-
公开(公告)号:US10707121B2
公开(公告)日:2020-07-07
申请号:US15396469
申请日:2016-12-31
Applicant: Intel Corporation
Inventor: Jun Liu , Mark A. Levan , Gordon A. Haller , Fei Wang , Wei Yeeng Ng , Wesley O. McKinsey , Zhiqiang Xie , Jeremy F. Adams , Hongbin Zhu , Jun Zhao
IPC: H01L21/768 , H01L27/11575 , H01L27/11573 , H01L27/11526 , H01L27/11548 , H01L23/528 , H01L23/522 , H01L23/532 , H01L27/11582 , H01L27/11556
Abstract: Conductive structure technology is disclosed. In one example, a conductive structure can include an interconnect and a plurality of conductive layers overlying the interconnect. Each conductive layer can be separated from an adjacent conductive layer by an insulative layer. In addition, the conductive structure can include a contact extending through the plurality of conductive layers to the interconnect. The contact can be electrically coupled to the interconnect and insulated from the plurality of conductive layers. Associated systems and methods are also disclosed.
-
公开(公告)号:US20180190540A1
公开(公告)日:2018-07-05
申请号:US15396469
申请日:2016-12-31
Applicant: Intel Corporation
Inventor: Jun Liu , Gordon A. Haller , Fei Wang , Wei Yeeng Ng , Wesley O. McKinsey , Zhiqiang Xie , Jeremy F. Adams , Hongbin Zhu , Jun Zhao , Mark A. Levan
IPC: H01L21/768 , H01L23/522 , H01L23/528 , H01L23/532
Abstract: Conductive structure technology is disclosed. In one example, a conductive structure can include an interconnect and a plurality of conductive layers overlying the interconnect. Each conductive layer can be separated from an adjacent conductive layer by an insulative layer. In addition, the conductive structure can include a contact extending through the plurality of conductive layers to the interconnect. The contact can be electrically coupled to the interconnect and insulated from the plurality of conductive layers. Associated systems and methods are also disclosed.
-