.m.b.H. March 23, 1964 [March 22, 1963], No. 12110/64. Heading B6J. [Also in Divisions G2 and H3] The boundary surface of a laser crystal 10 1 , Fig. 3, or other optical element is corrected to make it correspond more closely to the equiphase surface of a wave front passing therethrough by producing an image at 26 of the uncorrected surface showing the phase errors in the form of intensity variations of the image, projecting this image back on to layer 20 bounding the surface and made of a material whose solubility characteristics in a specific solvent can be varied by irradiation with the light used for the back projection, and, using this irradiated layer as a control, selectively removing material from the uncorrected boundary surface so as to obtain a surface corresponding more closely with the equiphase surface of the wavefront. As applied to a ruby crystal 10 1 , the end faces are ground substantially plane-parallel to one another and coated with a 100% reflective mirror 16 at one end and a transparent layer 20, of a material whose solubility in certain solvents alters under irradiation by short wave light, but is insensitive to the red light emitted by the laser, and, after layer 20 is ground flat at 22 a 95 to 99% reflective non-absorptive mirror coating 18 1 . The crystal 10 1 is excited to produce stimulated emission and through optical system 24 produces an image on the red-sensitive photographic layer 26. The mirror coating 18 1 is removed and photographic layer 26 developed and fixed. Light, to which layer 20 is sensitive, is now used to project an image of developed layer 26 back on to layer 20 which is then treated with a solvent so that layer 20, which is used as one face of the laser crystal, has a boundary surface more closely correspondingwith the equiphase surface. A coating similar to 18 1 is then provided on the new surface. In a modification the production of the image and back projection are repeated several times to obtain a boundary surface successively closer to that required. In a further form, layer 20 does not remain in the optical element but is used as an etch-resistant layer for controlling the direct etching away of the element and the layer is subsequently removed.

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