公开(公告)号：US20140302438A1

公开(公告)日：2014-10-09

申请号：US14247449

申请日：2014-04-08

Applicant: JSR CORPORATION

Inventor： Yusuke ASANO ,  Shin-ichi NAKAMURA ,  Tomonori FUTAI

IPC: G03F7/038

CPC classification number: G03F7/038 ,  G03F7/0045 ,  G03F7/0048 ,  G03F7/039 ,  G03F7/0397

Abstract: A resist composition includes a polymer that includes an acid-labile group-containing structural unit, a photoacid generator, and a solvent. The solvent includes a compound that includes a ketonic carbonyl group and an alcoholic hydroxyl group. The alcoholic hydroxyl group is preferably a tertiary alcoholic hydroxyl group. The solvent preferably further includes an alkylene glycol monoalkyl ether carboxylate.

Abstract translation: 抗蚀剂组合物包括含有酸不稳定基团的结构单元，光致酸发生剂和溶剂的聚合物。 溶剂包括包含酮羰基和醇羟基的化合物。 醇羟基优选为叔醇羟基。 溶剂优选还包括亚烷基二醇单烷基醚羧酸酯。