公开(公告)号：US08959462B2

公开(公告)日：2015-02-17

申请号：US13795513

申请日：2013-03-12

申请人： International Business Machines Corporation

发明人： Tadanobu Inoue ,  David O Melville ,  Alan E Rosenbluth ,  Masaharu Sakamoto ,  Kehan Tian

IPC分类号： G06F17/50 ,  G03F1/70

CPC分类号： G03F1/70

摘要： A method, an article of manufacture, and a system for designing a mask. The method for designing a mask is implemented by a computer device having a memory, a processor device communicatively coupled to the memory, and a module configured to carry out the method including the steps of: generating an optical domain representation from a design pattern and an imaging light; and optimizing the optical domain representation under a constraint that values of negative excursions at predetermined evaluation points must be greater than or equal to predetermined negative threshold values assigned to the predetermined evaluation points; where: the optical domain representation is a variable representation of a wavefront; the imaging light is light that is transmitted through the mask; the negative excursions are in an object domain representation of the optical domain representation; and the predetermined evaluation points are in the object domain representation.

摘要翻译： 一种方法，制品和用于设计面罩的系统。 用于设计掩模的方法由具有存储器的计算机设备，通信地耦合到存储器的处理器设备和被配置为执行该方法的模块实现，该计算机设备包括以下步骤：从设计模式生成光学域表示 成像光; 并且在预定评估点处的负偏移值必须大于或等于分配给预定评估点的预定负阈值的约束下优化光域表示; 其中：光域表示是波前的可变表示; 成像光是通过掩模透射的光; 负偏移在光域表示的对象域表示中; 并且预定的评估点在对象域表示中。