公开(公告)号：US20210318613A9

公开(公告)日：2021-10-14

申请号：US16897326

申请日：2020-06-10

Applicant: JSR CORPORATION

Inventor： Katsuaki NISHIKORI ,  Ken MARUYAMA ,  Kazuki KASAHARA ,  Tsuyoshi FURUKAWA ,  Natsuko KINOSHITA

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/038 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  C08F212/14 ,  C08F220/18

Abstract: A radiation-sensitive resin composition includes a polymer, a radiation-sensitive acid generator, and a compound represented by formula (2). The polymer includes a first structural unit including a phenolic hydroxyl group, a second structural unit including a group represented by formula (1), and a third structural unit including an acid-labile group. In the formula (1), R1, R2, R3, R4, R5, and R6 each independently represent a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, or a monovalent fluorinated hydrocarbon group having 1 to 10 carbon atoms, wherein at least one of R1, R2, R3, R4, R5, and R6 represents a fluorine atom or a fluorinated hydrocarbon group; RA represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; and * denotes a binding site to a part other than the group represented by the formula (1).

公开(公告)号：US20230400767A1

公开(公告)日：2023-12-14

申请号：US18239399

申请日：2023-08-29

Applicant: JSR CORPORATION

Inventor： Takuya OMIYA ,  Katsuaki NISHIKORI ,  Kazuya KIRIYAMA ,  Natsuko KINOSHITA ,  Tetsurou KANEKO

IPC: G03F7/039 ,  G03F7/038 ,  G03F7/004 ,  C08F212/14 ,  C07C69/54 ,  C08F220/18 ,  C08F220/24 ,  C08F220/22 ,  C08F220/30 ,  C08F220/34

CPC classification number: G03F7/039 ,  G03F7/038 ,  G03F7/0045 ,  C08F212/24 ,  C07C69/54 ,  C08F220/1805 ,  C08F220/1806 ,  C08F220/1807 ,  C08F220/1808 ,  C08F220/1809 ,  C08F220/24 ,  C08F220/1811 ,  C08F220/22 ,  C08F220/301 ,  C08F220/1812 ,  C08F220/1818 ,  C08F220/34

Abstract: A radiation-sensitive resin composition includes: a polymer including a first structural unit represented by formula (1); and a radiation-sensitive acid generator. In the formula (1), R1 represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group; R2, R3, and R4 each independently represent a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; R5 represents a monovalent organic group having 1 to 20 carbon atoms; and L represents a single bond or a divalent organic group having 1 to 20 carbon atoms.

公开(公告)号：US20230280652A1

公开(公告)日：2023-09-07

申请号：US18197225

申请日：2023-05-15

Applicant: JSR CORPORATION

Inventor： Natsuko KINOSHITA

IPC: G03F7/039 ,  C08F220/14 ,  G03F7/004 ,  C08F220/22 ,  C08F220/16 ,  G03F7/30 ,  C08F212/00

CPC classification number: G03F7/0392 ,  C08F220/14 ,  G03F7/0045 ,  G03F7/0046 ,  C08F220/22 ,  C08F220/16 ,  G03F7/30 ,  G03F7/0397 ,  C08F212/00

Abstract: A radiation-sensitive resin composition includes: a resin containing a structural unit A represented by formula (1); at least one radiation-sensitive acid generator selected from the group consisting of a radiation-sensitive acid generator represented by formula (2-1) and a radiation-sensitive acid generator represented formula (2-2); and a solvent. At least one R3 is an acid-dissociable group; and R41 is a hydrogen atom or a protective group to be deprotected by action of an acid. At least one of Rf1 and Rf2 is a fluorine atom or a fluoroalkyl group; R5a is a monovalent organic group having a cyclic structure; X1+ is a monovalent onium cation; R5b is a monovalent organic group, and X2+ is a monovalent onium cation whose atom having a positive charge is not an atom forming a cyclic structure.

公开(公告)号：US20180321585A1

公开(公告)日：2018-11-08

申请号：US16030227

申请日：2018-07-09

Applicant: JSR Corporation

Inventor： Natsuko KINOSHITA

IPC: G03F7/004 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38 ,  G03F7/32 ,  G03F7/038 ,  G03F7/039 ,  C07D235/02 ,  C07D235/18 ,  C08F220/28 ,  C08F220/16

CPC classification number: G03F7/0045 ,  C07D235/02 ,  C07D235/18 ,  C08F220/16 ,  C08F220/28 ,  C08F2220/281 ,  C08F2220/283 ,  C08F2800/10 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/162 ,  G03F7/168 ,  G03F7/20 ,  G03F7/2006 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/38

Abstract: A radiation-sensitive resin composition includes: a first polymer having a first structural unit that includes an acid-labile group; a radiation-sensitive acid generator; and a first compound capable of forming a salt through a structural change in a molecule thereof upon irradiation with a radioactive ray. Basicity of the first compound preferably changes upon irradiation with a radioactive ray. The first compound preferably generates an acid upon irradiation with a radioactive ray. The first compound is preferably represented by formula (1). In formula (1), Ar1 represents a substituted or unsubstituted heteroarenediyl group having 4 to 30 ring atoms and having at least one nitrogen atom as a ring-constituting atom.

