公开(公告)号：US20220064192A1

公开(公告)日：2022-03-03

申请号：US17410316

申请日：2021-08-24

Applicant: Inpria Corporation

Inventor： Joseph B. Edson ,  Brian J. Cardineau ,  William Earley ,  Kierra Huihui-Gist ,  Thomas J. Lamkin ,  Robert E. Jilek

IPC: C07F7/22

Abstract: Synthesis reactions are described to efficiently and specifically form compounds of the structure RSnL3, where R is an organic ligand to the tin, and L is hydrolysable ligand or a hydrolysis product thereof. The synthesis is effective for a broad range of R ligands. The synthesis is based on the use of alkali metal ions and optionally alkaline earth (pseudo-alkaline earth) metal ions. Compounds are formed of the structures represented by the formulas RSn(C≡CSiR′3)3, R′R″ACSnL3, where A is a halogen atom (F, Cl, Br or I) or an aromatic ring with at least one halogen substituent, R′R″(R′″O)CSnL3 or R′R″(N≡C)CSnZ3.

公开(公告)号：US20220411446A1

公开(公告)日：2022-12-29

申请号：US17682586

申请日：2022-02-28

Applicant: Inpria Corporation

Inventor： Robert E. Jilek ,  Brian J. Cardineau ,  Kierra Huihui-Gist ,  Stephen T. Meyers

IPC: C07F7/22 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38 ,  G03F7/32

Abstract: Organotin compounds are presented that are represented by the formula RSnL3, wherein R is a deuterated hydrocarbyl group and L is a hydrolysable ligand. Two different synthesis techniques are described for synthesizing these compositions. A first method involves reacting a primary halide hydrocarbyl compound (R—X, where X is a halide atom) with an organometallic composition comprising SnL3 moieties associated with metal cations M, where M is an alkali metal, alkaline earth metal, and/or pseudo-alkaline earth metal (Zn, Cd, or Hg), and L is either an amide ligand resulting in an alkali metal tin triamide compound or an acetylide ligand resulting in an alkali metal tin triacetylide, to form correspondingly a monohydrocarbyl tin triamide (RSn(NR′2)3) or a monohydrocarbyl tin triacetylide (RSn(C≡CRs)3). An alternative approach involves reacting a Grignard reagent RMgX with SnL4 in a solution comprising an organic solvent to form a monoorgano tin tralkylamide, a monoorgano tin trialkoxide, monoorgano tin tri acetylide or monoorgano tin tricarboxylate. The compositions are useful for radiation patterning, especially with EUV radiation.