公开(公告)号：US11021433B2

公开(公告)日：2021-06-01

申请号：US16719921

申请日：2019-12-18

Applicant: JNC CORPORATION

Inventor： Daisuke Inoki ,  Teizi Satou ,  Hideki Hayashi

IPC: C07C69/653 ,  C07C67/03 ,  C08L33/14 ,  G03F7/004 ,  G03F7/038

Abstract: A (meth)acrylate compound excellent in compatibility with other photosensitive resins and capable of providing a polymer with high transparency, a polymer, a resist material, and a method for producing the (meth)acrylate compound.
The (meth)acrylate compound is represented by formula (1).

公开(公告)号：US11312804B2

公开(公告)日：2022-04-26

申请号：US16968874

申请日：2019-02-13

Applicant: JNC CORPORATION

Inventor： Koichi Shibata ,  Teizi Satou ,  Daisuke Inoki ,  Hideki Hayashi

IPC: C07D309/30 ,  C08F220/28 ,  G03F7/004

Abstract: A polymerizable compound represented by formula (1). In formula (1), one of eight hydrogen atoms is substituted by a (meth)acryloyloxy group, and the rest seven hydrogen atoms are independently non-substituted or substituted by a saturated hydrocarbon group having 1 to 10 carbons.