公开(公告)号：US20140302438A1

公开(公告)日：2014-10-09

申请号：US14247449

申请日：2014-04-08

Applicant: JSR CORPORATION

Inventor： Yusuke ASANO ,  Shin-ichi NAKAMURA ,  Tomonori FUTAI

IPC: G03F7/038

CPC classification number: G03F7/038 ,  G03F7/0045 ,  G03F7/0048 ,  G03F7/039 ,  G03F7/0397

Abstract: A resist composition includes a polymer that includes an acid-labile group-containing structural unit, a photoacid generator, and a solvent. The solvent includes a compound that includes a ketonic carbonyl group and an alcoholic hydroxyl group. The alcoholic hydroxyl group is preferably a tertiary alcoholic hydroxyl group. The solvent preferably further includes an alkylene glycol monoalkyl ether carboxylate.

Abstract translation: 抗蚀剂组合物包括含有酸不稳定基团的结构单元，光致酸发生剂和溶剂的聚合物。 溶剂包括包含酮羰基和醇羟基的化合物。 醇羟基优选为叔醇羟基。 溶剂优选还包括亚烷基二醇单烷基醚羧酸酯。

公开(公告)号：US20130216951A1

公开(公告)日：2013-08-22

申请号：US13853254

申请日：2013-03-29

Applicant: JSR Corporation

Inventor： Norihiko IKEDA ,  Shin-ichi NAKAMURA

IPC: G03F7/004

CPC classification number: G03F7/0397 ,  C08F220/18 ,  C08F224/00 ,  C08L2312/06 ,  C09D133/04 ,  G03F7/004 ,  G03F7/2041

Abstract: A radiation-sensitive resin composition includes a polymer, an acid generating agent, and an organic solvent. The polymer includes a first structural unit derived from a compound represented by a formula (1), and a second structural unit derived from a compound represented by a formula (2). R1 represents an organic group having a valency of (a+2) that represents a ring structure having 3 to 8 carbon atoms together with the carbon atom constituting a lactone ring. R2 represents a fluorine atom, a hydroxyl group, an organic group having 1 to 20 carbon atoms or the like.

Abstract translation: 辐射敏感性树脂组合物包括聚合物，产酸剂和有机溶剂。 聚合物包括衍生自由式（1）表示的化合物的第一结构单元和由式（2）表示的化合物衍生的第二结构单元。 R1表示与构成内酯环的碳原子一起表示具有3〜8个碳原子的环结构的化合价（a + 2）的有机基团。 R2表示氟原子，羟基，碳原子数1〜20的有机基等。