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公开(公告)号：US11529794B2
公开(公告)日：2022-12-20
申请号：US17213527
申请日：2021-03-26
Applicant: JAPAN SCIENCE AND TECHNOLOGY AGENCY
Inventor： Yutaka Majima , YoonYoung Choi , Ikuko Shimada , Ryo Toyama , Mingyue Yang
Abstract: A heteroepitaxial structure includes a first metal portion having a polycrystalline structure, a second metal portion on the first metal portion, the second metal portion has an island-shaped structure on the first metal portion, the second metal portion is provided corresponding to at least one crystalline grain exposed to a surface of the first metal portion, and the second metal portion and the at least one crystalline grain have a heteroepitaxial interface.
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