公开(公告)号：US20180319740A1

公开(公告)日：2018-11-08

申请号：US16032244

申请日：2018-07-11

Applicant: JSR CORPORATION

Inventor： Natsuko KINOSHITA ,  Katsuaki NISHIKORI ,  Kouta FURUICHI

IPC: C07C309/69 ,  C07D295/084 ,  C07D295/15 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20

CPC classification number: C07C309/69 ,  C07D295/084 ,  C07D295/15 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20

Abstract: A radiation-sensitive resin composition includes a first polymer including a first structural unit that includes a first acid-labile group; a radiation-sensitive acid generator; and a compound represented by formula (1). n is 1 or 2. R1 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms in a case in which n is 1. R1 represents a divalent organic group having 1 to 20 carbon atoms in a case in which n is 2. R2 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. E represents a group represented by formula (i). R2 and E may taken together represent a ring structure having 3 to 20 ring atoms together with the nitrogen atom. X represents a divalent organic group having 1 to 20 carbon atoms. R3 represents a second acid-labile group.

公开(公告)号：US20240385518A1

公开(公告)日：2024-11-21

申请号：US18691090

申请日：2022-09-01

Applicant: JSR CORPORATION

Inventor： Katsuaki NISHIKORI ,  Kazuya KIRIYAMA ,  Natsuko KINOSHITA ,  Takuhiro TANIGUCHI ,  Takuya OMIYA

IPC: G03F7/004 ,  G03F7/039

Abstract: A radiation-sensitive resin composition includes a resin including a structural unit (I) represented by formula (1). Ra is a hydrogen atom or a substituted or unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms; Ar1 is a substituted or unsubstituted divalent aromatic hydrocarbon group having 6 to 20 carbon atoms; m is 0 or 1; L1 is a single bond, or —O—, *—COO—, a divalent hydrocarbon group having 1 to 20 carbon atoms, or a combination thereof, and * is a bond on an Ar1 side; Ar2 is a monovalent aromatic hydrocarbon group having 6 to 20 carbon atoms and substituted with X; X is an iodine atom or a bromine atom; and n1 is an integer of 1 to nmax, wherein nmax is the number of Xs when all hydrogen atoms in the monovalent aromatic hydrocarbon group represented by the Ar2 are substituted with X.

公开(公告)号：US20230384676A1

公开(公告)日：2023-11-30

申请号：US18135838

申请日：2023-04-18

Applicant: JSR CORPORATION

Inventor： Takuya OMIYA ,  Katsuaki NISHIKORI ,  Kazuya KIRIYAMA ,  Yuushi MATSUMURA ,  Natsuko KINOSHITA

IPC: G03F7/039 ,  C08F136/16 ,  C07C69/653

CPC classification number: G03F7/0397 ,  C08F136/16 ,  C07C69/653

Abstract: A radiation-sensitive resin composition includes: a resin including a structural unit represented by formula (1); a radiation-sensitive acid generator; and a solvent. R1 is a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group; L1 represents a single bond or —COO-L-; L represents a substituted or unsubstituted alkanediyl group; R2 represents a monovalent hydrocarbon group having 1 to 20 carbon atoms; L2 represents a single bond or a divalent linking group; and Ar represents a group obtained by removing (n+1) hydrogen atoms from an aromatic ring. R3 is independently a halogen atom, a halogenated hydrocarbon group, a hydroxy group, a monovalent hydrocarbon group having 1 to 10 carbon atoms, or a monovalent alkyl ether group having 1 to 10 carbon atoms, and at least one R3 is a halogen atom or a halogenated hydrocarbon group.

公开(公告)号：US20230236501A1

公开(公告)日：2023-07-27

申请号：US18100031

申请日：2023-01-23

Applicant: JSR CORPORATION

Inventor： Natsuko KINOSHITA ,  Takuhiro TANIGUCHI ,  Katsuaki NISHIKORI ,  Kazuya KIRIYAMA

IPC: G03F7/004 ,  C07C381/12 ,  C07C65/24 ,  C07C323/62 ,  C07D333/76 ,  C07D327/08 ,  C07C69/92 ,  C08F220/18 ,  C08F212/14

CPC classification number: G03F7/0045 ,  C07C381/12 ,  C07C65/24 ,  C07C323/62 ,  C07D333/76 ,  C07D327/08 ,  C07C69/92 ,  C08F220/1812 ,  C08F212/22 ,  C08F220/1811 ,  C08F220/1807 ,  C07C2601/08

Abstract: A radiation-sensitive resin composition includes: a polymer, solubility of which in a developer solution is capable of being altered by an action of an acid; a radiation-sensitive acid generator; and a compound represented by formula (1). Ar1 represents a group obtained by removing (a+b+2) hydrogen atoms from an aromatic hydrocarbon ring having 6 to 30 ring atoms; R1 represents a halogen atom or a monovalent organic group having 1 to 20 carbon atoms; L1 represents a divalent linking group; R2 represents a substituted or unsubstituted monovalent aromatic hydrocarbon group having 6 to 20 carbon atoms; a is an integer of 0 to 10, b is an integer of 1 to 10, wherein a sum of a and b is no greater than 10; and X+ represents a monovalent radiation-sensitive onium cation.