公开(公告)号：US20240319596A1

公开(公告)日：2024-09-26

申请号：US18574367

申请日：2022-06-01

Applicant: JSR CORPORATION

Inventor： Hiromu MIYATA ,  Takuhiro TANIGUCHI

IPC: G03F7/039 ,  C08F212/08 ,  C08F220/18 ,  G03F7/00 ,  G03F7/004

CPC classification number: G03F7/0397 ,  C08F212/08 ,  C08F220/18 ,  G03F7/0002 ,  G03F7/0045

Abstract: A polymer containing a structural unit (I) represented by formula (1) is included in a radiation-sensitive composition. In formula (1), R2 is a single bond, a divalent hydrocarbon group, or the like. R3 is a divalent group represented by formula (2) or formula (3). R4 is a divalent organic group. Y− is a monovalent anion which can generate a sulfonic acid group, an imidic acid group, or a methide acid group through exposure to light. Ma+ is an a-valent cation. a is 1 or 2.

公开(公告)号：US20230236506A2

公开(公告)日：2023-07-27

申请号：US17867739

申请日：2022-07-19

Applicant: JSR CORPORATION

Inventor： Katsuaki NISHIKORI ,  Kazuya KIRIYAMA ,  Takuhiro TANIGUCHI ,  Ken MARUYAMA

IPC: G03F7/039 ,  G03F7/029

CPC classification number: G03F7/039 ,  G03F7/029

Abstract: A radiation-sensitive resin composition includes a polymer and a compound. The compound includes a first structural unit including an aromatic carbon ring to which no less than two hydroxy groups bond, and a second structural unit including an acid-labile group which is dissociable by an action of an acid to give a carboxy group. The compound is represented by formula (1). R1 represents a monovalent organic group having 1 to 30 carbon atoms; and X+ represents a monovalent radiation-sensitive onium cation. A weight average molecular weight of the polymer is no greater than 10,000.


R1—COO−X+  (1)

公开(公告)号：US20210311391A1

公开(公告)日：2021-10-07

申请号：US17268998

申请日：2019-07-01

Applicant: JSR CORPORATION

Inventor： Takuhiro TANIGUCHI ,  Naoki NISHIGUCHI ,  Tomoyuki MATSUMOTO ,  Hirokazu SAKAKIBARA ,  Akito HIRO ,  Hisanori AKIMARU

IPC: G03F7/039 ,  G03F7/004 ,  C08F220/30

Abstract: The present photosensitive resin composition includes a polymer (A) having a structural unit (a1) represented by a formula (a1), a structural unit (a2) represented by a formula (a2), and a structural unit (a3) represented by a formula (a3) and a photoacid generator (B). In the formulae (a1) to (a3), R11, R21, and R31 each independently represent a hydrogen atom, a substituted or non-substituted alkyl group having 1 to 10 carbon atom or a halogen atom; R12 and R32 each independently represent a divalent organic group; R22 represents a substituted or non-substituted alkanediyl group having 2 to 10 carbon atoms; R13 represents an acid dissociable group having an alicyclic structure; R23 represents an alkyl group having 1 to 10 carbon atoms; R33 represents a hydroxyaryl group; and 1, m and n each independently represent an integer from 0 to 10.

公开(公告)号：US20210124263A1

公开(公告)日：2021-04-29

申请号：US17081000

申请日：2020-10-27

Applicant: JSR CORPORATION

Inventor： Katsuaki NISHIKORI ,  Kazuya KIRIYAMA ,  Takuhiro TANIGUCHI ,  Ken MARUYAMA

IPC: G03F7/004 ,  G03F7/039 ,  C08F220/18 ,  C07D317/70 ,  C07C381/12 ,  C07C309/17 ,  C07D327/04 ,  C07C309/12 ,  C07C65/10 ,  C07C59/115 ,  C07C69/63 ,  C07C65/05

Abstract: A radiation-sensitive resin composition includes a polymer including a phenolic hydroxyl group, a compound represented by formula (1-1) or formula (1-2), and a compound represented by formula (2). In the formula (1-1), a sum of a, b, and c is no less than 1; at least one of R1, R2, and R3 represents a fluorine atom or the like; and R4 and R5 each independently represent a hydrogen atom, a fluorine atom, or the like. In the formula (1-2), in a case in which d is 1, R6 represents a fluorine atom or the like, and in a case in which d is no less than 2, at least one of the plurality of R6s represents a fluorine atom or the like; and R8 represents a single bond or a divalent organic group having 1 to 20 carbon atoms.

公开(公告)号：US20240385518A1

公开(公告)日：2024-11-21

申请号：US18691090

申请日：2022-09-01

Applicant: JSR CORPORATION

Inventor： Katsuaki NISHIKORI ,  Kazuya KIRIYAMA ,  Natsuko KINOSHITA ,  Takuhiro TANIGUCHI ,  Takuya OMIYA

IPC: G03F7/004 ,  G03F7/039

Abstract: A radiation-sensitive resin composition includes a resin including a structural unit (I) represented by formula (1). Ra is a hydrogen atom or a substituted or unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms; Ar1 is a substituted or unsubstituted divalent aromatic hydrocarbon group having 6 to 20 carbon atoms; m is 0 or 1; L1 is a single bond, or —O—, *—COO—, a divalent hydrocarbon group having 1 to 20 carbon atoms, or a combination thereof, and * is a bond on an Ar1 side; Ar2 is a monovalent aromatic hydrocarbon group having 6 to 20 carbon atoms and substituted with X; X is an iodine atom or a bromine atom; and n1 is an integer of 1 to nmax, wherein nmax is the number of Xs when all hydrogen atoms in the monovalent aromatic hydrocarbon group represented by the Ar2 are substituted with X.

