公开(公告)号：US20170067158A1

公开(公告)日：2017-03-09

申请号：US15356160

申请日：2016-11-18

Applicant: Infineon Technologies AG

Inventor： Andreas Stefaner ,  Heimo Schieder ,  Guenter Denifl ,  Roland Moennich ,  Anton Gernot Winkler

IPC: C23C16/458 ,  H01L21/673 ,  H01L21/677 ,  H01L21/02

CPC classification number: C23C16/4587 ,  C23C8/10 ,  C23C16/458 ,  H01L21/02233 ,  H01L21/02271 ,  H01L21/0262 ,  H01L21/67309 ,  H01L21/67313 ,  H01L21/67754 ,  H01L21/67757

Abstract: A substrate carrier system for carrying substrates to a vertical oven and a vertical oven are disclosed. In an embodiment, the system includes a substrate carrier configured to carry a plurality of substrates and a substrate carrier support structure configured to be inserted along an insertion direction into the vertical oven, and to receive the substrate carrier in a direction substantially orthogonal to the insertion direction into a holding position in the substrate carrier support structure.

Abstract translation: 公开了用于将基板输送到立式烘箱和立式烘箱的基板载体系统。 在一个实施例中，系统包括被配置为承载多个基板的基板载体和构造成沿着插入方向插入垂直烘箱中的基板载体支撑结构，并且在基本正交于插入件的方向上接收基板载体 方向进入衬底载体支撑结构中的保持位置。

公开(公告)号：US20160027677A1

公开(公告)日：2016-01-28

申请号：US14444889

申请日：2014-07-28

Applicant: Infineon Technologies AG

Inventor： Andreas Stefaner ,  Heimo Schieder ,  Guenter Denifl ,  Roland Moennich ,  Anton Gernot Winkler

IPC: H01L21/677 ,  C23C16/46 ,  H01L21/673 ,  C23C16/458

CPC classification number: C23C16/4587 ,  C23C8/10 ,  C23C16/458 ,  H01L21/02233 ,  H01L21/02271 ,  H01L21/0262 ,  H01L21/67309 ,  H01L21/67313 ,  H01L21/67754 ,  H01L21/67757

Abstract: A substrate carrier system for moving substrates in a vertical oven and a method for processing substrates are disclosed. In some embodiments, a method for oxidizing material or depositing material includes carrying a plurality of substrates by a substrate carrier and inserting the substrate carrier into a vertical oven, wherein the plurality of substrates are held by the substrate carrier in predefined positions, wherein an angle measured between a main surface of a substrate of the plurality of substrates at one of the predefined positions and a vertical direction is less than 20 degrees. The method further includes oxidizing a material on the plurality of substrates or depositing a material onto the plurality of substrates.

Abstract translation: 公开了一种用于在垂直烘箱中移动衬底的衬底载体系统和用于处理衬底的方法。 在一些实施例中，用于氧化材料或沉积材料的方法包括通过衬底载体承载多个衬底并将衬底载体插入垂直烘箱中，其中多个衬底由衬底载体保持在预定位置，其中角度 在预定位置之一和垂直方向上的多个基板的基板的主表面之间测量的小于20度。 该方法还包括氧化多个衬底上的材料或将材料沉积到多个衬底上。

公开(公告)号：US09530678B2

公开(公告)日：2016-12-27

申请号：US14444889

申请日：2014-07-28

Applicant: Infineon Technologies AG

Inventor： Andreas Stefaner ,  Heimo Schieder ,  Guenter Denifl ,  Roland Moennich ,  Anton Gernot Winkler

IPC: H01L21/673 ,  H01L21/677 ,  C23C16/458 ,  H01L21/02 ,  C23C8/10

CPC classification number: C23C16/4587 ,  C23C8/10 ,  C23C16/458 ,  H01L21/02233 ,  H01L21/02271 ,  H01L21/0262 ,  H01L21/67309 ,  H01L21/67313 ,  H01L21/67754 ,  H01L21/67757

Abstract: A substrate carrier system for moving substrates in a vertical oven and a method for processing substrates are disclosed. In some embodiments, a method for oxidizing material or depositing material includes carrying a plurality of substrates by a substrate carrier and inserting the substrate carrier into a vertical oven, wherein the plurality of substrates are held by the substrate carrier in predefined positions, wherein an angle measured between a main surface of a substrate of the plurality of substrates at one of the predefined positions and a vertical direction is less than 20 degrees. The method further includes oxidizing a material on the plurality of substrates or depositing a material onto the plurality of substrates.

Abstract translation: 公开了一种用于在垂直烘箱中移动衬底的衬底载体系统和用于处理衬底的方法。 在一些实施例中，用于氧化材料或沉积材料的方法包括通过衬底载体承载多个衬底并将衬底载体插入垂直烘箱中，其中多个衬底由衬底载体保持在预定位置，其中角度 在预定位置之一和垂直方向上的多个基板的基板的主表面之间测量的小于20度。 该方法还包括氧化多个衬底上的材料或将材料沉积到多个衬底上。