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公开(公告)号:US20190296214A1
公开(公告)日:2019-09-26
申请号:US16301498
申请日:2016-06-13
Applicant: INTEL CORPORATION
Inventor: Zachary R. YOSCOVITS , David J. MICHALAK , Jeanette M. ROBERTS , Ravi PILLARISETTY , James S. CLARKE
Abstract: Described herein are structures that include Josephson Junctions (JJs) to be used in superconducting qubits of quantum circuits disposed on a substrate. The JJs of these structures are fabricated using an approach that can be efficiently used in large scale manufacturing, providing a substantial improvement with respect to conventional approaches which include fabrications steps which are not manufacturable. In one aspect of the present disclosure, the proposed approach includes providing a patterned superconductor layer over a substrate, providing a layer of surrounding dielectric over the patterned superconductor layer, and providing a via opening in the layer of surrounding dielectric over a first portion of the patterned superconductor layer. The proposed approach further includes depositing in the via opening a first superconductor, a barrier dielectric, and a second superconductor to form, respectively, a base electrode, a tunnel barrier layer, and a top electrode of the JJ.