公开(公告)号：US20180319740A1

公开(公告)日：2018-11-08

申请号：US16032244

申请日：2018-07-11

Applicant: JSR CORPORATION

Inventor： Natsuko KINOSHITA ,  Katsuaki NISHIKORI ,  Kouta FURUICHI

IPC: C07C309/69 ,  C07D295/084 ,  C07D295/15 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20

CPC classification number: C07C309/69 ,  C07D295/084 ,  C07D295/15 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20

Abstract: A radiation-sensitive resin composition includes a first polymer including a first structural unit that includes a first acid-labile group; a radiation-sensitive acid generator; and a compound represented by formula (1). n is 1 or 2. R1 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms in a case in which n is 1. R1 represents a divalent organic group having 1 to 20 carbon atoms in a case in which n is 2. R2 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. E represents a group represented by formula (i). R2 and E may taken together represent a ring structure having 3 to 20 ring atoms together with the nitrogen atom. X represents a divalent organic group having 1 to 20 carbon atoms. R3 represents a second acid-labile group.