公开(公告)号：US20210311391A1

公开(公告)日：2021-10-07

申请号：US17268998

申请日：2019-07-01

Applicant: JSR CORPORATION

Inventor： Takuhiro TANIGUCHI ,  Naoki NISHIGUCHI ,  Tomoyuki MATSUMOTO ,  Hirokazu SAKAKIBARA ,  Akito HIRO ,  Hisanori AKIMARU

IPC: G03F7/039 ,  G03F7/004 ,  C08F220/30

Abstract: The present photosensitive resin composition includes a polymer (A) having a structural unit (a1) represented by a formula (a1), a structural unit (a2) represented by a formula (a2), and a structural unit (a3) represented by a formula (a3) and a photoacid generator (B). In the formulae (a1) to (a3), R11, R21, and R31 each independently represent a hydrogen atom, a substituted or non-substituted alkyl group having 1 to 10 carbon atom or a halogen atom; R12 and R32 each independently represent a divalent organic group; R22 represents a substituted or non-substituted alkanediyl group having 2 to 10 carbon atoms; R13 represents an acid dissociable group having an alicyclic structure; R23 represents an alkyl group having 1 to 10 carbon atoms; R33 represents a hydroxyaryl group; and 1, m and n each independently represent an integer from 0 to 10.