公开(公告)号：US07139997B1

公开(公告)日：2006-11-21

申请号：US10844034

申请日：2004-05-11

申请人： Irfan Rahim ,  Bradley Jensen ,  Girish Venkitachalam ,  Hugh Sung-Ki O ,  Susan Falk ,  Priya Selvaraj

发明人： Irfan Rahim ,  Bradley Jensen ,  Girish Venkitachalam ,  Hugh Sung-Ki O ,  Susan Falk ,  Priya Selvaraj

IPC分类号： G06F17/50

CPC分类号： G06F17/5081

摘要： Disclosed is a method for checking the operation of an IC mask generation algorithm in which at least a first identifier of the mask generation algorithm is associated with at least a first symbol that is not associated with generating a functional IC feature. The first symbol has a predetermined size and a predetermined shape. A predetermined location on a mask is also associated with the first symbol. A mask diagram on the mask is generated at least partially at the first predetermined location. The size and shape of the mask diagram is then compared with at least a portion of the first predetermined size and the first predetermined shape of the first symbol.

摘要翻译： 公开了一种用于检查IC掩模生成算法的操作的方法，其中至少掩模生成算法的第一标识符与至少与生成功能IC特征相关联的第一符号相关联。 第一符号具有预定尺寸和预定形状。 掩模上的预定位置也与第一符号相关联。 至少部分地在第一预定位置处产生掩模上的掩模图。 然后将掩模图的尺寸和形状与第一符号的第一预定尺寸和第一预定形状的至少一部分进行比较。