公开(公告)号：US20230236501A1

公开(公告)日：2023-07-27

申请号：US18100031

申请日：2023-01-23

Applicant: JSR CORPORATION

Inventor： Natsuko KINOSHITA ,  Takuhiro TANIGUCHI ,  Katsuaki NISHIKORI ,  Kazuya KIRIYAMA

IPC: G03F7/004 ,  C07C381/12 ,  C07C65/24 ,  C07C323/62 ,  C07D333/76 ,  C07D327/08 ,  C07C69/92 ,  C08F220/18 ,  C08F212/14

CPC classification number: G03F7/0045 ,  C07C381/12 ,  C07C65/24 ,  C07C323/62 ,  C07D333/76 ,  C07D327/08 ,  C07C69/92 ,  C08F220/1812 ,  C08F212/22 ,  C08F220/1811 ,  C08F220/1807 ,  C07C2601/08

Abstract: A radiation-sensitive resin composition includes: a polymer, solubility of which in a developer solution is capable of being altered by an action of an acid; a radiation-sensitive acid generator; and a compound represented by formula (1). Ar1 represents a group obtained by removing (a+b+2) hydrogen atoms from an aromatic hydrocarbon ring having 6 to 30 ring atoms; R1 represents a halogen atom or a monovalent organic group having 1 to 20 carbon atoms; L1 represents a divalent linking group; R2 represents a substituted or unsubstituted monovalent aromatic hydrocarbon group having 6 to 20 carbon atoms; a is an integer of 0 to 10, b is an integer of 1 to 10, wherein a sum of a and b is no greater than 10; and X+ represents a monovalent radiation-sensitive onium cation.

公开(公告)号：US20220334481A1

公开(公告)日：2022-10-20

申请号：US17854048

申请日：2022-06-30

Applicant: JSR CORPORATION

Inventor： Takuhiro TANIGUCHI ,  Katsuaki NISHIKORI ,  Hayato NAMAI ,  Kazuya KIRIYAMA ,  Ken MARUYAMA

IPC: G03F7/039 ,  C08G75/20

Abstract: A radiation-sensitive resin composition includes: a polymer including a structural unit including an acid-labile group; and a compound represented by formula (1). R1, R2, and R3 each independently represent a halogen atom, a hydroxy group, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms; X1, X2, and X3 each independently represent a group represented by formula (2); a sum of d, e, and f is no less than 1; R4 represents a hydrocarbon group having 1 to 20 carbon atoms and R5 represents a hydrocarbon group having 1 to 20 carbon atoms, or R4 and R5 taken together represent a heterocyclic structure having 4 to 20 ring atoms, together with the sulfur atom to which R4 and R5 bond; n is 0 or 1; A− represents a monovalent sulfonic acid anion; and Y represents —COO—, —OCO—, or —N(R7)CO—.

公开(公告)号：US20230244143A9

公开(公告)日：2023-08-03

申请号：US17854048

申请日：2022-06-30

Applicant: JSR CORPORATION

Inventor： Takuhiro TANIGUCHI ,  Katsuaki NISHIKORI ,  Hayato NAMAI ,  Kazuya KIRIYAMA ,  Ken MARUYAMA

IPC: G03F7/039 ,  C08G75/20

CPC classification number: G03F7/0392 ,  C08G75/20

Abstract: A radiation-sensitive resin composition includes: a polymer including a structural unit including an acid-labile group; and a compound represented by formula (1). R1, R2, and R3 each independently represent a halogen atom, a hydroxy group, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms; X1, X2, and X3 each independently represent a group represented by formula (2); a sum of d, e, and f is no less than 1; R4 represents a hydrocarbon group having 1 to 20 carbon atoms and R5 represents a hydrocarbon group having 1 to 20 carbon atoms, or R4 and R5 taken together represent a heterocyclic structure having 4 to 20 ring atoms, together with the sulfur atom to which R4 and R5 bond; n is 0 or 1; A− represents a monovalent sulfonic acid anion; and Y represents —COO—, —OCO—, or —N(R7)CO—.

公开(公告)号：US20220382152A1

公开(公告)日：2022-12-01

申请号：US17867739

申请日：2022-07-19

Applicant: JSR CORPORATION

Inventor： Katsuaki NISHIKORI ,  Kazuya KIRIYAMA ,  Takuhiro TANIGUCHI ,  Ken MARUYAMA

IPC: G03F7/039 ,  G03F7/029

Abstract: A radiation-sensitive resin composition includes a polymer and a compound. The compound includes a first structural unit including an aromatic carbon ring to which no less than two hydroxy groups bond, and a second structural unit including an acid-labile group which is dissociable by an action of an acid to give a carboxy group. The compound is represented by formula (1). R1 represents a monovalent organic group having 1 to 30 carbon atoms; and X represents a monovalent radiation-sensitive onium cation. A weight average molecular weight of the polymer is no greater than 10,000. R1—COO−X+(1)

公开(公告)号：US20220269172A1

公开(公告)日：2022-08-25

申请号：US17673952

申请日：2022-02-17

Applicant: JSR CORPORATION

Inventor： Katsuaki NISHIKORI ,  Kazuya KIRIYAMA ,  Takuhiro TANIGUCHI ,  Ken MARUYAMA

IPC: G03F7/039 ,  G03F7/004 ,  C08F220/18 ,  C08F220/22

Abstract: Provided are: a radiation-sensitive resin composition, a method of forming a resist pattern, and a polymer which enable forming a resist pattern with favorable sensitivity to exposure light and superiority in terms of CDU performance and resolution. The radiation-sensitive resin composition contains: a polymer having: a first structural unit represented by formula (1), and a second structural unit derived from a (meth)acrylic acid ester including an acid-labile group; and a radiation-sensitive acid generator.